MX168670B - Metodo para sintetizar vidrios y ceramicas de mg0-al2o3-s1o2 - Google Patents

Metodo para sintetizar vidrios y ceramicas de mg0-al2o3-s1o2

Info

Publication number
MX168670B
MX168670B MX003370A MX337086A MX168670B MX 168670 B MX168670 B MX 168670B MX 003370 A MX003370 A MX 003370A MX 337086 A MX337086 A MX 337086A MX 168670 B MX168670 B MX 168670B
Authority
MX
Mexico
Prior art keywords
sub
sio
al2o3
ceramics
vapors
Prior art date
Application number
MX003370A
Other languages
English (en)
Inventor
Peter Lawrence Bocko
William Joseph Wein
Chares Elbert Youding
Original Assignee
Corning Incorcorated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Incorcorated filed Critical Corning Incorcorated
Publication of MX168670B publication Critical patent/MX168670B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/08—Recessed or protruding ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/12—Nozzle or orifice plates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/26—Multiple ports for glass precursor
    • C03B2207/28—Multiple ports for glass precursor for different glass precursors, reactants or modifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87—Controlling the temperature
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/90—Feeding the burner or the burner-heated deposition site with vapour generated from solid glass precursors, i.e. by sublimation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Magnetic Heads (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Silicon Compounds (AREA)
  • Ceramic Products (AREA)

Abstract

La presente invención se refiere a un método para sintetizar un producto de óxido de MgO-Al2O3-SiO2 depositado al vapor, que consiste de los pasos de (a) generar y suministrar a un quemador de oxidación a la llama, los vapores de cada uno de SiCl4, un haluro de aluminio y compuesto de magnesio organometálico, los vapores del haluro de aluminio y los vapores de magnesio organometático se suministran en corrientes de vapor separadas; (b) inyectar los vapores hacia una llama de combustión oxidante sustentada por el quemador, siendo expulsados de los vapores del haluro de aluminio y de magnesio organometálico desde los quemadores hacia la llama, en corrientes de vapor separadas, y una corriente de gas protector interpuesta, exenta de vapores tanto de haluro de alumino como de magnesio organometálico siendo expulsada hacia la llama entre las corrientes que contienen vapores de haluro de aluminio y magnesio organometálico; y (c) recoger el producto de oxidación en las partículas de MgO-Al2O3SiO2 resultante de la combustión de los vapores mediante la llama.
MX003370A 1985-08-13 1986-08-04 Metodo para sintetizar vidrios y ceramicas de mg0-al2o3-s1o2 MX168670B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/765,199 US4604118A (en) 1985-08-13 1985-08-13 Method for synthesizing MgO--Al2 O3 --SiO2 glasses and ceramics

Publications (1)

Publication Number Publication Date
MX168670B true MX168670B (es) 1993-06-03

Family

ID=25072914

Family Applications (1)

Application Number Title Priority Date Filing Date
MX003370A MX168670B (es) 1985-08-13 1986-08-04 Metodo para sintetizar vidrios y ceramicas de mg0-al2o3-s1o2

Country Status (16)

Country Link
US (1) US4604118A (es)
EP (1) EP0213715B1 (es)
JP (1) JPS6241738A (es)
KR (1) KR870002026A (es)
AT (1) ATE73433T1 (es)
AU (1) AU581335B2 (es)
BR (1) BR8603795A (es)
CA (1) CA1249305A (es)
DE (1) DE3684204D1 (es)
DK (1) DK382586A (es)
ES (1) ES2000608A6 (es)
FI (1) FI79687C (es)
IL (1) IL79563A0 (es)
IN (1) IN167640B (es)
MX (1) MX168670B (es)
NO (1) NO863248L (es)

