NL173178B - Werkwijze voor de bereiding van fotopolymeriseerbare drukinkt, geschikt voor zeefdrukken. - Google Patents

Werkwijze voor de bereiding van fotopolymeriseerbare drukinkt, geschikt voor zeefdrukken.

Info

Publication number
NL173178B
NL173178B NLAANVRAGE7506080,A NL7506080A NL173178B NL 173178 B NL173178 B NL 173178B NL 7506080 A NL7506080 A NL 7506080A NL 173178 B NL173178 B NL 173178B
Authority
NL
Netherlands
Prior art keywords
photopolymerizable
preparation
screen printing
print ink
print
Prior art date
Application number
NLAANVRAGE7506080,A
Other languages
English (en)
Other versions
NL7506080A (nl
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Publication of NL7506080A publication Critical patent/NL7506080A/nl
Publication of NL173178B publication Critical patent/NL173178B/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10—Epoxy resins modified by unsaturated compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/443—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/447—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from acrylic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4981—Utilizing transitory attached element or associated separate material
    • Y10T29/49812—Temporary protective coating, impregnation, or cast layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Chemically Coating (AREA)
NLAANVRAGE7506080,A 1974-05-24 1975-05-23 Werkwijze voor de bereiding van fotopolymeriseerbare drukinkt, geschikt voor zeefdrukken. NL173178B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/473,180 US4003877A (en) 1974-05-24 1974-05-24 Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions

Publications (2)

Publication Number Publication Date
NL7506080A NL7506080A (nl) 1975-11-26
NL173178B true NL173178B (nl) 1983-07-18

Family

ID=23878521

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7506080,A NL173178B (nl) 1974-05-24 1975-05-23 Werkwijze voor de bereiding van fotopolymeriseerbare drukinkt, geschikt voor zeefdrukken.

Country Status (24)

Country Link
US (2) US4003877A (nl)
JP (1) JPS515388A (nl)
AR (1) AR217039A1 (nl)
AT (1) AT339928B (nl)
BE (1) BE829437A (nl)
BG (1) BG26402A3 (nl)
BR (1) BR7503276A (nl)
CA (1) CA1049691A (nl)
CH (1) CH608825A5 (nl)
DD (2) DD124390A5 (nl)
DE (1) DE2522811C2 (nl)
DK (1) DK154919C (nl)
ES (1) ES437825A1 (nl)
FI (1) FI59112C (nl)
FR (1) FR2274652A1 (nl)
GB (1) GB1507842A (nl)
IL (1) IL47310A (nl)
IN (1) IN142791B (nl)
IT (1) IT1035820B (nl)
NL (1) NL173178B (nl)
NO (1) NO146676C (nl)
RO (1) RO67457A (nl)
SE (1) SE431879B (nl)
ZA (1) ZA753049B (nl)

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AT389793B (de) * 1986-03-25 1990-01-25 Philips Nv Leiterplatte fuer gedruckte schaltungen und verfahren zur herstellung solcher leiterplatten
US4690833A (en) * 1986-03-28 1987-09-01 International Business Machines Corporation Providing circuit lines on a substrate
JPH0688012B2 (ja) * 1986-07-02 1994-11-09 ロクタイト．コーポレーション 放射線硬化性マスキング組成物
US4826705A (en) * 1986-07-02 1989-05-02 Loctite Corporation Radiation curable temporary solder mask
JPS6462375A (en) * 1987-09-02 1989-03-08 Arakawa Chem Ind Liquid photosolder resist ink composition of alkali development type
US5630869A (en) * 1988-01-12 1997-05-20 Sicipa Holding S.A. Reversibly photochromic printing inks
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US5458921A (en) 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions
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US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
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US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto
US7527915B2 (en) * 2006-07-19 2009-05-05 E. I. Du Pont De Nemours And Company Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
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US9093448B2 (en) 2008-11-25 2015-07-28 Lord Corporation Methods for protecting a die surface with photocurable materials
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DE2349979A1 (de) * 1973-10-04 1975-04-17 Bayer Ag Uv-licht-haertende massen hoher reaktivitaet

Also Published As

Publication number Publication date
NO751830L (nl) 1975-11-25
IL47310A (en) 1978-07-31
ZA753049B (en) 1976-04-28
ATA400775A (de) 1977-03-15
BE829437A (fr) 1975-09-15
CA1049691A (en) 1979-02-27
FR2274652B1 (nl) 1979-01-19
FI59112B (fi) 1981-02-27
SE431879B (sv) 1984-03-05
CH608825A5 (nl) 1979-01-31
IN142791B (nl) 1977-08-27
AU8112875A (en) 1976-11-18
IT1035820B (it) 1979-10-20
DE2522811A1 (de) 1975-11-27
FI59112C (fi) 1981-06-10
NO146676C (no) 1982-11-17
GB1507842A (en) 1978-04-19
DK154919C (da) 1989-05-29
US4003877A (en) 1977-01-18
DE2522811C2 (de) 1983-01-13
JPS515388A (en) 1976-01-17
ES437825A1 (es) 1977-07-01
IL47310A0 (en) 1975-07-28
DD120662A5 (nl) 1976-06-20
NL7506080A (nl) 1975-11-26
NO146676B (no) 1982-08-09
FI751475A (nl) 1975-11-25
SE7505838L (sv) 1975-12-11
DK154919B (da) 1989-01-02
AR217039A1 (es) 1980-02-29
RO67457A (ro) 1981-07-30
BG26402A3 (bg) 1979-03-15
US4064287A (en) 1977-12-20
DK227875A (da) 1975-11-25
DD124390A5 (nl) 1977-02-16
AT339928B (de) 1977-11-10
BR7503276A (pt) 1976-04-27
FR2274652A1 (fr) 1976-01-09

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BA A request for search or an international-type search has been filed
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
R1B Notice of opposition during period of laying open
A85 Still pending on 85-01-01
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