NL6811281A - - Google Patents

Info

Publication number
NL6811281A
NL6811281A NL6811281A NL6811281A NL6811281A NL 6811281 A NL6811281 A NL 6811281A NL 6811281 A NL6811281 A NL 6811281A NL 6811281 A NL6811281 A NL 6811281A NL 6811281 A NL6811281 A NL 6811281A
Authority
NL
Netherlands
Application number
NL6811281A
Other versions
NL154518B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6811281A publication Critical patent/NL6811281A/xx
Publication of NL154518B publication Critical patent/NL154518B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6856—Dicarboxylic acids and dihydroxy compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL686811281A 1967-08-08 1968-08-08 Werkwijze voor het bereiden van een door uv-bestraling verhardbare samenstelling, alsmede fotografisch element dat een laag bevat, die uit een aldus bereide samenstelling is gevormd. NL154518B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB36394/67A GB1180846A (en) 1967-08-08 1967-08-08 Photopolymerisation of Ethylenically Unsaturated Organic Compounds

Publications (2)

Publication Number Publication Date
NL6811281A true NL6811281A (de) 1969-01-27
NL154518B NL154518B (nl) 1977-09-15

Family

ID=10387736

Family Applications (1)

Application Number Title Priority Date Filing Date
NL686811281A NL154518B (nl) 1967-08-08 1968-08-08 Werkwijze voor het bereiden van een door uv-bestraling verhardbare samenstelling, alsmede fotografisch element dat een laag bevat, die uit een aldus bereide samenstelling is gevormd.

Country Status (6)

Country Link
US (1) US3558309A (de)
BE (1) BE719039A (de)
DE (1) DE1795089C3 (de)
FR (1) FR1576141A (de)
GB (1) GB1180846A (de)
NL (1) NL154518B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014012A1 (de) * 1979-01-24 1980-08-06 Agfa-Gevaert N.V. Eine äthylenisch ungesättigte Verbindung enthaltendes lichtempfindliches Material, Initiator und Sensibilisator
EP0014293A1 (de) * 1979-01-11 1980-08-20 Scott Bader Company Limited Fotohärtbare ungesättigte Polyesterharz-Zusammensetzungen und Verfahren zu deren Härtung

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US4202694A (en) * 1977-04-21 1980-05-13 Polaroid Corporation Pendant oxime polymers and photographic use thereof
FR2393345A1 (fr) * 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
JPS5695902A (en) * 1979-12-29 1981-08-03 Toyobo Co Ltd Uv-curable resin composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
HU196288B (en) * 1985-06-04 1988-11-28 Egyt Gyogyszervegyeszeti Gyar Fungicides containing as active substance new derivatives of fenantren and process for production of the active substance
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
JP2640470B2 (ja) * 1987-08-19 1997-08-13 旭化成工業株式会社 新しい感光性組成物
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
JP3498869B2 (ja) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 光重合性組成物を有する画像形成材料
DE69703505T2 (de) 1996-02-26 2001-06-13 Agfa Gevaert Nv Bildaufzeichnungselement, das eine Zweiphasenbeschichtung mit einer dispergierten hydrophoben photopolymerisierbaren Phase enthält
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
EP1635220A2 (de) 1999-03-03 2006-03-15 Ciba Specialty Chemicals Holding Inc. Oximderivate und ihre Verwendung als Fotoinitiatoren
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
US6652970B1 (en) * 2000-07-07 2003-11-25 3M Innovative Properties Company Degradable crosslinkers, compositions therefrom, and methods of their preparation and use
KR100417091B1 (ko) * 2001-05-15 2004-02-05 주식회사 엘지화학 기능성 옥심 에스테르계 화합물 및 이를 포함하는 감광성조성물
DE60234095D1 (de) * 2001-06-11 2009-12-03 Basf Se Oxim ester photoinitiatoren mit kombinierter struktur
EP1567518B1 (de) * 2002-12-03 2009-01-14 Ciba Holding Inc. Heteroaromatische gruppen enthaltende oximester als photointiatoren
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
US7696257B2 (en) * 2004-08-20 2010-04-13 Adeka Corporation Oxime ester compound and photopolymerization initiator containing such compound
JP4650211B2 (ja) * 2005-10-31 2011-03-16 東洋インキ製造株式会社 光重合性組成物
KR100814231B1 (ko) 2005-12-01 2008-03-17 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물
EP2172455B1 (de) * 2005-12-01 2011-01-19 Basf Se Oximester-Fotoinitiatoren
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
ATE458010T1 (de) * 2005-12-20 2010-03-15 Basf Se Oximester-photoinitiatoren
WO2007080947A1 (ja) * 2006-01-13 2007-07-19 Toyo Ink Mfg. Co., Ltd. ジケトオキシムエステル化合物及びその用途
JP5535063B2 (ja) * 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2144894B1 (de) * 2007-05-11 2011-01-26 Basf Se Oximesther-fotoinitiatoren
US8728686B2 (en) * 2007-07-17 2014-05-20 Fujifilm Corporation Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
JP5274132B2 (ja) * 2007-07-17 2013-08-28 富士フイルム株式会社 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
WO2009147031A2 (en) 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
JP4344400B1 (ja) * 2009-02-16 2009-10-14 株式会社日本化学工業所 オキシムエステル化合物及びこれらを用いた感光性樹脂組成物
CN101565472B (zh) 2009-05-19 2011-05-04 常州强力电子新材料有限公司 酮肟酯类光引发剂
CN102459171B (zh) 2009-06-17 2014-07-09 东洋油墨Sc控股株式会社 肟酯化合物、自由基聚合引发剂、聚合性组合物、负型抗蚀剂以及图像图案
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
WO2012159213A1 (en) 2011-05-25 2012-11-29 American Dye Source, Inc. Compounds with oxime ester and/or acyl groups
JP6328642B2 (ja) * 2013-09-02 2018-05-23 インサイト ハイ テクノロジー カンパニー リミテッドＩｎｓｉｇｈｔ Ｈｉｇｈ Ｔｅｃｈｎｏｌｏｇｙ Ｃｏ．， Ｌｔｄ． シクロペンタンジオンオキシムエステルとその応用
CN104910053B (zh) * 2014-06-09 2017-09-12 北京英力科技发展有限公司 不对称二肟酯化合物及其制造方法与应用
WO2016082304A1 (zh) * 2014-11-28 2016-06-02 北京英力科技发展有限公司 一种光固化阻焊油墨
US11041037B2 (en) 2018-10-01 2021-06-22 Solenis Technologies, L.P. Ultra violet assisted photo initiated free radical polymerization

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE465271A (de) * 1941-12-31 1900-01-01
DE1099166B (de) * 1959-12-01 1961-02-09 Basf Ag Sensibilisatoren zur Photopolymerisation ungesaettigter organischer Verbindungen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0014293A1 (de) * 1979-01-11 1980-08-20 Scott Bader Company Limited Fotohärtbare ungesättigte Polyesterharz-Zusammensetzungen und Verfahren zu deren Härtung
EP0014012A1 (de) * 1979-01-24 1980-08-06 Agfa-Gevaert N.V. Eine äthylenisch ungesättigte Verbindung enthaltendes lichtempfindliches Material, Initiator und Sensibilisator

Also Published As

Publication number Publication date
FR1576141A (de) 1969-07-25
NL154518B (nl) 1977-09-15
DE1795089C3 (de) 1982-03-18
DE1795089A1 (de) 1972-01-20
BE719039A (de) 1969-02-05
US3558309A (en) 1971-01-26
GB1180846A (en) 1970-02-11
DE1795089B2 (de) 1981-05-21

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: AGFA GEVAERT