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JPH0695554B2 (ja) * 1987-10-12 1994-11-24 工業技術院長 単結晶マグネシアスピネル膜の形成方法
DE69032175T2 (de) * 1989-11-13 1998-07-09 Corning Inc Verfahren und Vorrichtung zum Herstellen einer Vorform mit einem dotierten Metalloxyd
US5203897A (en) * 1989-11-13 1993-04-20 Corning Incorporated Method for making a preform doped with a metal oxide
IT1245412B (it) * 1991-02-22 1994-09-20 Sip Apparecchiatura per la preparazione di miscele di polveri di composti chimici con alto grado di mescolamento ed in composizioni percentuali prefissate
US5268337A (en) * 1991-11-18 1993-12-07 The Johns Hopkins University Ceramic oxide powders and the formation thereof
US5236481A (en) * 1992-02-21 1993-08-17 Corning Incorporated Method of doping porous glass preforms
US5699183A (en) * 1993-02-10 1997-12-16 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
JPH0781965A (ja) * 1993-07-22 1995-03-28 Sumitomo Electric Ind Ltd ガス生成装置並びに光導波路及び光ファイバ母材を製造する方法及び装置
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
WO1998002241A1 (en) 1996-07-11 1998-01-22 The University Of Cincinnati Electrically assisted synthesis of particles and films with precisely controlled characteristics
KR19990082608A (ko) 1996-12-16 1999-11-25 알프레드 엘. 미첼슨 게르마늄 도핑 실리카 제조용 원료 및 제조방법
BR9810379A (pt) * 1997-07-08 2000-09-05 Corning Inc Estoque de alimentação de cloreto de germânio e siloxano para formação de vidro de sìlica e processo
US6468374B1 (en) * 1999-02-18 2002-10-22 Corning Incorporated Method of making silica glass honeycomb structure from silica soot extrusion
WO2000048775A2 (en) * 1999-02-18 2000-08-24 Corning Incorporated Titanium-containing silica glass honeycomb structure from silica soot extrusion
US6179897B1 (en) 1999-03-18 2001-01-30 Brookhaven Science Associates Method for the generation of variable density metal vapors which bypasses the liquidus phase
US6363746B1 (en) * 2000-03-15 2002-04-02 Corning Incorporated Method and apparatus for making multi-component glass soot
US7494927B2 (en) 2000-05-15 2009-02-24 Asm International N.V. Method of growing electrical conductors
US20040216494A1 (en) * 2000-09-19 2004-11-04 Shinichi Kurotani Burner for combustion or flame hydrolysis, and combustion furnace and process
US8001808B2 (en) * 2001-11-26 2011-08-23 Prysmian Cavi E Sistemi Energia S.R.L. Disassemblable burner for a vapor deposition process
US6910352B2 (en) * 2002-04-24 2005-06-28 Corning Incorporated Deposition of high fluorine content silica soot
EP2360709B1 (en) * 2003-09-26 2013-11-20 Panasonic Corporation Plasma display panel and method of manufacturing same
US8025922B2 (en) 2005-03-15 2011-09-27 Asm International N.V. Enhanced deposition of noble metals
US7666773B2 (en) 2005-03-15 2010-02-23 Asm International N.V. Selective deposition of noble metal thin films
KR101544198B1 (ko) * 2007-10-17 2015-08-12 한국에이에스엠지니텍 주식회사 루테늄 막 형성 방법
US7799674B2 (en) 2008-02-19 2010-09-21 Asm Japan K.K. Ruthenium alloy film for copper interconnects
US8084104B2 (en) 2008-08-29 2011-12-27 Asm Japan K.K. Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition
US8133555B2 (en) 2008-10-14 2012-03-13 Asm Japan K.K. Method for forming metal film by ALD using beta-diketone metal complex
US9379011B2 (en) 2008-12-19 2016-06-28 Asm International N.V. Methods for depositing nickel films and for making nickel silicide and nickel germanide
JP4750867B2 (ja) * 2009-02-24 2011-08-17 信越化学工業株式会社 多孔質ガラス母材製造用バーナ及び多孔質ガラス母材の製造方法
US8329569B2 (en) 2009-07-31 2012-12-11 Asm America, Inc. Deposition of ruthenium or ruthenium dioxide
US8871617B2 (en) 2011-04-22 2014-10-28 Asm Ip Holding B.V. Deposition and reduction of mixed metal oxide thin films
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Also Published As

Publication number Publication date
DK382586D0 (da) 1986-08-11
IL79563A0 (en) 1986-10-31
KR870002026A (ko) 1987-03-28
CA1249305A (en) 1989-01-24
BR8603795A (pt) 1987-03-17
FI79687C (fi) 1990-02-12
NO863248D0 (no) 1986-08-12
FI863275A (fi) 1987-02-14
US4604118A (en) 1986-08-05
FI79687B (fi) 1989-10-31
ATE73433T1 (de) 1992-03-15
ES2000608A6 (es) 1988-03-01
EP0213715B1 (en) 1992-03-11
DE3684204D1 (de) 1992-04-16
NO863248L (no) 1987-02-16
AU581335B2 (en) 1989-02-16
AU6102586A (en) 1987-02-19
JPS6241738A (ja) 1987-02-23
EP0213715A3 (en) 1988-07-06
DK382586A (da) 1987-02-14
EP0213715A2 (en) 1987-03-11
IN167640B (es) 1990-11-24
FI863275A0 (fi) 1986-08-12

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