KR970063459A - Method for forming thin film of semiconductor device - Google Patents
Method for forming thin film of semiconductor device Download PDFInfo
- Publication number
- KR970063459A KR970063459A KR1019960004471A KR19960004471A KR970063459A KR 970063459 A KR970063459 A KR 970063459A KR 1019960004471 A KR1019960004471 A KR 1019960004471A KR 19960004471 A KR19960004471 A KR 19960004471A KR 970063459 A KR970063459 A KR 970063459A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- semiconductor device
- wafer
- present
- forming method
- Prior art date
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Abstract
본 발명은 반도체장치의 박막 형성방법에 관해 개시한다. 본 발명에 의한 박막 형성방법은 반응챔버내의 서셉터 상에 정지되어 있는 웨이퍼 상에 박막을 형성하는 반도체장치의 박막형성방법에 있어서, 상기 서셉터를 회전시켜 회전하는 웨이퍼 상에 박막을 형성하는 것을 특징으로 한다.The present invention discloses a thin film forming method of a semiconductor device. A thin film forming method according to the present invention is a thin film forming method of a semiconductor device for forming a thin film on a wafer suspended on a susceptor in a reaction chamber, characterized in that a thin film is formed on a rotating wafer by rotating the susceptor .
따라서 본 발명에 의하면, 회전하는 웨이퍼 상에 박막을 형성하므로 종래에 비애 박막두께의 균일성을 크게 높일 수 있다. 뿐만 아니라 대구경 웨이퍼의 경우에도 동일하게 적용할 수 있다.Therefore, according to the present invention, since a thin film is formed on a rotating wafer, it is possible to greatly increase the uniformity of thin film thickness in the related art. In addition, the present invention can be similarly applied to a wafer having a large diameter.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제2도는 본 발명에 의한 반도체장치의 박막 형성장치를 나타낸 도면이다.FIG. 2 is a view showing an apparatus for forming a thin film of a semiconductor device according to the present invention.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960004471A KR970063459A (en) | 1996-02-24 | 1996-02-24 | Method for forming thin film of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960004471A KR970063459A (en) | 1996-02-24 | 1996-02-24 | Method for forming thin film of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970063459A true KR970063459A (en) | 1997-09-12 |
Family
ID=66221608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960004471A KR970063459A (en) | 1996-02-24 | 1996-02-24 | Method for forming thin film of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970063459A (en) |
-
1996
- 1996-02-24 KR KR1019960004471A patent/KR970063459A/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Withdrawal due to no request for examination |