MXPA06002679A - Deposicion de vapor quimico generado por descarga de brillo. - Google Patents
Deposicion de vapor quimico generado por descarga de brillo.Info
- Publication number
- MXPA06002679A MXPA06002679A MXPA06002679A MXPA06002679A MXPA06002679A MX PA06002679 A MXPA06002679 A MX PA06002679A MX PA06002679 A MXPA06002679 A MX PA06002679A MX PA06002679 A MXPA06002679 A MX PA06002679A MX PA06002679 A MXPA06002679 A MX PA06002679A
- Authority
- MX
- Mexico
- Prior art keywords
- glow discharge
- substrate
- vapor deposition
- chemical vapor
- coating
- Prior art date
Links
- 238000005229 chemical vapour deposition Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US50147703P | 2003-09-09 | 2003-09-09 | |
| PCT/US2004/029442 WO2005049228A2 (en) | 2003-09-09 | 2004-09-07 | Glow discharge-generated chemical vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MXPA06002679A true MXPA06002679A (es) | 2006-06-05 |
Family
ID=34619293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MXPA06002679A MXPA06002679A (es) | 2003-09-09 | 2004-09-07 | Deposicion de vapor quimico generado por descarga de brillo. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20060222779A1 (enExample) |
| EP (1) | EP1663518A2 (enExample) |
| JP (1) | JP2007505219A (enExample) |
| KR (1) | KR20060082858A (enExample) |
| CN (1) | CN100450647C (enExample) |
| BR (1) | BRPI0413769A (enExample) |
| CA (1) | CA2537075A1 (enExample) |
| MX (1) | MXPA06002679A (enExample) |
| WO (1) | WO2005049228A2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006049794A2 (en) * | 2004-10-29 | 2006-05-11 | Dow Global Technologies Inc. | Abrasion resistant coatings by plasma enhanced chemical vapor deposition |
| EP2024533A1 (en) | 2006-05-30 | 2009-02-18 | Fuji Film Manufacturing Europe B.V. | Method and apparatus for deposition using pulsed atmospheric pressure glow discharge |
| EP2109876B1 (en) | 2007-02-13 | 2015-05-06 | Fuji Film Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
| CN101679597B (zh) * | 2007-05-21 | 2015-08-19 | 路博润高级材料公司 | 聚氨酯聚合物 |
| WO2009017964A1 (en) * | 2007-07-30 | 2009-02-05 | Dow Global Technologies Inc. | Atmospheric pressure plasma enhanced chemical vapor deposition process |
| US20100255216A1 (en) * | 2007-11-29 | 2010-10-07 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
| WO2009096785A1 (en) | 2008-02-01 | 2009-08-06 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of a moving substrate |
| JP5473946B2 (ja) | 2008-02-08 | 2014-04-16 | フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． | Ｗｖｔｒバリア性を改善した多層スタック構造体の製造方法 |
| WO2009104957A1 (en) | 2008-02-21 | 2009-08-27 | Fujifilm Manufacturing Europe B.V. | Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration |
| EP2286436A1 (en) * | 2008-06-06 | 2011-02-23 | FUJIFILM Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of moving substrate |
| DE102009006484A1 (de) * | 2009-01-28 | 2010-07-29 | Ahlbrandt System Gmbh | Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas |
| EP2396451B1 (en) | 2009-02-12 | 2012-11-07 | Fujifilm Manufacturing Europe BV | Two layer barrier on polymeric substrate |
| CN111085411B (zh) * | 2020-01-07 | 2022-05-13 | 大连交通大学 | 一种高绝缘电阻二氧化硅薄膜材料及其制备方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2990608B2 (ja) * | 1989-12-13 | 1999-12-13 | 株式会社ブリヂストン | 表面処理方法 |
| US5344462A (en) * | 1992-04-06 | 1994-09-06 | Plasma Plus | Gas plasma treatment for modification of surface wetting properties |
| JPH06330326A (ja) * | 1993-03-26 | 1994-11-29 | Shin Etsu Chem Co Ltd | シリカ薄膜の製造方法 |
| FR2704558B1 (fr) * | 1993-04-29 | 1995-06-23 | Air Liquide | Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement. |
| US5372876A (en) * | 1993-06-02 | 1994-12-13 | Appleton Mills | Papermaking felt with hydrophobic layer |
| US6106659A (en) * | 1997-07-14 | 2000-08-22 | The University Of Tennessee Research Corporation | Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials |
| GB9816077D0 (en) * | 1998-07-24 | 1998-09-23 | Secr Defence | Surface coatings |
| US6118218A (en) * | 1999-02-01 | 2000-09-12 | Sigma Technologies International, Inc. | Steady-state glow-discharge plasma at atmospheric pressure |
| US20020129902A1 (en) * | 1999-05-14 | 2002-09-19 | Babayan Steven E. | Low-temperature compatible wide-pressure-range plasma flow device |
| CA2414197C (en) * | 2000-07-24 | 2010-08-24 | Dow Global Technologies Inc. | Thermoplastic superabsorbent polymer blend compositions and their preparation |
| JP4494792B2 (ja) * | 2002-02-05 | 2010-06-30 | ダウ グローバル テクノロジーズ インコーポレイティド | 支持体上へのコロナによる化学蒸着 |
-
2004
- 2004-09-07 EP EP04816852A patent/EP1663518A2/en not_active Withdrawn
- 2004-09-07 CN CNB2004800250618A patent/CN100450647C/zh not_active Expired - Fee Related
- 2004-09-07 CA CA002537075A patent/CA2537075A1/en not_active Abandoned
- 2004-09-07 KR KR1020067004736A patent/KR20060082858A/ko not_active Withdrawn
- 2004-09-07 MX MXPA06002679A patent/MXPA06002679A/es unknown
- 2004-09-07 WO PCT/US2004/029442 patent/WO2005049228A2/en not_active Ceased
- 2004-09-07 JP JP2006526286A patent/JP2007505219A/ja not_active Withdrawn
- 2004-09-07 BR BRPI0413769-8A patent/BRPI0413769A/pt not_active IP Right Cessation
- 2004-09-07 US US10/567,144 patent/US20060222779A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CA2537075A1 (en) | 2005-06-02 |
| JP2007505219A (ja) | 2007-03-08 |
| EP1663518A2 (en) | 2006-06-07 |
| BRPI0413769A (pt) | 2006-10-31 |
| CN100450647C (zh) | 2009-01-14 |
| WO2005049228A2 (en) | 2005-06-02 |
| WO2005049228A3 (en) | 2005-08-18 |
| KR20060082858A (ko) | 2006-07-19 |
| CN1845797A (zh) | 2006-10-11 |
| US20060222779A1 (en) | 2006-10-05 |
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