NL7215049A - Electron gun vacuum chamber - with implified protection of power supply against arcing - Google Patents

Electron gun vacuum chamber - with implified protection of power supply against arcing

Info

Publication number
NL7215049A
NL7215049A NL7215049A NL7215049A NL7215049A NL 7215049 A NL7215049 A NL 7215049A NL 7215049 A NL7215049 A NL 7215049A NL 7215049 A NL7215049 A NL 7215049A NL 7215049 A NL7215049 A NL 7215049A
Authority
NL
Netherlands
Prior art keywords
power supply
vacuum chamber
electron gun
protection
implified
Prior art date
Application number
NL7215049A
Other versions
NL153717B (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7215049A priority Critical patent/NL153717B/en
Publication of NL7215049A publication Critical patent/NL7215049A/en
Publication of NL153717B publication Critical patent/NL153717B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

Thermic treatment e.g. melting, welding and vaporising of metal and non-metal samples is carried out under vacuum in an electron gun vacuum chamber. Complete protection of the power supply against arc discharge between the cathode and the focussing electrode is ensured by inserting a high resistance, e.g. of several hundred ohms, between the positive of the power supply, to which the sample to be heated is also connected, and the focussing electrode, so that the resistance is normally shunted by the electron beam but becomes fully effective if an arc is set up. In normal operation, the current loss in the resistance is about 20-30 mA.
NL7215049A 1972-11-07 1972-11-07 ELECTRON BEAMING DEVICE FOR PERFORMING A HEAT TREATMENT BY MEANS OF AN ELECTRON BOMBARDEMENT. NL153717B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL7215049A NL153717B (en) 1972-11-07 1972-11-07 ELECTRON BEAMING DEVICE FOR PERFORMING A HEAT TREATMENT BY MEANS OF AN ELECTRON BOMBARDEMENT.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7215049A NL153717B (en) 1972-11-07 1972-11-07 ELECTRON BEAMING DEVICE FOR PERFORMING A HEAT TREATMENT BY MEANS OF AN ELECTRON BOMBARDEMENT.

Publications (2)

Publication Number Publication Date
NL7215049A true NL7215049A (en) 1974-05-09
NL153717B NL153717B (en) 1977-06-15

Family

ID=19817320

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7215049A NL153717B (en) 1972-11-07 1972-11-07 ELECTRON BEAMING DEVICE FOR PERFORMING A HEAT TREATMENT BY MEANS OF AN ELECTRON BOMBARDEMENT.

Country Status (1)

Country Link
NL (1) NL153717B (en)

Also Published As

Publication number Publication date
NL153717B (en) 1977-06-15

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: SOKOLOV