MX2010000678A - Procesos de fabricacion con tiempo de ciclo reducido para dispositivos resistivos de pelicula gruesa. - Google Patents
Procesos de fabricacion con tiempo de ciclo reducido para dispositivos resistivos de pelicula gruesa.Info
- Publication number
- MX2010000678A MX2010000678A MX2010000678A MX2010000678A MX2010000678A MX 2010000678 A MX2010000678 A MX 2010000678A MX 2010000678 A MX2010000678 A MX 2010000678A MX 2010000678 A MX2010000678 A MX 2010000678A MX 2010000678 A MX2010000678 A MX 2010000678A
- Authority
- MX
- Mexico
- Prior art keywords
- layer
- cycle time
- thick film
- manufacturing processes
- film resistive
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/262—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an insulated metal plate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/46—Heating elements having the shape of rods or tubes non-flexible heating conductor mounted on insulating base
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Details Of Resistors (AREA)
- Laminated Bodies (AREA)
- Non-Adjustable Resistors (AREA)
Abstract
Se proporciona un proceso para formar un dispositivo resistivo tal como una resistencia de carga o un calentador que incluye formar una capa dieléctrica sobre un sustrato, un objetivo, o una capa funcional adyacente, en donde la capa dieléctrica en una forma define una capa sencilla de cinta dieléctrica. La cinta dieléctrica se lamina en el sustrato, el objetivo, o la capa funcional adyacente a través de un ciclo de presión predeterminado sencillo, temperatura y tiempo, y después se forma una capa resistiva en la capa dieléctrica, y se forma una capa protectora sobre la capa resistiva.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/779,745 US8557082B2 (en) | 2007-07-18 | 2007-07-18 | Reduced cycle time manufacturing processes for thick film resistive devices |
PCT/US2008/070014 WO2009012239A2 (en) | 2007-07-18 | 2008-07-14 | Reduced cycle time manufacturing processes for thick film resistive devices |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2010000678A true MX2010000678A (es) | 2010-03-17 |
Family
ID=40137961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2010000678A MX2010000678A (es) | 2007-07-18 | 2008-07-14 | Procesos de fabricacion con tiempo de ciclo reducido para dispositivos resistivos de pelicula gruesa. |
Country Status (8)
Country | Link |
---|---|
US (2) | US8557082B2 (es) |
EP (1) | EP2176869B1 (es) |
JP (1) | JP5588342B2 (es) |
CN (1) | CN101796596B (es) |
CA (1) | CA2693183C (es) |
MX (1) | MX2010000678A (es) |
TW (1) | TWI425529B (es) |
WO (1) | WO2009012239A2 (es) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8557082B2 (en) | 2007-07-18 | 2013-10-15 | Watlow Electric Manufacturing Company | Reduced cycle time manufacturing processes for thick film resistive devices |
US8089337B2 (en) * | 2007-07-18 | 2012-01-03 | Watlow Electric Manufacturing Company | Thick film layered resistive device employing a dielectric tape |
US8061402B2 (en) * | 2008-04-07 | 2011-11-22 | Watlow Electric Manufacturing Company | Method and apparatus for positioning layers within a layered heater system |
CN105325052B (zh) * | 2013-06-14 | 2019-10-08 | 山特维克株式会社 | 二硅化钼基陶瓷加热元件保持结构 |
FR3012008B1 (fr) | 2013-10-11 | 2015-10-23 | Illinois Tool Works | Element chauffant a couche epaisse et equipement de cuisine comportant un tel element chauffant |
EP3101077A4 (en) * | 2014-01-29 | 2017-03-08 | Nakashima Rubber Industry Co., Ltd. | Pre-processing method for adhering rubber layer to inner and outer surfaces of cylindrical object-of-adherence |
