MY132186A - Semiconductor device and process for producing the same. - Google Patents

Semiconductor device and process for producing the same.

Info

Publication number
MY132186A
MY132186A MYPI96001700A MYPI9601700A MY132186A MY 132186 A MY132186 A MY 132186A MY PI96001700 A MYPI96001700 A MY PI96001700A MY PI9601700 A MYPI9601700 A MY PI9601700A MY 132186 A MY132186 A MY 132186A
Authority
MY
Malaysia
Prior art keywords
silicon substrate
oxide
predetermined areas
forming
oxide film
Prior art date
Application number
MYPI96001700A
Other languages
English (en)
Inventor
Hideo Miura
Shuji Ikeda
Norio Suzuki
Naoto Saito
Asao Nishimura
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of MY132186A publication Critical patent/MY132186A/en

Links

Classifications

    • H10W10/012—
    • H10P14/60—
    • H10W10/13—

Landscapes

  • Element Separation (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
MYPI96001700A 1995-05-08 1996-05-06 Semiconductor device and process for producing the same. MY132186A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7109585A JPH08306678A (ja) 1995-05-08 1995-05-08 半導体装置の製造方法及び半導体装置

Publications (1)

Publication Number Publication Date
MY132186A true MY132186A (en) 2007-09-28

Family

ID=14514002

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI96001700A MY132186A (en) 1995-05-08 1996-05-06 Semiconductor device and process for producing the same.

Country Status (6)

Country Link
JP (1) JPH08306678A (OSRAM)
KR (1) KR19990008315A (OSRAM)
IN (1) IN187708B (OSRAM)
MY (1) MY132186A (OSRAM)
TW (1) TW326099B (OSRAM)
WO (1) WO1996036073A1 (OSRAM)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51139263A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Method of selective oxidation of silicon substrate
JPS5249771A (en) * 1975-10-17 1977-04-21 Matsushita Electric Ind Co Ltd Process for production of semiconductor device
JPS5739551A (en) * 1980-08-21 1982-03-04 Seiko Epson Corp Manufacture of selectively oxidized mask
JPH0628282B2 (ja) * 1984-09-19 1994-04-13 ソニー株式会社 半導体装置の製造方法
JP3403210B2 (ja) * 1992-02-14 2003-05-06 富士通株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
KR19990008315A (ko) 1999-01-25
WO1996036073A1 (fr) 1996-11-14
TW326099B (en) 1998-02-01
JPH08306678A (ja) 1996-11-22
IN187708B (OSRAM) 2002-06-08

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