MX361608B - Fuente de desposicion por arco que tiene un campo electrico definido. - Google Patents
Fuente de desposicion por arco que tiene un campo electrico definido.Info
- Publication number
- MX361608B MX361608B MX2012015089A MX2012015089A MX361608B MX 361608 B MX361608 B MX 361608B MX 2012015089 A MX2012015089 A MX 2012015089A MX 2012015089 A MX2012015089 A MX 2012015089A MX 361608 B MX361608 B MX 361608B
- Authority
- MX
- Mexico
- Prior art keywords
- cathode
- anode
- arc deposition
- electric field
- deposition source
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0089—Reactive sputtering in metallic mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Abstract
La invención se relaciona con un dispositivo de deposición por arco, que comprende un cátodo, un ánodo, y una fuente de voltaje para colocar el ánodo al potencial positivo con relación al cátodo. El dispositivo también comprende los elementos magnéticos, que producen un campo magnético sobre la superficie catódica, donde el ánodo se coloca cerca del cátodo de una manera tal que las líneas del campo magnético que salen de la superficie catódica alcancen el ánodo.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35727210P | 2010-06-22 | 2010-06-22 | |
PCT/EP2011/002734 WO2011160766A1 (de) | 2010-06-22 | 2011-06-03 | Arc-verdampfungsquelle mit definiertem elektrischem feld |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2012015089A MX2012015089A (es) | 2013-05-28 |
MX361608B true MX361608B (es) | 2018-12-07 |
Family
ID=44487011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2012015089A MX361608B (es) | 2010-06-22 | 2011-06-03 | Fuente de desposicion por arco que tiene un campo electrico definido. |
Country Status (17)
Country | Link |
---|---|
US (1) | US10253407B2 (es) |
EP (1) | EP2585622B1 (es) |
JP (1) | JP6095568B2 (es) |
KR (1) | KR101854936B1 (es) |
CN (1) | CN102947478B (es) |
BR (1) | BR112012033065B1 (es) |
CA (1) | CA2803087C (es) |
ES (1) | ES2666234T3 (es) |
HU (1) | HUE038729T2 (es) |
MX (1) | MX361608B (es) |
MY (1) | MY170012A (es) |
PL (1) | PL2585622T3 (es) |
PT (1) | PT2585622T (es) |
SG (1) | SG186722A1 (es) |
SI (1) | SI2585622T1 (es) |
TW (1) | TWI553132B (es) |
WO (1) | WO2011160766A1 (es) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101979041B1 (ko) | 2011-06-30 | 2019-05-15 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 고성능 공구용 나노층 코팅 |
MX345799B (es) | 2011-09-30 | 2017-02-15 | Oerlikon Surface Solutions Ag Pfäffikon | Recubrimiento de nitruro de titanio aluminio con morfologia adaptada para mejorar la resistencia al desgaste en operaciones de mecanizacion y metodo del mismo. |
EP2607517A1 (en) * | 2011-12-22 | 2013-06-26 | Oerlikon Trading AG, Trübbach | Low temperature arc ion plating coating |
MX348392B (es) * | 2012-10-26 | 2017-06-08 | Pixie Scient Llc | Sistemas y metodos para diagnostico de la salud. |
JP6842233B2 (ja) | 2014-07-29 | 2021-03-17 | サンドビック インテレクチュアル プロパティー アクティエボラーグ | コーティングされた切削工具、及びコーティングされた切削工具の製造方法 |
WO2016191372A1 (en) | 2015-05-22 | 2016-12-01 | Pixie Scientific, Llc | Indicator panels for incontinence products |
RU2715267C2 (ru) * | 2015-12-22 | 2020-02-26 | Сандвик Интеллекчуал Проперти Аб | Режущий инструмент с покрытием и способ |
WO2019136261A1 (en) * | 2018-01-04 | 2019-07-11 | Ih Ip Holdings Limited | Gas phase co-deposition of hydrogen/deuterium loaded metallic structures |
EP3556901B1 (en) * | 2018-04-20 | 2021-03-31 | Plansee Composite Materials Gmbh | Vacuum arc source |
CN114341395A (zh) | 2019-07-03 | 2022-04-12 | 欧瑞康表面解决方案股份公司,普费菲孔 | 阴极电弧源 |
