MXPA04001102A - Sistema de tratamiento de superficie, metodo de tratamiento de superficie y producto elaborado a traves de metodo de tratamiento de superficie. - Google Patents

Sistema de tratamiento de superficie, metodo de tratamiento de superficie y producto elaborado a traves de metodo de tratamiento de superficie.

Info

Publication number
MXPA04001102A
MXPA04001102A MXPA04001102A MXPA04001102A MXPA04001102A MX PA04001102 A MXPA04001102 A MX PA04001102A MX PA04001102 A MXPA04001102 A MX PA04001102A MX PA04001102 A MXPA04001102 A MX PA04001102A MX PA04001102 A MXPA04001102 A MX PA04001102A
Authority
MX
Mexico
Prior art keywords
surface treatment
treatment method
product
product produced
deposition layer
Prior art date
Application number
MXPA04001102A
Other languages
English (en)
Inventor
Cho Cheon-Soo
Original Assignee
Lg Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Electronics Inc filed Critical Lg Electronics Inc
Publication of MXPA04001102A publication Critical patent/MXPA04001102A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F19/00—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers
    • F28F19/02—Preventing the formation of deposits or corrosion, e.g. by using filters or scrapers by using coatings, e.g. vitreous or enamel coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2245/00—Coatings; Surface treatments
    • F28F2245/02—Coatings; Surface treatments hydrophilic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2245/00—Coatings; Surface treatments
    • F28F2245/04—Coatings; Surface treatments hydrophobic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Un sistema de tratamiento de superficie 200 comprende una unidad transportadora 100 para cargar y transportar un objeto de tratamiento de superficie que incluye uno o mas elementos los cuales ya estan procesados; y una unidad de tratamiento de superficie para formar una capa de deposicion en una superficie del objeto de tratamiento de superficie transportado por la unidad transportadora 100 utilizando una reaccion de deposicion de vapores quimicos (CVD); de esta forma, se puede realizar un tratamiento de superficie masivo a manera de formar una capa de deposicion sobre la superficie completa de elementos que constituyen un producto al realizar el tratamiento de superficie formando la capa de deposicion en el producto de manera continua, y por lo tanto, se puede mejorar la funcion del producto.
MXPA04001102A 2002-03-29 2002-12-30 Sistema de tratamiento de superficie, metodo de tratamiento de superficie y producto elaborado a traves de metodo de tratamiento de superficie. MXPA04001102A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020020017509A KR20030078454A (ko) 2002-03-29 2002-03-29 표면처리장치와 그 방법 및 표면처리된 제품
PCT/KR2002/002491 WO2003083164A1 (en) 2002-03-29 2002-12-30 Surface treatment system, surface treatment method and product produced by surface treatment method

Publications (1)

Publication Number Publication Date
MXPA04001102A true MXPA04001102A (es) 2004-05-20

Family

ID=28673040

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA04001102A MXPA04001102A (es) 2002-03-29 2002-12-30 Sistema de tratamiento de superficie, metodo de tratamiento de superficie y producto elaborado a traves de metodo de tratamiento de superficie.

Country Status (8)

Country Link
US (1) US20040244686A1 (es)
EP (1) EP1509634B1 (es)
JP (1) JP2005520050A (es)
KR (1) KR20030078454A (es)
AU (1) AU2002359073B2 (es)
ES (1) ES2369767T3 (es)
MX (1) MXPA04001102A (es)
WO (1) WO2003083164A1 (es)

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DE102004013306A1 (de) * 2004-03-17 2005-10-06 Behr Gmbh & Co. Kg Beschichtungsverfahren
KR100725098B1 (ko) * 2005-11-17 2007-06-04 삼성전자주식회사 반도체 제조설비의 유량조절기 오동작 감지장치 및 그 방법
US20100206229A1 (en) * 2008-05-30 2010-08-19 Alta Devices, Inc. Vapor deposition reactor system
EP2281300A4 (en) * 2008-05-30 2013-07-17 Alta Devices Inc METHOD AND DEVICE FOR A CHEMICAL STEAM SEPARATION REACTOR
US20100212591A1 (en) * 2008-05-30 2010-08-26 Alta Devices, Inc. Reactor lid assembly for vapor deposition
US20100209082A1 (en) * 2008-05-30 2010-08-19 Alta Devices, Inc. Heating lamp system
US8852696B2 (en) * 2008-05-30 2014-10-07 Alta Devices, Inc. Method for vapor deposition
US8859042B2 (en) * 2008-05-30 2014-10-14 Alta Devices, Inc. Methods for heating with lamps
US9169554B2 (en) * 2008-05-30 2015-10-27 Alta Devices, Inc. Wafer carrier track
CN102246274A (zh) * 2008-10-10 2011-11-16 奥塔装置公司 用于气相沉积的同轴喷头
EP2409324A4 (en) 2009-03-16 2013-05-15 Alta Devices Inc WAFER CARRIER TRACK
US9127364B2 (en) 2009-10-28 2015-09-08 Alta Devices, Inc. Reactor clean
KR101904942B1 (ko) * 2011-12-23 2018-10-08 엘지전자 주식회사 플라즈마 증착장치 및 그 제어방법
KR101904941B1 (ko) * 2011-12-22 2018-10-08 엘지전자 주식회사 플라즈마 증착장치 및 그 제어방법
WO2012134083A2 (en) 2011-03-25 2012-10-04 Lg Electronics Inc. Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
JP6003778B2 (ja) 2013-04-03 2016-10-05 株式会社デンソー 熱交換器の製造方法
US10932323B2 (en) 2015-08-03 2021-02-23 Alta Devices, Inc. Reflector and susceptor assembly for chemical vapor deposition reactor
CN111893462B (zh) * 2020-08-05 2022-09-09 上海理想万里晖薄膜设备有限公司 用于cvd设备的方法及相应的cvd设备

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Also Published As

Publication number Publication date
ES2369767T3 (es) 2011-12-05
AU2002359073A1 (en) 2003-10-13
JP2005520050A (ja) 2005-07-07
EP1509634A1 (en) 2005-03-02
US20040244686A1 (en) 2004-12-09
EP1509634B1 (en) 2011-08-24
WO2003083164A1 (en) 2003-10-09
AU2002359073B2 (en) 2005-07-07
KR20030078454A (ko) 2003-10-08

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