NL1002904C2 - Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. - Google Patents
Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. Download PDFInfo
- Publication number
- NL1002904C2 NL1002904C2 NL1002904A NL1002904A NL1002904C2 NL 1002904 C2 NL1002904 C2 NL 1002904C2 NL 1002904 A NL1002904 A NL 1002904A NL 1002904 A NL1002904 A NL 1002904A NL 1002904 C2 NL1002904 C2 NL 1002904C2
- Authority
- NL
- Netherlands
- Prior art keywords
- tert
- composition
- benzotriazole
- butyl
- hydroxy
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Ink Jet (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42484395 | 1995-04-19 | ||
US08/424,843 US5574166A (en) | 1995-04-19 | 1995-04-19 | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1002904A1 NL1002904A1 (nl) | 1996-10-22 |
NL1002904C2 true NL1002904C2 (nl) | 1998-04-10 |
Family
ID=23684097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1002904A NL1002904C2 (nl) | 1995-04-19 | 1996-04-19 | Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. |
Country Status (18)
Country | Link |
---|---|
US (4) | US5574166A (sv) |
EP (1) | EP0738718A1 (sv) |
JP (2) | JP3309153B2 (sv) |
KR (2) | KR100426626B1 (sv) |
CN (2) | CN1066181C (sv) |
AT (1) | AT405936B (sv) |
AU (2) | AU707202B2 (sv) |
BE (1) | BE1010550A3 (sv) |
BR (2) | BR9601991A (sv) |
CA (2) | CA2174411C (sv) |
DE (1) | DE19615000A1 (sv) |
ES (1) | ES2130930B1 (sv) |
FR (1) | FR2733239B1 (sv) |
GB (1) | GB2299957B (sv) |
IT (1) | IT1283615B1 (sv) |
NL (1) | NL1002904C2 (sv) |
SE (1) | SE509606C2 (sv) |
TW (1) | TW419497B (sv) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5574166A (en) * | 1995-04-19 | 1996-11-12 | Ciba-Geigy Corporation | Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole |
US5977219A (en) * | 1997-10-30 | 1999-11-02 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
FR2755444B1 (fr) * | 1996-11-07 | 2004-10-08 | Ciba Sc Holding Ag | Composition de revetement comprenant un compose stabilisant ledit compose et son utilisation |
US6166218A (en) * | 1996-11-07 | 2000-12-26 | Ciba Specialty Chemicals Corporation | Benzotriazole UV absorbers having enhanced durability |
EP0975421B1 (en) | 1997-04-15 | 2014-06-18 | Basf Se | Preparation of low-dust stabilisers |
DE19723779A1 (de) * | 1997-06-06 | 1998-12-10 | Agfa Gevaert Ag | Inkjet-System |
US6383716B1 (en) | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
JP3448851B2 (ja) * | 1997-11-28 | 2003-09-22 | タキロン株式会社 | 添加剤含有樹脂成形品及びその製造方法 |
US5948150A (en) * | 1998-05-05 | 1999-09-07 | Hewlett-Packard Company | Composition to improve colorfastness of a printed image |
WO2000014126A1 (de) * | 1998-09-09 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Photostabiles chromophor-system |
AU738331B2 (en) * | 1999-02-19 | 2001-09-13 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
EP1046670B1 (en) * | 1999-04-23 | 2003-07-09 | Nippon Mitsubishi Oil Corporation | Ultraviolet absorptive resin composition |
US6268415B1 (en) | 1999-05-03 | 2001-07-31 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
CA2372686A1 (en) * | 1999-05-03 | 2000-11-09 | Ciba Specialty Chemicals Holding Inc. | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole uv absorbers and laminated articles derived therefrom |
US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
US6187845B1 (en) * | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
EP1068866A3 (de) * | 1999-07-12 | 2004-03-17 | Ciba SC Holding AG | Verwendung von Mischungen aus Mikropigmenten zur Bräunungsverhinderung und Aufhellung der Haut und Haare |
KR100689232B1 (ko) * | 2000-02-01 | 2007-03-02 | 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 | 내구성 uv 흡수제를 사용한 내용물의 보호방법 |
US6392056B1 (en) * | 2000-08-03 | 2002-05-21 | Ciba Specialty Chemical Corporation | 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith |
US6451887B1 (en) * | 2000-08-03 | 2002-09-17 | Ciba Specialty Chemicals Corporation | Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith |
US6387992B1 (en) | 2000-11-27 | 2002-05-14 | Ciba Specialty Chemicals Corporation | Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith |
US6649770B1 (en) | 2000-11-27 | 2003-11-18 | Ciba Specialty Chemicals Corporation | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof |
