NL6908748A - - Google Patents

Info

Publication number
NL6908748A
NL6908748A NL6908748A NL6908748A NL6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A NL 6908748 A NL6908748 A NL 6908748A
Authority
NL
Netherlands
Application number
NL6908748A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6908748A publication Critical patent/NL6908748A/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
NL6908748A 1968-06-10 1969-06-09 NL6908748A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73571968A 1968-06-10 1968-06-10

Publications (1)

Publication Number Publication Date
NL6908748A true NL6908748A (https=) 1969-12-12

Family

ID=24956905

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6908748A NL6908748A (https=) 1968-06-10 1969-06-09

Country Status (8)

Country Link
BR (1) BR6909609D0 (https=)
DE (1) DE1929084C3 (https=)
ES (1) ES368134A1 (https=)
FR (1) FR2011513B1 (https=)
GB (1) GB1228083A (https=)
MY (1) MY7400057A (https=)
NL (1) NL6908748A (https=)
SE (1) SE355692B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288138A1 (fr) * 1974-10-18 1976-05-14 Radiotechnique Compelec Procede d'attaque de l'alumine
US4230523A (en) * 1978-12-29 1980-10-28 International Business Machines Corporation Etchant for silicon dioxide films disposed atop silicon or metallic silicides
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
DE19935446A1 (de) 1999-07-28 2001-02-01 Merck Patent Gmbh Ätzlösung, Flußsäure enthaltend
US7192860B2 (en) * 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
CN112099311B (zh) * 2020-09-22 2024-05-21 桂林电子科技大学 一种基于aao纳米结构光刻掩膜版的制备方法

Also Published As

Publication number Publication date
DE1929084A1 (de) 1969-12-11
DE1929084B2 (de) 1975-01-09
MY7400057A (en) 1974-12-31
SE355692B (https=) 1973-04-30
BR6909609D0 (pt) 1973-01-02
FR2011513B1 (https=) 1973-10-19
DE1929084C3 (de) 1980-05-08
GB1228083A (https=) 1971-04-15
FR2011513A1 (https=) 1970-03-06
ES368134A1 (es) 1971-06-16

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Legal Events

Date Code Title Description
BV The patent application has lapsed