ATE459734T1 - Kathodenverdampfungsmaschine - Google Patents
KathodenverdampfungsmaschineInfo
- Publication number
- ATE459734T1 ATE459734T1 AT05826678T AT05826678T ATE459734T1 AT E459734 T1 ATE459734 T1 AT E459734T1 AT 05826678 T AT05826678 T AT 05826678T AT 05826678 T AT05826678 T AT 05826678T AT E459734 T1 ATE459734 T1 AT E459734T1
- Authority
- AT
- Austria
- Prior art keywords
- evaporation machine
- cathode
- cathode evaporation
- cathode element
- end surface
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Soil Working Implements (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/ES2005/000687 WO2007068768A1 (es) | 2005-12-16 | 2005-12-16 | Máquina de evaporación catódica |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE459734T1 true ATE459734T1 (de) | 2010-03-15 |
Family
ID=38162586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05826678T ATE459734T1 (de) | 2005-12-16 | 2005-12-16 | Kathodenverdampfungsmaschine |
Country Status (8)
Country | Link |
---|---|
US (1) | US20090050059A1 (de) |
EP (1) | EP1970464B1 (de) |
CN (1) | CN101370957B (de) |
AT (1) | ATE459734T1 (de) |
DE (1) | DE602005019800D1 (de) |
ES (1) | ES2342835T3 (de) |
HK (1) | HK1129430A1 (de) |
WO (1) | WO2007068768A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009008161A1 (de) * | 2009-02-09 | 2010-08-12 | Oerlikon Trading Ag, Trübbach | Modifizierbare Magnetkonfiguration für Arc-Verdampfungsquellen |
JP5649308B2 (ja) * | 2009-04-28 | 2015-01-07 | 株式会社神戸製鋼所 | 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法 |
KR101854936B1 (ko) * | 2010-06-22 | 2018-06-14 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 | 지정된 전기장을 갖는 아크 증착 소스 |
EP2607517A1 (de) * | 2011-12-22 | 2013-06-26 | Oerlikon Trading AG, Trübbach | Niedertemperatur-Lichtbogenionen-Plattierbeschichtung |
JP5946337B2 (ja) * | 2012-06-20 | 2016-07-06 | 株式会社神戸製鋼所 | アーク式蒸発源 |
CN103074580B (zh) * | 2012-12-25 | 2015-08-26 | 王奉瑾 | 采用电磁加热的物理气相沉积设备 |
JP6403269B2 (ja) * | 2014-07-30 | 2018-10-10 | 株式会社神戸製鋼所 | アーク蒸発源 |
US11342168B2 (en) * | 2017-02-14 | 2022-05-24 | Oerlikon Surface Solutions Ag, Pfaffikon | Cathodic arc evaporation with predetermined cathode material removal |
BR112020006716A2 (pt) * | 2017-10-03 | 2020-10-06 | Oerlikon Surface Solutions Ag, Pfäffikon | fonte de arco |
CN114481046A (zh) * | 2022-01-26 | 2022-05-13 | 纳狮新材料有限公司 | 电弧蒸发装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4673477A (en) | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
US4724058A (en) | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
DE3624150C2 (de) * | 1986-07-17 | 1994-02-24 | Leybold Ag | Zerstäubungskatode nach dem Magnetronprinzip |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
DE3800449A1 (de) * | 1988-01-09 | 1989-07-20 | Leybold Ag | Verfahren und einrichtung zur herstellung magnetooptischer, speicher- und loeschfaehiger datentraeger |
DE4009151A1 (de) * | 1990-03-22 | 1991-09-26 | Leybold Ag | Vorrichtung zum beschichten von substraten durch katodenzerstaeubung |
DE4329155A1 (de) | 1993-08-30 | 1995-03-02 | Bloesch W Ag | Magnetfeldkathode |
CA2256847A1 (en) * | 1998-12-22 | 2000-06-22 | Munther Kandah | Particle-free cathodic arc carbon ion source |
DE10010448C1 (de) * | 2000-03-03 | 2002-04-25 | Multi Media Machinery Gmbh | Kathode |
JP4679004B2 (ja) * | 2000-09-26 | 2011-04-27 | 新明和工業株式会社 | アーク蒸発源装置、その駆動方法、及びイオンプレーティング装置 |
BR0116951B1 (pt) | 2001-03-27 | 2011-06-14 | evaporador de arco com guia magnÉtico poderoso para alvos tendo uma grande Área de superfÍcie. | |
DE10127013A1 (de) * | 2001-06-05 | 2002-12-12 | Gabriel Herbert M | Lichtbogen-Verdampfungsvorrichtung |
-
2005
- 2005-12-16 DE DE602005019800T patent/DE602005019800D1/de active Active
- 2005-12-16 US US12/097,728 patent/US20090050059A1/en not_active Abandoned
- 2005-12-16 ES ES05826678T patent/ES2342835T3/es active Active
- 2005-12-16 EP EP05826678A patent/EP1970464B1/de not_active Not-in-force
- 2005-12-16 CN CN2005800525390A patent/CN101370957B/zh not_active Expired - Fee Related
- 2005-12-16 AT AT05826678T patent/ATE459734T1/de not_active IP Right Cessation
- 2005-12-16 WO PCT/ES2005/000687 patent/WO2007068768A1/es active Application Filing
-
2009
- 2009-08-13 HK HK09107449.3A patent/HK1129430A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101370957A (zh) | 2009-02-18 |
EP1970464A1 (de) | 2008-09-17 |
DE602005019800D1 (de) | 2010-04-15 |
EP1970464B1 (de) | 2010-03-03 |
WO2007068768A1 (es) | 2007-06-21 |
US20090050059A1 (en) | 2009-02-26 |
HK1129430A1 (en) | 2009-11-27 |
ES2342835T3 (es) | 2010-07-15 |
CN101370957B (zh) | 2011-01-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |