NL6908748A - - Google Patents

Info

Publication number
NL6908748A
NL6908748A NL6908748A NL6908748A NL6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A
Authority
NL
Netherlands
Application number
NL6908748A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6908748A publication Critical patent/NL6908748A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
NL6908748A 1968-06-10 1969-06-09 NL6908748A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73571968A 1968-06-10 1968-06-10

Publications (1)

Publication Number Publication Date
NL6908748A true NL6908748A (en) 1969-12-12

Family

ID=24956905

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6908748A NL6908748A (en) 1968-06-10 1969-06-09

Country Status (8)

Country Link
BR (1) BR6909609D0 (en)
DE (1) DE1929084C3 (en)
ES (1) ES368134A1 (en)
FR (1) FR2011513B1 (en)
GB (1) GB1228083A (en)
MY (1) MY7400057A (en)
NL (1) NL6908748A (en)
SE (1) SE355692B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288138A1 (en) * 1974-10-18 1976-05-14 Radiotechnique Compelec Removal of aluminium oxide layer by etching - using a solution of fluoride in an organic solvent
US4230523A (en) * 1978-12-29 1980-10-28 International Business Machines Corporation Etchant for silicon dioxide films disposed atop silicon or metallic silicides
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
DE19935446A1 (en) 1999-07-28 2001-02-01 Merck Patent Gmbh Etching solution containing hydrofluoric acid
US7192860B2 (en) * 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
CN112099311A (en) * 2020-09-22 2020-12-18 桂林电子科技大学 Preparation method of photoetching mask plate based on AAO nano structure

Also Published As

Publication number Publication date
ES368134A1 (en) 1971-06-16
DE1929084B2 (en) 1975-01-09
SE355692B (en) 1973-04-30
FR2011513A1 (en) 1970-03-06
MY7400057A (en) 1974-12-31
DE1929084A1 (en) 1969-12-11
DE1929084C3 (en) 1980-05-08
FR2011513B1 (en) 1973-10-19
GB1228083A (en) 1971-04-15
BR6909609D0 (en) 1973-01-02

Similar Documents

Publication Publication Date Title
AU1946070A (en)
AU428130B2 (en)
AU2374870A (en)
AU5184069A (en)
AU6168869A (en)
FR2011513B1 (en)
AU6171569A (en)
AU429879B2 (en)
AU416157B2 (en)
AU2581067A (en)
AU4811568A (en)
AU421558B1 (en)
AR203075Q (en)
AU3224368A (en)
AU3789668A (en)
AU4744468A (en)
AU2580267A (en)
AU2889368A (en)
BE709320A (en)
BE709119A (en)
AU479894A (en)
BE708951A (en)
BE709138A (en)
BE708933A (en)
AU3083868A (en)

Legal Events

Date Code Title Description
BV The patent application has lapsed