CN104936318A (zh) * | 2015-05-14 | 2015-09-23 | 孙庄 | 一种厚膜加热器及其制造工艺 |
EP3626093A1 (de) * | 2018-09-24 | 2020-03-25 | Heraeus Nexensos GmbH | Heizelement für ein system zur bereitstellung eines inhalierbaren aerosols |
KR102392126B1 (ko) * | 2019-08-02 | 2022-04-28 | 주식회사 케이티앤지 | 가열 조립체, 이를 포함하는 에어로졸 발생 장치 및 에어로졸 발생 시스템 |
CN114340421A (zh) * | 2019-09-06 | 2022-04-12 | 日本烟草国际股份有限公司 | 加热器组件 |
EP3962234A1 (de) * | 2020-08-27 | 2022-03-02 | Heraeus Nexensos GmbH | Flexibles heizelement, verfahren zur herstellung eines derartigen heizelements und verwendung eines flexiblen heizelements |
CN112038027B (zh) * | 2020-09-02 | 2022-04-05 | 中国电子科技集团公司第四十九研究所 | 一种高精度转角传感器及其电阻敏感元件的制备方法 |
DE102021211121A1 (de) * | 2021-10-01 | 2023-04-06 | E.G.O. Elektro-Gerätebau GmbH | Heizeinrichtung und Verfahren zur Herstellung einer Heizeinrichtung |
EP4167685A1 (en) * | 2021-10-12 | 2023-04-19 | MAHLE International GmbH | Electric heating device, in particular for a heat exchanger |
GB2618803A (en) * | 2022-05-17 | 2023-11-22 | Dyson Technology Ltd | Thick film heating elements |
Family Cites Families (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1132794A (en) | 1967-04-04 | 1968-11-06 | Matsushita Electric Ind Co Ltd | Improvements in or relating to the manufacture of film-type resistors |
US3648218A (en) * | 1971-04-12 | 1972-03-07 | David Kellerman | Wound resistor arrangement |
US3845443A (en) * | 1972-06-14 | 1974-10-29 | Bailey Meter Co | Thin film resistance thermometer |
US3806098A (en) * | 1972-07-11 | 1974-04-23 | Xodar Corp | Vertical aerating system |
US3880609A (en) * | 1972-12-14 | 1975-04-29 | Richard E Caddock | Method and apparatus for manufacturing cylindrical resistors by thick-film silk-screening |
US3964958A (en) * | 1973-01-24 | 1976-06-22 | Johnston Orin B | Heat bonding device |
DE2450551C2 (de) * | 1974-10-24 | 1977-01-13 | Heraeus Gmbh W C | Elektrischer messwiderstand fuer ein widerstandsthermometer und verfahren zu seiner herstellung |
US4072921A (en) * | 1976-04-27 | 1978-02-07 | Amf Incorporated | Low inductance precision resistor deposited on an adhesive backing and wound on a bobbin |
US4334850A (en) * | 1978-07-31 | 1982-06-15 | Armen Garabedian | Apparatus for making a stress-free plastic article |
JPS56106159A (en) | 1980-01-28 | 1981-08-24 | Hitachi Ltd | Production of sensor for detecting flow speed and flow rate |
JPS57178877A (en) | 1981-04-30 | 1982-11-04 | Oki Electric Ind Co Ltd | Thermal head |
JPS6213285A (ja) | 1985-06-28 | 1987-01-22 | Hitachi Electronics Eng Co Ltd | 厚膜モジユ−ル基板用ロ−ダ・アンロ−ダ |
US4806295A (en) * | 1986-10-31 | 1989-02-21 | Gte Laboratories Incorporated | Ceramic monolithic structure having an internal cavity contained therein and a method of preparing the same |
US4806188A (en) * | 1988-03-04 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Method for fabricating multilayer circuits |
US4866411A (en) * | 1988-03-25 | 1989-09-12 | Caddock Richard E | Film-type cylindrical resistor, and method of making it |
CA2018113A1 (en) | 1989-08-07 | 1991-02-07 | John Trublowski | Layered thick film resistors and method of producing the same |
US5139604A (en) * | 1990-05-09 | 1992-08-18 | Mitchell Charles P | Controlled bladder wrap tool system |
JPH0430443A (ja) * | 1990-05-25 | 1992-02-03 | Toto Ltd | ボンディング用ステージの製造方法 |
EP0720416B1 (de) | 1994-12-29 | 2004-03-24 | Robert Bosch Gmbh | Keramische Heizeinrichtung, Verfahren zu deren Herstellung und deren Verwendung |
JP3373973B2 (ja) * | 1995-05-12 | 2003-02-04 | ブラザー工業株式会社 | 定着用加熱ローラ |
US6482742B1 (en) * | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
