CA2537075A1 - Glow discharge-generated chemical vapor deposition - Google Patents

Glow discharge-generated chemical vapor deposition Download PDF

Info

Publication number
CA2537075A1
CA2537075A1 CA002537075A CA2537075A CA2537075A1 CA 2537075 A1 CA2537075 A1 CA 2537075A1 CA 002537075 A CA002537075 A CA 002537075A CA 2537075 A CA2537075 A CA 2537075A CA 2537075 A1 CA2537075 A1 CA 2537075A1
Authority
CA
Canada
Prior art keywords
substrate
electrode
glow discharge
tetraalkylorthosilicate
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002537075A
Other languages
English (en)
French (fr)
Inventor
Aaron M. Gabelnick
Christina A. Lambert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Global Technologies LLC
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2537075A1 publication Critical patent/CA2537075A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Silicon Compounds (AREA)
CA002537075A 2003-09-09 2004-09-07 Glow discharge-generated chemical vapor deposition Abandoned CA2537075A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US50147703P 2003-09-09 2003-09-09
US60/501,477 2003-09-09
PCT/US2004/029442 WO2005049228A2 (en) 2003-09-09 2004-09-07 Glow discharge-generated chemical vapor deposition

Publications (1)

Publication Number Publication Date
CA2537075A1 true CA2537075A1 (en) 2005-06-02

Family

ID=34619293

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002537075A Abandoned CA2537075A1 (en) 2003-09-09 2004-09-07 Glow discharge-generated chemical vapor deposition

Country Status (9)

Country Link
US (1) US20060222779A1 (enExample)
EP (1) EP1663518A2 (enExample)
JP (1) JP2007505219A (enExample)
KR (1) KR20060082858A (enExample)
CN (1) CN100450647C (enExample)
BR (1) BRPI0413769A (enExample)
CA (1) CA2537075A1 (enExample)
MX (1) MXPA06002679A (enExample)
WO (1) WO2005049228A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1807548A2 (en) * 2004-10-29 2007-07-18 Dow Gloval Technologies Inc. Abrasion resistant coatings by plasma enhanced chemical vapor deposition
US8323753B2 (en) 2006-05-30 2012-12-04 Fujifilm Manufacturing Europe B.V. Method for deposition using pulsed atmospheric pressure glow discharge
WO2008100139A1 (en) 2007-02-13 2008-08-21 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
WO2008144615A1 (en) * 2007-05-21 2008-11-27 Dow Global Technologies Inc. Coated object
JP2010535291A (ja) * 2007-07-30 2010-11-18 ダウ グローバル テクノロジーズ インコーポレイティド 大気圧プラズマ化学蒸着方法
US20100255216A1 (en) * 2007-11-29 2010-10-07 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
WO2009096785A1 (en) 2008-02-01 2009-08-06 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of a moving substrate
EP2241165B1 (en) 2008-02-08 2011-08-31 Fujifilm Manufacturing Europe B.V. Method for manufacturing a multi_layer stack structure with improved wvtr barrier property
WO2009104957A1 (en) 2008-02-21 2009-08-27 Fujifilm Manufacturing Europe B.V. Plasma treatment apparatus and method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration
US8609203B2 (en) * 2008-06-06 2013-12-17 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of moving substrate
DE102009006484A1 (de) * 2009-01-28 2010-07-29 Ahlbrandt System Gmbh Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas
EP2396451B1 (en) 2009-02-12 2012-11-07 Fujifilm Manufacturing Europe BV Two layer barrier on polymeric substrate
CN111085411B (zh) * 2020-01-07 2022-05-13 大连交通大学 一种高绝缘电阻二氧化硅薄膜材料及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2990608B2 (ja) * 1989-12-13 1999-12-13 株式会社ブリヂストン 表面処理方法
US5344462A (en) * 1992-04-06 1994-09-06 Plasma Plus Gas plasma treatment for modification of surface wetting properties
JPH06330326A (ja) * 1993-03-26 1994-11-29 Shin Etsu Chem Co Ltd シリカ薄膜の製造方法
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
US5372876A (en) * 1993-06-02 1994-12-13 Appleton Mills Papermaking felt with hydrophobic layer
US6106659A (en) * 1997-07-14 2000-08-22 The University Of Tennessee Research Corporation Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials
GB9816077D0 (en) * 1998-07-24 1998-09-23 Secr Defence Surface coatings
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure
WO2000070117A1 (en) * 1999-05-14 2000-11-23 The Regents Of The University Of California Low-temperature compatible wide-pressure-range plasma flow device
WO2002007791A2 (en) * 2000-07-24 2002-01-31 Dow Global Technologies Inc. Thermoplastic superabsorbent polymer blend compositions and their preparation
EP1472387B1 (en) * 2002-02-05 2008-07-23 Dow Global Technologies Inc. Corona-generated chemical vapor deposition on a substrate

Also Published As

Publication number Publication date
WO2005049228A3 (en) 2005-08-18
KR20060082858A (ko) 2006-07-19
US20060222779A1 (en) 2006-10-05
EP1663518A2 (en) 2006-06-07
JP2007505219A (ja) 2007-03-08
MXPA06002679A (es) 2006-06-05
WO2005049228A2 (en) 2005-06-02
CN100450647C (zh) 2009-01-14
CN1845797A (zh) 2006-10-11
BRPI0413769A (pt) 2006-10-31

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Legal Events

Date Code Title Description
FZDE Discontinued