SE355692B - - Google Patents

Info

Publication number
SE355692B
SE355692B SE08148/69A SE814869A SE355692B SE 355692 B SE355692 B SE 355692B SE 08148/69 A SE08148/69 A SE 08148/69A SE 814869 A SE814869 A SE 814869A SE 355692 B SE355692 B SE 355692B
Authority
SE
Sweden
Application number
SE08148/69A
Inventor
H Deens
E Buckley
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE355692B publication Critical patent/SE355692B/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
SE08148/69A 1968-06-10 1969-06-09 SE355692B (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73571968A 1968-06-10 1968-06-10

Publications (1)

Publication Number Publication Date
SE355692B true SE355692B (https=) 1973-04-30

Family

ID=24956905

Family Applications (1)

Application Number Title Priority Date Filing Date
SE08148/69A SE355692B (https=) 1968-06-10 1969-06-09

Country Status (8)

Country Link
BR (1) BR6909609D0 (https=)
DE (1) DE1929084C3 (https=)
ES (1) ES368134A1 (https=)
FR (1) FR2011513B1 (https=)
GB (1) GB1228083A (https=)
MY (1) MY7400057A (https=)
NL (1) NL6908748A (https=)
SE (1) SE355692B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288138A1 (fr) * 1974-10-18 1976-05-14 Radiotechnique Compelec Procede d'attaque de l'alumine
US4230523A (en) * 1978-12-29 1980-10-28 International Business Machines Corporation Etchant for silicon dioxide films disposed atop silicon or metallic silicides
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
DE19935446A1 (de) 1999-07-28 2001-02-01 Merck Patent Gmbh Ätzlösung, Flußsäure enthaltend
US7192860B2 (en) * 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
CN112099311B (zh) * 2020-09-22 2024-05-21 桂林电子科技大学 一种基于aao纳米结构光刻掩膜版的制备方法

Also Published As

Publication number Publication date
DE1929084A1 (de) 1969-12-11
DE1929084B2 (de) 1975-01-09
MY7400057A (en) 1974-12-31
BR6909609D0 (pt) 1973-01-02
FR2011513B1 (https=) 1973-10-19
DE1929084C3 (de) 1980-05-08
GB1228083A (https=) 1971-04-15
NL6908748A (https=) 1969-12-12
FR2011513A1 (https=) 1970-03-06
ES368134A1 (es) 1971-06-16

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