BE507657A
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1950-12-06 |
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GB907718A
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1957-11-01 |
1962-10-10 |
Lithoplate Inc |
Hydrophilic base plates for diazo presensitized lithographic printing plates
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US2993788A
(en)
*
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1958-06-17 |
1961-07-25 |
Gen Aniline & Film Corp |
Multicolor reproduction using light sensitive diazo oxides
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US3130051A
(en)
*
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1958-12-10 |
1964-04-21 |
Gen Aniline & Film Corp |
Process for producing negative working offset diazo printing plates
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DE1095665B
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1959-01-12 |
1960-12-22 |
Hans Hoerner |
Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
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1959-04-06 |
1963-06-25 |
Gen Aniline & Film Corp |
Electrophotographic element
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US3173788A
(en)
*
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1960-02-10 |
1965-03-16 |
Gen Aniline & Film Corp |
Developing positive working photolitho-graphic printing plates containing diazo oxides
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(en)
*
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1960-06-06 |
1965-01-05 |
Gen Aniline & Film Corp |
Photomechanical reversal process and foil and dyes for use therein
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US3086861A
(en)
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1960-07-01 |
1963-04-23 |
Gen Aniline & Film Corp |
Printing plates comprising ink receptive azo dye surfaces
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1960-08-16 |
1964-09-22 |
Gen Aniline & Film Corp |
Diazo and resinous coupler printing plates for photomechanical reproduction
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BE612386A
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1961-01-09 |
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BE620660A
(ja)
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1961-07-28 |
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CA774047A
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1963-12-09 |
1967-12-19 |
Shipley Company |
Light-sensitive material and process for the development thereof
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US3486450A
(en)
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1964-02-27 |
1969-12-30 |
Eastman Kodak Co |
Color proofing system
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1965-07-30 |
1969-01-02 |
Adox Du Pont Fotowerke |
Verfahren zur Herstellung von masshaltigen photographischen Filmen
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1966-03-19 |
1970-12-22 |
Ricoh Kk |
Negative-to-positive reversible copy sheet
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US3474719A
(en)
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1966-04-15 |
1969-10-28 |
Gaf Corp |
Offset printing plates
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GB1188527A
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1966-05-31 |
1970-04-15 |
Algraphy Ltd |
Development of Light-Sensitive Layers
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NL136645C
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1966-12-12 |
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1969-02-17 |
1972-01-25 |
Gaf Corp |
Positive-working diazo-oxide terpolymer photoresists
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1971-05-28 |
1975-11-18 |
Polychrome Corp |
Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
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JPS521663B2
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1973-02-10 |
1977-01-17 |
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JPS5421089B2
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1973-05-29 |
1979-07-27 |
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GB1482921A
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1973-07-31 |
1977-08-17 |
Glaxo Lab Ltd |
Polymers
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WO1979000593A1
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1978-02-06 |
1979-08-23 |
Napp Systems Inc |
Desensitizing solution and process for treating a diazo photosensitive printing plate
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CA1180931A
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1980-09-15 |
1985-01-15 |
Robert W. Hallman |
Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
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WO1988002878A1
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1986-10-20 |
1988-04-21 |
Macdermid, Incorporated |
Image reversal system and process
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EP0280197A3
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1987-02-23 |
1990-05-23 |
Oki Electric Industry Company, Limited |
Process for forming photoresist pattern
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EP0410606B1
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1989-07-12 |
1996-11-13 |
Fuji Photo Film Co., Ltd. |
Siloxane polymers and positive working light-sensitive compositions comprising the same
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1993-03-05 |
1994-05-24 |
Morton International, Inc. |
Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
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1993-03-05 |
1994-05-03 |
Morton International, Inc. |
Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
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JPH0876380A
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1994-09-06 |
1996-03-22 |
Fuji Photo Film Co Ltd |
ポジ型印刷版組成物
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JP3522923B2
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1995-10-23 |
2004-04-26 |
富士写真フイルム株式会社 |
ハロゲン化銀感光材料
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DE825927T1
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1996-04-23 |
1998-07-16 |
Horsell, Graphic Industries Ltd., Leeds |
Warmeempfindliche zusammensetzung und verfahren zur herstellung einer lithographischen druckform damit
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1996-05-13 |
2002-09-11 |
Sumitomo Bakelite Co |
Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
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1997-08-08 |
2000-09-12 |
Kodak Polychrome Graphics Llc |
Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
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GB9622657D0
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1996-10-31 |
1997-01-08 |
Horsell Graphic Ind Ltd |
Direct positive lithographic plate
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EP0852341B1
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1997-01-03 |
2001-08-29 |
Sumitomo Bakelite Company Limited |
Method for the pattern-processing of photosensitive resin composition
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1997-03-21 |
2000-07-18 |
Kodak Polychrome Graphics Llc |
Positive-working infrared radiation sensitive composition and printing plate and imaging method
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1997-03-21 |
2000-05-16 |
Kodak Polychrome Graphics Llc |
Positive-working printing plate and method of providing a positive image therefrom using laser imaging
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WO1999001796A2
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1997-07-05 |
1999-01-14 |
Kodak Polychrome Graphics Llc |
Pattern-forming methods
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1997-09-02 |
2000-05-09 |
Kodak Polychrome Graphics Llc |
Thermal lithographic printing plates
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1998-03-17 |
2000-04-04 |
Kodak Polychrome Graphics Llc |
Negative-working dry planographic printing plate
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US6296982B1
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1999-11-19 |
2001-10-02 |
Kodak Polychrome Graphics Llc |
Imaging articles
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2000-10-31 |
2002-05-10 |
Sumitomo Bakelite Company Limited |
Composition de resine photosensible positive, son procede de preparation, et dispositifs a semi-conducteur
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2004-01-20 |
2012-09-19 |
旭化成イーマテリアルズ株式会社 |
樹脂及び樹脂組成物
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JP5034269B2
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2005-03-31 |
2012-09-26 |
大日本印刷株式会社 |
パターン形成材料、及びポリイミド前駆体樹脂組成物
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JP5171628B2
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2006-08-15 |
2013-03-27 |
旭化成イーマテリアルズ株式会社 |
ポジ型感光性樹脂組成物
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JP6271105B1
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2016-03-31 |
2018-01-31 |
旭化成株式会社 |
感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置
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CN112142613B
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2020-09-22 |
2021-06-25 |
江南大学 |
一种松香基小分子有机凝胶剂及其形成的环己烷凝胶
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