NL199728A - - Google Patents

Info

Publication number
NL199728A
NL199728A NL199728DA NL199728A NL 199728 A NL199728 A NL 199728A NL 199728D A NL199728D A NL 199728DA NL 199728 A NL199728 A NL 199728A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL199728A publication Critical patent/NL199728A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
NL199728D 1954-08-20 NL199728A (US08124317-20120228-C00026.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
NL199728A true NL199728A (US08124317-20120228-C00026.png)

Family

ID=23791529

Family Applications (2)

Application Number Title Priority Date Filing Date
NL95407D NL95407C (US08124317-20120228-C00026.png) 1954-08-20
NL199728D NL199728A (US08124317-20120228-C00026.png) 1954-08-20

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL95407D NL95407C (US08124317-20120228-C00026.png) 1954-08-20

Country Status (7)

Country Link
US (1) US2772972A (US08124317-20120228-C00026.png)
BE (1) BE540225A (US08124317-20120228-C00026.png)
CH (1) CH347712A (US08124317-20120228-C00026.png)
DE (1) DE1108079B (US08124317-20120228-C00026.png)
FR (1) FR1134857A (US08124317-20120228-C00026.png)
GB (1) GB784001A (US08124317-20120228-C00026.png)
NL (2) NL199728A (US08124317-20120228-C00026.png)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE507657A (US08124317-20120228-C00026.png) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (US08124317-20120228-C00026.png) * 1961-01-09
NL280959A (US08124317-20120228-C00026.png) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (US08124317-20120228-C00026.png) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (US08124317-20120228-C00026.png) * 1973-02-10 1977-01-17
JPS5421089B2 (US08124317-20120228-C00026.png) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
JPH01501176A (ja) * 1986-10-20 1989-04-20 マクダーミッド,インコーポレーテッド 像反転可能なシステム及びプロセス
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
CN1078132C (zh) 1996-04-23 2002-01-23 霍西尔绘图工业有限公司 热敏组合物及用其制造平版印刷版型的方法
TW502135B (en) 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
EP0852341B1 (en) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Method for the pattern-processing of photosensitive resin composition
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
DE69801363T2 (de) 1997-07-05 2002-05-23 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
CN100347609C (zh) * 2000-10-31 2007-11-07 英特尔公司 正性光敏树脂组合物、制备正性光敏树脂组合物的方法及半导体设备
EP1707588A4 (en) * 2004-01-20 2009-07-01 Asahi Kasei Emd Corp RESIN AND RESIN COMPOSITION
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
EP2056163A4 (en) 2006-08-15 2009-11-11 Asahi Kasei Emd Corp POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
KR102090449B1 (ko) 2016-03-31 2020-03-18 아사히 가세이 가부시키가이샤 감광성 수지 조성물, 경화 릴리프 패턴의 제조 방법 및 반도체 장치
CN112142613B (zh) * 2020-09-22 2021-06-25 江南大学 一种松香基小分子有机凝胶剂及其形成的环己烷凝胶

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (de) * 1930-07-09 1931-05-26 Klimsch & Co Verfahren zum Entwickeln von Chromat-Schellackkopien
BE416158A (US08124317-20120228-C00026.png) * 1935-01-12
DE699462C (de) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographischer Film mit Haftschicht fuer die lichtempfindliche Emulsion
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
DE862956C (de) * 1941-10-30 1953-01-15 Basf Ag Verfahren zur Herstellung von Mischpolymerisaten
NL69492C (US08124317-20120228-C00026.png) * 1947-05-09
NL70798C (US08124317-20120228-C00026.png) * 1948-10-15
NL78797C (US08124317-20120228-C00026.png) * 1949-07-23
DE960335C (de) * 1951-06-07 1957-03-21 Kalle & Co Ag Lichtempfindliches Material
DE904733C (de) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Lichtempfindliches Material fuer die Herstellung von Quellreliefs fuer Druckzwecke und Verfahren zum Drucken mit den Reliefs
BE523231A (US08124317-20120228-C00026.png) * 1953-05-22

Also Published As

Publication number Publication date
NL95407C (US08124317-20120228-C00026.png)
BE540225A (US08124317-20120228-C00026.png)
CH347712A (de) 1960-07-15
FR1134857A (fr) 1957-04-18
US2772972A (en) 1956-12-04
GB784001A (en) 1957-10-02
DE1108079B (de) 1961-05-31

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