KR102667048B1 (ko) * | 2021-07-20 | 2024-05-22 | 한국생산기술연구원 | 중앙부 함몰형 자기장을 가지는 아크 증발원 및 이를 포함하는 아크 이온 플레이팅 장치, 그리고 이를 이용한 금속 및 금속화합물의 증착방법 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3625848A (en) | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
SU1040631A1 (ru) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Вакуумно-дуговое устройство |
US4620913A (en) | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
WO1991000374A1 (de) * | 1989-06-27 | 1991-01-10 | Hauzer Holding Bv | Verfahren und vorrichtung zur beschichtung von substraten |
US5380421A (en) * | 1992-11-04 | 1995-01-10 | Gorokhovsky; Vladimir I. | Vacuum-arc plasma source |
WO2000016373A1 (de) * | 1998-09-14 | 2000-03-23 | Unaxis Trading Ag | Targetanordnung für eine arc-verdampfungs-kammer |
JP3917348B2 (ja) * | 1999-05-26 | 2007-05-23 | 株式会社神戸製鋼所 | アーク蒸発源、真空蒸着装置及び真空蒸着方法 |
JP4409015B2 (ja) * | 1999-11-30 | 2010-02-03 | 株式会社神戸製鋼所 | アークイオンプレーティング装置 |
CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
JP4000764B2 (ja) * | 2000-09-18 | 2007-10-31 | 日新電機株式会社 | 真空アーク蒸発装置 |
JP4034563B2 (ja) * | 2001-12-27 | 2008-01-16 | 株式会社神戸製鋼所 | 真空アーク蒸発源 |
JP4109503B2 (ja) * | 2002-07-22 | 2008-07-02 | 日新電機株式会社 | 真空アーク蒸着装置 |
ATE459734T1 (de) | 2005-12-16 | 2010-03-15 | Fundacion Tekniker | Kathodenverdampfungsmaschine |
BRPI0719774A2 (pt) * | 2006-10-10 | 2014-04-22 | Oerlikon Trading Ag | Sistema em camadas com pelo menos uma camada de cristal mista de um polióxido |
-
2011
- 2011-06-03 ES ES11727116.3T patent/ES2666234T3/es active Active
- 2011-06-03 PT PT117271163T patent/PT2585622T/pt unknown
- 2011-06-03 CN CN201180030805.5A patent/CN102947478B/zh active Active
- 2011-06-03 SI SI201131460T patent/SI2585622T1/en unknown
- 2011-06-03 JP JP2013515751A patent/JP6095568B2/ja active Active
- 2011-06-03 WO PCT/EP2011/002734 patent/WO2011160766A1/de active Application Filing
- 2011-06-03 PL PL11727116T patent/PL2585622T3/pl unknown
- 2011-06-03 KR KR1020137001390A patent/KR101854936B1/ko active IP Right Grant
- 2011-06-03 EP EP11727116.3A patent/EP2585622B1/de active Active
- 2011-06-03 BR BR112012033065-9A patent/BR112012033065B1/pt active IP Right Grant
- 2011-06-03 CA CA2803087A patent/CA2803087C/en active Active
- 2011-06-03 MX MX2012015089A patent/MX361608B/es active IP Right Grant
- 2011-06-03 HU HUE11727116A patent/HUE038729T2/hu unknown
- 2011-06-03 US US13/805,730 patent/US10253407B2/en active Active
- 2011-06-03 SG SG2012092110A patent/SG186722A1/en unknown
- 2011-06-20 TW TW100121344A patent/TWI553132B/zh active
- 2011-06-30 MY MYPI2012005447A patent/MY170012A/en unknown
Also Published As
Publication number | Publication date |
---|---|
PL2585622T3 (pl) | 2018-07-31 |
JP6095568B2 (ja) | 2017-03-15 |
KR101854936B1 (ko) | 2018-06-14 |
SG186722A1 (en) | 2013-02-28 |
PT2585622T (pt) | 2018-04-20 |
TW201219582A (en) | 2012-05-16 |
WO2011160766A1 (de) | 2011-12-29 |
CA2803087A1 (en) | 2011-12-29 |
SI2585622T1 (en) | 2018-06-29 |
CA2803087C (en) | 2019-11-12 |
KR20130121078A (ko) | 2013-11-05 |
TWI553132B (zh) | 2016-10-11 |
ES2666234T3 (es) | 2018-05-03 |
EP2585622B1 (de) | 2018-01-17 |
JP2013533382A (ja) | 2013-08-22 |
HUE038729T2 (hu) | 2018-11-28 |
CN102947478A (zh) | 2013-02-27 |
MY170012A (en) | 2019-06-20 |
MX2012015089A (es) | 2013-05-28 |
EP2585622A1 (de) | 2013-05-01 |
US10253407B2 (en) | 2019-04-09 |
RU2013102585A (ru) | 2014-08-10 |
BR112012033065B1 (pt) | 2022-04-05 |
US20130126347A1 (en) | 2013-05-23 |
CN102947478B (zh) | 2016-02-17 |
BR112012033065A2 (pt) | 2020-08-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
HC | Change of company name or juridical status |
Owner name: CHIRONWELLS GMBH |
|
FG | Grant or registration |