NL199728A - - Google Patents

Info

Publication number
NL199728A
NL199728A NL199728DA NL199728A NL 199728 A NL199728 A NL 199728A NL 199728D A NL199728D A NL 199728DA NL 199728 A NL199728 A NL 199728A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL199728A publication Critical patent/NL199728A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
NL199728D 1954-08-20 NL199728A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
NL199728A true NL199728A (fr)

Family

ID=23791529

Family Applications (2)

Application Number Title Priority Date Filing Date
NL199728D NL199728A (fr) 1954-08-20
NL95407D NL95407C (fr) 1954-08-20

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL95407D NL95407C (fr) 1954-08-20

Country Status (7)

Country Link
US (1) US2772972A (fr)
BE (1) BE540225A (fr)
CH (1) CH347712A (fr)
DE (1) DE1108079B (fr)
FR (1) FR1134857A (fr)
GB (1) GB784001A (fr)
NL (2) NL95407C (fr)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540601A (fr) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (fr) * 1961-01-09
NL280959A (fr) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (fr) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (fr) * 1973-02-10 1977-01-17
JPS5421089B2 (fr) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (fr) * 1980-09-15 1985-01-15 Robert W. Hallman Systeme photosensible a deux couches pour la formation d'images avec, dans la couche-image, une copolymere bimodal de styrene et d'anhydride maleique constituant la pellicule
JPH01501176A (ja) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド 像反転可能なシステム及びプロセス
EP0280197A3 (fr) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Procédé de formation d'un patron formant photoréserve
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
TW502135B (en) * 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
EP0852341B1 (fr) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Procédé de production d'images sur une composition photosensible à base de résine
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
CN100347609C (zh) * 2000-10-31 2007-11-07 英特尔公司 正性光敏树脂组合物、制备正性光敏树脂组合物的方法及半导体设备
US7416822B2 (en) * 2004-01-20 2008-08-26 Asahi Kasei Emd Corporation Resin and resin composition
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
EP2056163A4 (fr) 2006-08-15 2009-11-11 Asahi Kasei Emd Corp Composition de résine photosensible positive
CN115185157A (zh) 2016-03-31 2022-10-14 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法和半导体装置
CN112142613B (zh) * 2020-09-22 2021-06-25 江南大学 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (de) * 1930-07-09 1931-05-26 Klimsch & Co Verfahren zum Entwickeln von Chromat-Schellackkopien
BE416158A (fr) * 1935-01-12
DE699462C (de) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
DE862956C (de) * 1941-10-30 1953-01-15 Basf Ag Verfahren zur Herstellung von Mischpolymerisaten
NL69492C (fr) * 1947-05-09
NL70798C (fr) * 1948-10-15
NL80569C (fr) * 1949-07-23
DE960335C (de) * 1951-06-07 1957-03-21 Kalle & Co Ag Lichtempfindliches Material
DE904733C (de) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs
BE523231A (fr) * 1953-05-22

Also Published As

Publication number Publication date
CH347712A (de) 1960-07-15
BE540225A (fr)
GB784001A (en) 1957-10-02
DE1108079B (de) 1961-05-31
US2772972A (en) 1956-12-04
NL95407C (fr)
FR1134857A (fr) 1957-04-18

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