NL7713791A - Werkwijze ter bereiding van fotopolymeriseer- bare massa's. - Google Patents

Werkwijze ter bereiding van fotopolymeriseer- bare massa's.

Info

Publication number
NL7713791A
NL7713791A NL7713791A NL7713791A NL7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A NL 7713791 A NL7713791 A NL 7713791A
Authority
NL
Netherlands
Prior art keywords
masses
preparing
preparing photopolymerizable
photopolymerizable masses
photopolymerizable
Prior art date
Application number
NL7713791A
Other languages
English (en)
Dutch (nl)
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of NL7713791A publication Critical patent/NL7713791A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31529—Next to metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
    • Y10T428/31692—Next to addition polymer from unsaturated monomers
    • Y10T428/31699—Ester, halide or nitrile of addition polymer
NL7713791A 1976-12-24 1977-12-13 Werkwijze ter bereiding van fotopolymeriseer- bare massa's. NL7713791A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762658935 DE2658935A1 (de) 1976-12-24 1976-12-24 Photopolymerisierbare masse und deren verwendung

Publications (1)

Publication Number Publication Date
NL7713791A true NL7713791A (nl) 1978-06-27

Family

ID=5996698

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7713791A NL7713791A (nl) 1976-12-24 1977-12-13 Werkwijze ter bereiding van fotopolymeriseer- bare massa's.

Country Status (5)

Country Link
US (1) US4134813A (xx)
BE (1) BE862134A (xx)
DE (1) DE2658935A1 (xx)
FR (1) FR2375256A1 (xx)
NL (1) NL7713791A (xx)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228002A (ja) 1985-04-02 1986-10-11 Nippon Paint Co Ltd 高感度光硬化性樹脂組成物
US4753997A (en) * 1985-11-27 1988-06-28 The Standard Oil Company Process for grafting maleic anhydride or styrene-maleic anhydride onto polyolefins
US5204378A (en) * 1986-03-24 1993-04-20 Nippon Telegraph And Telephone Corporation Fluorine-containing epoxy(meth)acrylate resin adhesive cured in presence of photoinitiator
DE3788887T2 (de) * 1986-03-24 1994-09-01 Nippon Telegraph & Telephone Epoxy(meth)acrylatharz, Verfahren zu dessen Herstellung, und Klebstoffzusammensetzung, die dasselbe enthält.
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743454A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743457A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
EP0511860B2 (en) † 1991-04-30 2001-09-05 Sericol Limited Photocurable compositions
EP1927477B1 (en) * 2006-11-30 2009-03-18 FUJIFILM Corporation Ink composition for inkjet-recording and method for inkjet-recording
JP5224824B2 (ja) * 2007-01-15 2013-07-03 富士フイルム株式会社 インク組成物及びそれを用いたインクジェット記録方法
US7985785B2 (en) * 2007-01-15 2011-07-26 Fujifilm Corporation Ink composition and inkjet recording method using the same
JP4601009B2 (ja) * 2007-03-30 2010-12-22 富士フイルム株式会社 インクジェット記録用インクセット及びインクジェット記録方法
JP5247096B2 (ja) * 2007-09-18 2013-07-24 富士フイルム株式会社 インクジェット記録用インク組成物、及び、インクジェット記録方法
JP5255369B2 (ja) * 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
JP5159232B2 (ja) * 2007-09-28 2013-03-06 富士フイルム株式会社 インク組成物及びそれを用いたインクジェット記録方法
US8129447B2 (en) * 2007-09-28 2012-03-06 Fujifilm Corporation Ink composition and inkjet recording method using the same
JP5148235B2 (ja) * 2007-09-28 2013-02-20 富士フイルム株式会社 インク組成物
JP5457636B2 (ja) * 2008-01-22 2014-04-02 富士フイルム株式会社 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法
JP5348955B2 (ja) * 2008-07-10 2013-11-20 富士フイルム株式会社 インク組成物、インクセット、インクジェット記録方法、及び、印刷物
US8378002B2 (en) * 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
JP5106285B2 (ja) * 2008-07-16 2012-12-26 富士フイルム株式会社 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法
JP2010024277A (ja) * 2008-07-16 2010-02-04 Fujifilm Corp インクジェット用インク組成物、及び、インクジェット記録方法
JP5258428B2 (ja) * 2008-07-16 2013-08-07 富士フイルム株式会社 水性インク組成物、インクジェット記録用水性インク組成物およびインクジェット記録方法
JP5258429B2 (ja) * 2008-07-16 2013-08-07 富士フイルム株式会社 インク組成物、及び、それを用いたインクジェット記録方法
JP5383133B2 (ja) * 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP5344892B2 (ja) 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
JP2010230721A (ja) * 2009-03-25 2010-10-14 Fujifilm Corp 感光性組成物、感光性フィルム、及び、永久パターン形成方法
JP5383289B2 (ja) * 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP2012031388A (ja) * 2010-05-19 2012-02-16 Fujifilm Corp 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物
KR101413078B1 (ko) 2011-12-30 2014-07-02 제일모직 주식회사 포지티브형 감광성 수지 조성물
EP2921536A1 (en) 2014-03-20 2015-09-23 ALLNEX AUSTRIA GmbH Radiation curable composition comprising inert resins

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same
US3857769A (en) * 1973-11-08 1974-12-31 Scm Corp Photopolymerizable coating compositions and process for making same which contains a thioxanthone and an activated halogenated azine compound as sensitizers
US3903322A (en) * 1974-03-07 1975-09-02 Continental Can Co Photopolymerizable ethylenically unsaturated compounds photoinitiated with benzoyl derivatives of diphenyl sulfide and an organic amine compound
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems

Also Published As

Publication number Publication date
DE2658935A1 (de) 1978-07-06
BE862134A (fr) 1978-06-21
US4134813A (en) 1979-01-16
FR2375256A1 (fr) 1978-07-21

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