MY7400057A - A process for etchding a semiconductor device - Google Patents
A process for etchding a semiconductor deviceInfo
- Publication number
- MY7400057A MY7400057A MY57/74A MY7400057A MY7400057A MY 7400057 A MY7400057 A MY 7400057A MY 57/74 A MY57/74 A MY 57/74A MY 7400057 A MY7400057 A MY 7400057A MY 7400057 A MY7400057 A MY 7400057A
- Authority
- MY
- Malaysia
- Prior art keywords
- etchding
- semiconductor device
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
- H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73571968A | 1968-06-10 | 1968-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY7400057A true MY7400057A (en) | 1974-12-31 |
Family
ID=24956905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MY57/74A MY7400057A (en) | 1968-06-10 | 1974-12-30 | A process for etchding a semiconductor device |
Country Status (8)
| Country | Link |
|---|---|
| BR (1) | BR6909609D0 (https=) |
| DE (1) | DE1929084C3 (https=) |
| ES (1) | ES368134A1 (https=) |
| FR (1) | FR2011513B1 (https=) |
| GB (1) | GB1228083A (https=) |
| MY (1) | MY7400057A (https=) |
| NL (1) | NL6908748A (https=) |
| SE (1) | SE355692B (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2288138A1 (fr) * | 1974-10-18 | 1976-05-14 | Radiotechnique Compelec | Procede d'attaque de l'alumine |
| US4230523A (en) * | 1978-12-29 | 1980-10-28 | International Business Machines Corporation | Etchant for silicon dioxide films disposed atop silicon or metallic silicides |
| US4517106A (en) * | 1984-04-26 | 1985-05-14 | Allied Corporation | Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions |
| US4620934A (en) * | 1984-04-26 | 1986-11-04 | Allied Corporation | Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4 |
| DE19935446A1 (de) | 1999-07-28 | 2001-02-01 | Merck Patent Gmbh | Ätzlösung, Flußsäure enthaltend |
| US7192860B2 (en) * | 2002-06-20 | 2007-03-20 | Honeywell International Inc. | Highly selective silicon oxide etching compositions |
| CN112099311B (zh) * | 2020-09-22 | 2024-05-21 | 桂林电子科技大学 | 一种基于aao纳米结构光刻掩膜版的制备方法 |
-
1969
- 1969-06-03 GB GB1228083D patent/GB1228083A/en not_active Expired
- 1969-06-07 ES ES368134A patent/ES368134A1/es not_active Expired
- 1969-06-09 DE DE1929084A patent/DE1929084C3/de not_active Expired
- 1969-06-09 SE SE08148/69A patent/SE355692B/xx unknown
- 1969-06-09 NL NL6908748A patent/NL6908748A/xx not_active Application Discontinuation
- 1969-06-10 BR BR209609/69A patent/BR6909609D0/pt unknown
- 1969-06-10 FR FR6919175A patent/FR2011513B1/fr not_active Expired
-
1974
- 1974-12-30 MY MY57/74A patent/MY7400057A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1929084A1 (de) | 1969-12-11 |
| DE1929084B2 (de) | 1975-01-09 |
| SE355692B (https=) | 1973-04-30 |
| BR6909609D0 (pt) | 1973-01-02 |
| FR2011513B1 (https=) | 1973-10-19 |
| DE1929084C3 (de) | 1980-05-08 |
| GB1228083A (https=) | 1971-04-15 |
| NL6908748A (https=) | 1969-12-12 |
| FR2011513A1 (https=) | 1970-03-06 |
| ES368134A1 (es) | 1971-06-16 |
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