ATE329973T1 (de) * | 2001-01-16 | 2006-07-15 | Ciba Sc Holding Ag | Tintenstrahldrucktinte und -aufzeichnungsmaterial |
JP4993421B2 (ja) * | 2001-06-07 | 2012-08-08 | 株式会社Adeka | 合成樹脂組成物 |
EP1476503A1 (en) * | 2002-02-19 | 2004-11-17 | Ciba SC Holding AG | Containers or films comprising hydroxyphenylbenzotriazole uv absorbers for protecting contents against the effects of uv radiation |
US20050209252A1 (en) * | 2002-03-29 | 2005-09-22 | Che-Ming Teng | Cancer treatment |
EP1520450B1 (en) | 2002-06-06 | 2017-08-02 | UDC Ireland Limited | Electroluminescent device |
DE10228186A1 (de) * | 2002-06-24 | 2004-01-22 | Merck Patent Gmbh | UV-stabilisierte Partikel |
KR100950626B1 (ko) * | 2002-06-24 | 2010-04-01 | 메르크 파텐트 게엠베하 | Uv-안정화 입자 |
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US20060134334A1 (en) * | 2004-12-22 | 2006-06-22 | Marc Chilla | Process for the production of primer surfacer-free multi-layer coatings |
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US20070238814A1 (en) * | 2006-04-10 | 2007-10-11 | Basf Corporation | Method of making coating compositions |
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US7847103B2 (en) * | 2008-10-04 | 2010-12-07 | Chia-Hu Chang | Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole |
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WO2023205223A1 (en) | 2022-04-21 | 2023-10-26 | Covestro (Netherlands) B.V. | Radiation curable compositions for coating optical fibers |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4315848A (en) * | 1979-05-10 | 1982-02-16 | Ciba-Geigy Corporation | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions |
US4379721A (en) * | 1980-03-14 | 1983-04-12 | Spezial-Papiermaschinenfabrik August Alfred Krupp Gmbh & Co. | Pressure sensitive recording materials |
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JPS4967378A (sv) * | 1972-11-02 | 1974-06-29 | ||
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1995
- 1995-04-19 US US08/424,843 patent/US5574166A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,850 patent/US5563242A/en not_active Expired - Lifetime
- 1995-06-06 US US08/466,851 patent/US5554760A/en not_active Expired - Lifetime
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1996
- 1996-04-05 US US08/628,433 patent/US5607987A/en not_active Expired - Lifetime
- 1996-04-10 SE SE9601345A patent/SE509606C2/sv not_active IP Right Cessation
- 1996-04-10 GB GB9607427A patent/GB2299957B/en not_active Expired - Lifetime
- 1996-04-10 EP EP96810220A patent/EP0738718A1/en not_active Withdrawn
- 1996-04-16 DE DE19615000A patent/DE19615000A1/de not_active Ceased
- 1996-04-17 KR KR1019960012131A patent/KR100426626B1/ko not_active IP Right Cessation
- 1996-04-17 AU AU50731/96A patent/AU707202B2/en not_active Ceased
- 1996-04-17 CA CA002174411A patent/CA2174411C/en not_active Expired - Fee Related
- 1996-04-17 CA CA002174412A patent/CA2174412A1/en not_active Abandoned
- 1996-04-17 BE BE9600333A patent/BE1010550A3/fr not_active IP Right Cessation
- 1996-04-18 KR KR1019960012170A patent/KR100378233B1/ko not_active IP Right Cessation
- 1996-04-18 FR FR9604847A patent/FR2733239B1/fr not_active Expired - Lifetime
- 1996-04-18 IT IT96MI000751A patent/IT1283615B1/it active IP Right Grant
- 1996-04-18 CN CN96105137A patent/CN1066181C/zh not_active Expired - Lifetime
- 1996-04-18 CN CN96105141A patent/CN1059899C/zh not_active Expired - Lifetime
- 1996-04-18 ES ES009600874A patent/ES2130930B1/es not_active Expired - Fee Related
- 1996-04-18 AU AU50784/96A patent/AU706957B2/en not_active Ceased
- 1996-04-18 AT AT0070596A patent/AT405936B/de not_active IP Right Cessation
- 1996-04-19 BR BR9601991A patent/BR9601991A/pt not_active IP Right Cessation
- 1996-04-19 JP JP12246696A patent/JP3309153B2/ja not_active Expired - Lifetime
- 1996-04-19 NL NL1002904A patent/NL1002904C2/nl not_active IP Right Cessation
- 1996-04-19 JP JP8122465A patent/JPH08291151A/ja active Pending
- 1996-04-19 BR BR9601992A patent/BR9601992A/pt not_active IP Right Cessation
- 1996-05-14 TW TW085105661A patent/TW419497B/zh not_active IP Right Cessation
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