MY7400057A - A process for etchding a semiconductor device - Google Patents

A process for etchding a semiconductor device

Info

Publication number
MY7400057A
MY7400057A MY7400057A MY7400057A MY7400057A MY 7400057 A MY7400057 A MY 7400057A MY 7400057 A MY7400057 A MY 7400057A MY 7400057 A MY7400057 A MY 7400057A MY 7400057 A MY7400057 A MY 7400057A
Authority
MY
Malaysia
Prior art keywords
etchding
semiconductor device
semiconductor
Prior art date
Application number
MY7400057A
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of MY7400057A publication Critical patent/MY7400057A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/311Etching the insulating layers by chemical or physical means
    • H01L21/31105Etching inorganic layers
    • H01L21/31111Etching inorganic layers by chemical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Weting (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
MY7400057A 1968-06-10 1974-12-30 A process for etchding a semiconductor device MY7400057A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73571968A 1968-06-10 1968-06-10

Publications (1)

Publication Number Publication Date
MY7400057A true MY7400057A (en) 1974-12-31

Family

ID=24956905

Family Applications (1)

Application Number Title Priority Date Filing Date
MY7400057A MY7400057A (en) 1968-06-10 1974-12-30 A process for etchding a semiconductor device

Country Status (8)

Country Link
BR (1) BR6909609D0 (en)
DE (1) DE1929084C3 (en)
ES (1) ES368134A1 (en)
FR (1) FR2011513B1 (en)
GB (1) GB1228083A (en)
MY (1) MY7400057A (en)
NL (1) NL6908748A (en)
SE (1) SE355692B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288138A1 (en) * 1974-10-18 1976-05-14 Radiotechnique Compelec Removal of aluminium oxide layer by etching - using a solution of fluoride in an organic solvent
US4230523A (en) * 1978-12-29 1980-10-28 International Business Machines Corporation Etchant for silicon dioxide films disposed atop silicon or metallic silicides
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
DE19935446A1 (en) 1999-07-28 2001-02-01 Merck Patent Gmbh Etching solution containing hydrofluoric acid
US7192860B2 (en) 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
CN112099311B (en) * 2020-09-22 2024-05-21 桂林电子科技大学 Preparation method of photoetching mask based on AAO nanostructure

Also Published As

Publication number Publication date
FR2011513B1 (en) 1973-10-19
DE1929084A1 (en) 1969-12-11
BR6909609D0 (en) 1973-01-02
ES368134A1 (en) 1971-06-16
FR2011513A1 (en) 1970-03-06
GB1228083A (en) 1971-04-15
NL6908748A (en) 1969-12-12
DE1929084C3 (en) 1980-05-08
DE1929084B2 (en) 1975-01-09
SE355692B (en) 1973-04-30

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