US5657532A (en) * | 1996-01-16 | 1997-08-19 | Ferro Corporation | Method of making insulated electrical heating element using LTCC tape |
ES2130004T3 (es) | 1996-07-15 | 1999-06-16 | Koninkl Philips Electronics Nv | Elemento calorifico. |
GB2316848B (en) | 1996-08-27 | 2000-10-04 | Strix Ltd | Electric heaters |
JP3594161B2 (ja) * | 1996-09-20 | 2004-11-24 | 株式会社クボタ | セラミックヒータおよびその製造方法 |
JPH11238571A (ja) * | 1998-02-23 | 1999-08-31 | Sumitomo Metal Electronics Devices Inc | セラミックヒータの製造方法および製造装置 |
US6458309B1 (en) * | 1998-06-01 | 2002-10-01 | Rohr, Inc. | Method for fabricating an advanced composite aerostructure article having an integral co-cured fly away hollow mandrel |
GB2338632A (en) | 1998-06-16 | 1999-12-22 | Pifco Ltd | Metal sheathed planar element: Edge connector with shutter |
US6289198B1 (en) | 1998-08-04 | 2001-09-11 | Daiken Chemical Co., Ltd. | Quick heat roller |
JP3694408B2 (ja) * | 1998-10-02 | 2005-09-14 | 日本特殊陶業株式会社 | セラミックスヒータの製造方法 |
JP3746622B2 (ja) * | 1998-10-16 | 2006-02-15 | 日本特殊陶業株式会社 | セラミックスヒータの製造方法 |
US5973296A (en) * | 1998-10-20 | 1999-10-26 | Watlow Electric Manufacturing Company | Thick film heater for injection mold runner nozzle |
JP3601993B2 (ja) | 1999-02-26 | 2004-12-15 | 三菱電機株式会社 | 熱型センサおよびその製造方法 |
US6771019B1 (en) * | 1999-05-14 | 2004-08-03 | Ifire Technology, Inc. | Electroluminescent laminate with patterned phosphor structure and thick film dielectric with improved dielectric properties |
JP3670516B2 (ja) | 1999-05-26 | 2005-07-13 | シャープ株式会社 | ロール状ヒータ及びロール状ヒータを用いた定着装置 |
US6222166B1 (en) | 1999-08-09 | 2001-04-24 | Watlow Electric Manufacturing Co. | Aluminum substrate thick film heater |
TW426217U (en) * | 1999-10-12 | 2001-03-11 | Gen Semiconductor Of Taiwan Lt | Resistive sheet adhering device |
KR20020060714A (ko) * | 1999-10-15 | 2002-07-18 | 덴턴 마이클 | 가스센서구조및 이를 사용하는 방법 |
US7241131B1 (en) | 2000-06-19 | 2007-07-10 | Husky Injection Molding Systems Ltd. | Thick film heater apparatus |
JP3713220B2 (ja) * | 2001-06-15 | 2005-11-09 | 日本特殊陶業株式会社 | セラミックヒータ |
US7304276B2 (en) * | 2001-06-21 | 2007-12-04 | Watlow Electric Manufacturing Company | Thick film heater integrated with low temperature components and method of making the same |
WO2003102700A1 (fr) * | 2002-06-03 | 2003-12-11 | Fuji Xerox Co., Ltd. | Rouleau chauffant et son procede de fabrication |
JP4051245B2 (ja) * | 2002-08-29 | 2008-02-20 | 京セラ株式会社 | セラミックヒータの製造方法 |
US6652906B1 (en) * | 2002-11-19 | 2003-11-25 | Hitachi Global Storage Technologies Netherlands B.V. | Fabrication of a magnetoresistance sensor structure having a spacer layer produced by multiple deposition and oxidation steps |
US7196295B2 (en) * | 2003-11-21 | 2007-03-27 | Watlow Electric Manufacturing Company | Two-wire layered heater system |
US8680443B2 (en) * | 2004-01-06 | 2014-03-25 | Watlow Electric Manufacturing Company | Combined material layering technologies for electric heaters |
US8536496B2 (en) * | 2004-09-15 | 2013-09-17 | Watlow Electric Manufacturing Company | Adaptable layered heater system |
US8557082B2 (en) | 2007-07-18 | 2013-10-15 | Watlow Electric Manufacturing Company | Reduced cycle time manufacturing processes for thick film resistive devices |
US8089337B2 (en) * | 2007-07-18 | 2012-01-03 | Watlow Electric Manufacturing Company | Thick film layered resistive device employing a dielectric tape |
-
2007
- 2007-07-18 US US11/779,745 patent/US8557082B2/en active Active
-
2008
- 2008-07-14 CA CA2693183A patent/CA2693183C/en active Active
- 2008-07-14 JP JP2010517110A patent/JP5588342B2/ja not_active Expired - Fee Related
