MY117926A - Light absorbing layer for ii-vi semiconductor light emitting devices. - Google Patents
Light absorbing layer for ii-vi semiconductor light emitting devices.Info
- Publication number
- MY117926A MY117926A MYPI98003824A MYPI9803824A MY117926A MY 117926 A MY117926 A MY 117926A MY PI98003824 A MYPI98003824 A MY PI98003824A MY PI9803824 A MYPI9803824 A MY PI9803824A MY 117926 A MY117926 A MY 117926A
- Authority
- MY
- Malaysia
- Prior art keywords
- absorbing layer
- light emitting
- emitting devices
- semiconductor
- light absorbing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/823—Materials of the light-emitting regions comprising only Group II-VI materials, e.g. ZnO
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/0014—Measuring characteristics or properties thereof
- H01S5/0021—Degradation or life time measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
- H01S5/0651—Mode control
- H01S5/0653—Mode suppression, e.g. specific multimode
- H01S5/0655—Single transverse or lateral mode emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2218—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties
- H01S5/2219—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties absorbing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/920,179 US5963573A (en) | 1997-08-25 | 1997-08-25 | Light absorbing layer for II-VI semiconductor light emitting devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY117926A true MY117926A (en) | 2004-08-30 |
Family
ID=25443299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI98003824A MY117926A (en) | 1997-08-25 | 1998-08-21 | Light absorbing layer for ii-vi semiconductor light emitting devices. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5963573A (cg-RX-API-DMAC10.html) |
| EP (1) | EP1008213B1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP4335451B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR100601116B1 (cg-RX-API-DMAC10.html) |
| CN (1) | CN1114980C (cg-RX-API-DMAC10.html) |
| AU (1) | AU8575798A (cg-RX-API-DMAC10.html) |
| DE (1) | DE69839560D1 (cg-RX-API-DMAC10.html) |
| MY (1) | MY117926A (cg-RX-API-DMAC10.html) |
| WO (1) | WO1999010956A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3925753B2 (ja) * | 1997-10-24 | 2007-06-06 | ソニー株式会社 | 半導体素子およびその製造方法ならびに半導体発光素子 |
| JP4147602B2 (ja) * | 1998-02-02 | 2008-09-10 | ソニー株式会社 | 自励発振型半導体レーザ |
| DE19963807A1 (de) * | 1999-12-30 | 2001-07-19 | Osram Opto Semiconductors Gmbh | Streifenlaserdiodenelement |
| US6832034B2 (en) * | 2002-06-21 | 2004-12-14 | 3M Innovative Properties Company | Optical waveguide |
| JP2004296461A (ja) * | 2003-03-25 | 2004-10-21 | Sharp Corp | 酸化物半導体発光素子 |
| JP3857294B2 (ja) * | 2004-11-11 | 2006-12-13 | 三菱電機株式会社 | 半導体レーザ |
| DE102006046297A1 (de) * | 2006-09-29 | 2008-04-03 | Osram Opto Semiconductors Gmbh | Halbleiterlaser |
| DE102012109175B4 (de) | 2012-09-27 | 2019-02-28 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5248631A (en) * | 1990-08-24 | 1993-09-28 | Minnesota Mining And Manufacturing Company | Doping of iib-via semiconductors during molecular beam epitaxy using neutral free radicals |
| CN1119358A (zh) * | 1991-05-15 | 1996-03-27 | 明尼苏达州采矿制造公司 | 蓝-绿激光二极管 |
| US5404027A (en) * | 1991-05-15 | 1995-04-04 | Minnesota Mining & Manufacturing Compay | Buried ridge II-VI laser diode |
| US5213998A (en) * | 1991-05-15 | 1993-05-25 | Minnesota Mining And Manufacturing Company | Method for making an ohmic contact for p-type group II-VI compound semiconductors |
| US5274269A (en) * | 1991-05-15 | 1993-12-28 | Minnesota Mining And Manufacturing Company | Ohmic contact for p-type group II-IV compound semiconductors |
| US5396103A (en) * | 1991-05-15 | 1995-03-07 | Minnesota Mining And Manufacturing Company | Graded composition ohmic contact for P-type II-VI semiconductors |
| US5291507A (en) * | 1991-05-15 | 1994-03-01 | Minnesota Mining And Manufacturing Company | Blue-green laser diode |
| US5319219A (en) * | 1992-05-22 | 1994-06-07 | Minnesota Mining And Manufacturing Company | Single quantum well II-VI laser diode without cladding |
| RU94046132A (ru) * | 1992-05-22 | 1996-09-27 | Миннесота Майнинг энд Мануфакчуринг Компани (US) | Способ управления системой молекулярной пучковой эпитаксии /mbe/ во время изготовления электролюминисцентного прибора на полупроводниковом ii-yi соединении и ii-yi лазерные диоды |
| JP2809978B2 (ja) * | 1993-10-20 | 1998-10-15 | 株式会社東芝 | 半導体レ−ザ素子 |
| US5488233A (en) * | 1993-03-11 | 1996-01-30 | Kabushiki Kaisha Toshiba | Semiconductor light-emitting device with compound semiconductor layer |
| JPH077183A (ja) * | 1993-06-17 | 1995-01-10 | Rohm Co Ltd | 半導体発光装置及びその製造方法 |
| US5422902A (en) * | 1993-07-02 | 1995-06-06 | Philips Electronics North America Corporation | BeTe-ZnSe graded band gap ohmic contact to p-type ZnSe semiconductors |
| US5742629A (en) * | 1995-07-21 | 1998-04-21 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser and production method thereof |
-
1997
- 1997-08-25 US US08/920,179 patent/US5963573A/en not_active Expired - Lifetime
-
1998
- 1998-07-20 WO PCT/US1998/014973 patent/WO1999010956A1/en not_active Ceased
- 1998-07-20 AU AU85757/98A patent/AU8575798A/en not_active Abandoned
- 1998-07-20 EP EP98936915A patent/EP1008213B1/en not_active Expired - Lifetime
- 1998-07-20 CN CN98808435A patent/CN1114980C/zh not_active Expired - Fee Related
- 1998-07-20 KR KR1020007001848A patent/KR100601116B1/ko not_active Expired - Fee Related
- 1998-07-20 DE DE69839560T patent/DE69839560D1/de not_active Expired - Lifetime
- 1998-07-20 JP JP2000556531A patent/JP4335451B2/ja not_active Expired - Fee Related
- 1998-08-21 MY MYPI98003824A patent/MY117926A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002519855A (ja) | 2002-07-02 |
| EP1008213A1 (en) | 2000-06-14 |
| CN1268256A (zh) | 2000-09-27 |
| CN1114980C (zh) | 2003-07-16 |
| KR20010023219A (ko) | 2001-03-26 |
| DE69839560D1 (de) | 2008-07-10 |
| JP4335451B2 (ja) | 2009-09-30 |
| AU8575798A (en) | 1999-03-16 |
| KR100601116B1 (ko) | 2006-07-19 |
| US5963573A (en) | 1999-10-05 |
| WO1999010956A1 (en) | 1999-03-04 |
| EP1008213B1 (en) | 2008-05-28 |
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