MY145561A - A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof - Google Patents

A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof

Info

Publication number
MY145561A
MY145561A MYPI20050922A MYPI20050922A MY145561A MY 145561 A MY145561 A MY 145561A MY PI20050922 A MYPI20050922 A MY PI20050922A MY PI20050922 A MYPI20050922 A MY PI20050922A MY 145561 A MY145561 A MY 145561A
Authority
MY
Malaysia
Prior art keywords
imaging
deep ultraviolet
materials
top coating
photoresist
Prior art date
Application number
MYPI20050922A
Other languages
English (en)
Inventor
Francis M Houlihan
Ralph R Dammel
Andrew R Romano
Raj Sakamuri
Original Assignee
Az Electronic Materials Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/044,305 external-priority patent/US7473512B2/en
Application filed by Az Electronic Materials Japan filed Critical Az Electronic Materials Japan
Publication of MY145561A publication Critical patent/MY145561A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
MYPI20050922A 2004-03-09 2005-03-07 A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof MY145561A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/796,376 US20050202351A1 (en) 2004-03-09 2004-03-09 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
US10/875,596 US20050202347A1 (en) 2004-03-09 2004-06-24 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
US11/044,305 US7473512B2 (en) 2004-03-09 2005-01-27 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Publications (1)

Publication Number Publication Date
MY145561A true MY145561A (en) 2012-02-29

Family

ID=34919858

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20050922A MY145561A (en) 2004-03-09 2005-03-07 A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof

Country Status (4)

Country Link
US (2) US20050202351A1 (https=)
JP (2) JP4839470B2 (https=)
CN (1) CN1930524B (https=)
MY (1) MY145561A (https=)

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Also Published As

Publication number Publication date
US20050202351A1 (en) 2005-09-15
JP2007528511A (ja) 2007-10-11
US20050202347A1 (en) 2005-09-15
JP5114806B2 (ja) 2013-01-09
JP2011145695A (ja) 2011-07-28
CN1930524A (zh) 2007-03-14
CN1930524B (zh) 2012-07-18
JP4839470B2 (ja) 2011-12-21

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