MX2020007729A - Polvo para recubrimiento de camara de grabado. - Google Patents

Polvo para recubrimiento de camara de grabado.

Info

Publication number
MX2020007729A
MX2020007729A MX2020007729A MX2020007729A MX2020007729A MX 2020007729 A MX2020007729 A MX 2020007729A MX 2020007729 A MX2020007729 A MX 2020007729A MX 2020007729 A MX2020007729 A MX 2020007729A MX 2020007729 A MX2020007729 A MX 2020007729A
Authority
MX
Mexico
Prior art keywords
sub
powder
less
coating
etch chamber
Prior art date
Application number
MX2020007729A
Other languages
English (en)
Inventor
Howard Wallar
Alain Allimant
Original Assignee
Saint Gobain Ct Recherches
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Ct Recherches filed Critical Saint Gobain Ct Recherches
Publication of MX2020007729A publication Critical patent/MX2020007729A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G27/00—Compounds of hafnium
    • C01G27/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
    • C01F17/32—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6 oxide or hydroxide being the only anion, e.g. NaCeO2 or MgxCayEuO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B1/00—Preparing the batches
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/50—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/50—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
    • C04B35/505—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds based on yttrium oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/30—Three-dimensional structures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/30—Three-dimensional structures
    • C01P2002/34—Three-dimensional structures perovskite-type (ABO3)
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/50—Agglomerated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume

Abstract

Un polvo de partículas, un número mayor al 95% de las partículas que tienen una circularidad mayor o igual a 0.85, el polvo contiene más del 99.8% de un óxido de las tierras raras y/o de un óxido de hafnio y/o de un óxido de aluminio, como porcentaje en peso sobre la base de los óxidos, y que tiene: - un tamaño medio de partícula D50 inferior a 15 µm, un percentil 90 del tamaño de partícula D90 inferior a 30 µm, y un índice de dispersión de tamaño (D90 - D10)/D10 inferior a 2; - una densidad relativa superior al 90%.
MX2020007729A 2018-01-31 2019-01-31 Polvo para recubrimiento de camara de grabado. MX2020007729A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1850821A FR3077287B1 (fr) 2018-01-31 2018-01-31 Poudre pour revetement de chambre de gravure
PCT/EP2019/052438 WO2019149854A1 (fr) 2018-01-31 2019-01-31 Poudre pour revetement de chambre de gravure

Publications (1)

Publication Number Publication Date
MX2020007729A true MX2020007729A (es) 2021-01-15

Family

ID=62597595

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2020007729A MX2020007729A (es) 2018-01-31 2019-01-31 Polvo para recubrimiento de camara de grabado.

Country Status (9)

Country Link
US (1) US11731883B2 (es)
EP (1) EP3746406A1 (es)
JP (2) JP2021513001A (es)
KR (2) KR20240036112A (es)
CN (1) CN111670164B (es)
FR (1) FR3077287B1 (es)
MX (1) MX2020007729A (es)
SG (1) SG11202006924QA (es)
WO (1) WO2019149854A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3077286B1 (fr) * 2018-01-31 2022-08-12 Saint Gobain Ct Recherches Barriere environnementale
CN112501541A (zh) * 2020-11-12 2021-03-16 苏州艾美科新材料技术有限公司 一种复合纳米材料及对应的新型纳米涂层
KR102421398B1 (ko) * 2021-11-01 2022-07-15 (주)코미코 Hvof에 의한 고밀도 yf3 코팅층의 제조방법 및 이를 통해 제조된 고밀도 yf3 hvof 코팅층
CN113173779B (zh) * 2021-04-29 2023-07-21 江西工陶院精细陶瓷有限公司 氧化铝填料颗粒及其制备方法、氧化铝填料球的制备方法
KR102416127B1 (ko) * 2021-11-01 2022-07-05 (주)코미코 구상의 yof계 분말의 제조방법, 이를 통해 제조된 구상의 yof계 분말 및 yof계 코팅층
US20230407434A1 (en) * 2022-06-15 2023-12-21 Shine Technologies, Llc Methods and Systems for the Reduction of Rare Earth Metal Oxides

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1642994B8 (en) * 2000-06-29 2017-04-19 Shin-Etsu Chemical Co., Ltd. Rare earth oxid powder used in thermal spray coating
EP1239055B1 (en) * 2001-03-08 2017-03-01 Shin-Etsu Chemical Co., Ltd. Thermal spray spherical particles, and sprayed components
JP4231990B2 (ja) * 2001-03-21 2009-03-04 信越化学工業株式会社 希土類酸化物溶射用粒子およびその製造方法、溶射部材ならびに耐食性部材
JP4560387B2 (ja) * 2004-11-30 2010-10-13 株式会社フジミインコーポレーテッド 溶射用粉末、溶射方法及び溶射皮膜
TWI262110B (en) * 2005-03-04 2006-09-21 Foxconn Tech Co Ltd Method of making porous structure
GB2430671A (en) 2005-09-30 2007-04-04 Fujimi Inc Thermal spray powder including yttria
ES2328395T3 (es) 2005-10-21 2009-11-12 Sulzer Metco (Us) Inc. Un metodo de fabricacion de polvo de oxido metalico de alta pureza y fluido para un sistema de plasma.
JP2008115407A (ja) 2006-10-31 2008-05-22 Fujimi Inc 溶射用粉末及び溶射皮膜の形成方法
FR2943209B1 (fr) 2009-03-12 2013-03-08 Saint Gobain Ct Recherches Torche a plasma avec injecteur lateral
DE102009026655B3 (de) * 2009-06-03 2011-06-30 Linde Aktiengesellschaft, 80331 Verfahren zur Herstellung eines Metallmatrix-Verbundwerkstoffs, Metallmatrix-Verbundwerkstoff und seine Verwendung
JP5417248B2 (ja) * 2010-04-15 2014-02-12 新日鉄住金マテリアルズ株式会社 球状アルミナ粉末の製造方法
TWI518034B (zh) * 2010-04-15 2016-01-21 新日鐵住金高新材料股份有限公司 用以製造球狀氧化鋁粉末之方法
US20130288037A1 (en) * 2012-04-27 2013-10-31 Applied Materials, Inc. Plasma spray coating process enhancement for critical chamber components
FR2998561B1 (fr) * 2012-11-29 2014-11-21 Saint Gobain Ct Recherches Poudre haute purete destinee a la projection thermique
FR2999019A1 (fr) * 2012-11-30 2014-06-06 Saint Gobain Ct Recherches Utilisation d'une poudre a base de silice pour la fabrication d'un element de separation d'une batterie lithium-ion
JP2016065302A (ja) * 2014-09-17 2016-04-28 東京エレクトロン株式会社 プラズマ処理装置用の部品、及び部品の製造方法

Also Published As

Publication number Publication date
WO2019149854A1 (fr) 2019-08-08
EP3746406A1 (fr) 2020-12-09
CN111670164A (zh) 2020-09-15
FR3077287B1 (fr) 2023-09-22
US20210115548A1 (en) 2021-04-22
FR3077287A1 (fr) 2019-08-02
JP2021513001A (ja) 2021-05-20
SG11202006924QA (en) 2020-08-28
CN111670164B (zh) 2023-03-10
KR20200122310A (ko) 2020-10-27
KR20240036112A (ko) 2024-03-19
JP2024054107A (ja) 2024-04-16
US11731883B2 (en) 2023-08-22

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