- 2008-07-14 CN CN2008801061382A patent/CN101796596B/zh not_active Expired - Fee Related
- 2008-07-14 EP EP08781820.9A patent/EP2176869B1/en not_active Not-in-force
- 2008-07-14 WO PCT/US2008/070014 patent/WO2009012239A2/en active Application Filing
- 2008-07-14 MX MX2010000678A patent/MX2010000678A/es active IP Right Grant
- 2008-07-17 TW TW097127131A patent/TWI425529B/zh not_active IP Right Cessation
-
2013
- 2013-09-10 US US14/022,949 patent/US9486988B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101796596B (zh) | 2012-07-11 |
US20090020905A1 (en) | 2009-01-22 |
JP2010533980A (ja) | 2010-10-28 |
CN101796596A (zh) | 2010-08-04 |
JP5588342B2 (ja) | 2014-09-10 |
EP2176869B1 (en) | 2016-11-16 |
TWI425529B (zh) | 2014-02-01 |
WO2009012239A2 (en) | 2009-01-22 |
US8557082B2 (en) | 2013-10-15 |
US20140014265A1 (en) | 2014-01-16 |
TW200912966A (en) | 2009-03-16 |
CA2693183A1 (en) | 2009-01-22 |
EP2176869A2 (en) | 2010-04-21 |
WO2009012239A3 (en) | 2009-03-05 |
CA2693183C (en) | 2015-01-27 |
US9486988B2 (en) | 2016-11-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MX2010000678A (es) | Procesos de fabricacion con tiempo de ciclo reducido para dispositivos resistivos de pelicula gruesa. | |
WO2011005021A3 (ko) | 증착장치의 증착용 기판, 상기 증착용 기판을 사용한 성막 방법 및 유기전계발광표시장치의 제조방법 | |
WO2015116297A3 (en) | Sequential processing with vapor treatment of thin films of organic-inorganic perovskite materials | |
WO2012159871A3 (de) | Verfahren und vorrichtung zum heissprägen | |
WO2013042938A3 (ko) | 복합시트, 이를 포함하는 표시소자용 기판 및 이를 포함하는 디스플레이 장치 | |
TW200721524A (en) | Method of releasing high temperature films and/or devices from metallic substrates | |
EP3296845A4 (en) | Conductive laminate manufacturing method, conductive laminate, substrate with plate-layer precursor layer, substrate with plate layer, and touch sensor | |
TW200746441A (en) | Manufacturing method of thin film transistor and thin film transistor, and display | |
WO2008108042A1 (ja) | 表示パネル用基板、表示パネル、表示装置、および表示パネル用基板の製造方法 | |
WO2014122419A3 (en) | Heating element | |
EP2562839A4 (en) | ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND METHOD FOR PRODUCING THE SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE | |
WO2009035797A3 (en) | Ultra-thin film electrodes and protective layer for high temperature device applications | |
CA2889975C (en) | Integrated bondline spacers for wafer level packaged circuit devices | |
WO2010138811A3 (en) | Method of providing a flexible semiconductor device at high temperatures and flexible semiconductor device thereof | |
TW200705596A (en) | Droplet discharge device, method of manufacturing liquid crystal display and liquid crystal display | |
GB201213445D0 (en) | Security wrap | |
WO2012118713A3 (en) | Process for patterning materials in thin-film devices | |
TW200733352A (en) | Phase change memory device and method of forming the same | |
WO2014150465A3 (en) | Composite coatings and methods therefor | |
WO2011039327A3 (de) | Funktionelles laminat | |
WO2010143895A3 (en) | Semiconductor substrate, semiconductor device, and manufacturing methods thereof | |
MY177552A (en) | A method of fabricating a resistive gas sensor device | |
WO2009012369A3 (en) | Thick film layered resistive device employing a dielectric tape | |
MX2015017801A (es) | Pelicula de multiples capas coextruida con polimero basado en propileno y polimero basado en etileno. | |
EP3992221A4 (en) | RESIN COMPOSITION, RESIN SHEET, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE WITH RESIN COMPOSITION LAYER FOR SEMICONDUCTOR MOUNTING, AND SEMICONDUCTOR DEVICE |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration |