KR970052093A - Dry etching device for semiconductor device manufacturing - Google Patents

Dry etching device for semiconductor device manufacturing Download PDF

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Publication number
KR970052093A
KR970052093A KR1019950066964A KR19950066964A KR970052093A KR 970052093 A KR970052093 A KR 970052093A KR 1019950066964 A KR1019950066964 A KR 1019950066964A KR 19950066964 A KR19950066964 A KR 19950066964A KR 970052093 A KR970052093 A KR 970052093A
Authority
KR
South Korea
Prior art keywords
dry etching
semiconductor device
manufacturing
gas supply
supply plate
Prior art date
Application number
KR1019950066964A
Other languages
Korean (ko)
Inventor
김현우
유원종
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950066964A priority Critical patent/KR970052093A/en
Publication of KR970052093A publication Critical patent/KR970052093A/en

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Abstract

본 발명은 내부에 가스 공급 플레이트 및 반도체 기판 장착부재를 구비하고 있는 식각챔버를 포함하는 반도체 소자 제조용 건식식각장치에 있어서, 상기 식각챔버에서 가스 공급 플레이트와 반도체 기판 장착부재 사이에 망구조물이 배치되어 있는 것을 특징으로 하는 반도체 소자 제조용 건식식각장치를 제공한다. 본 발명에 의하면 식각중에 발생되는 부산물을 망구조물에 침적시키고 이 망을 자주 교체해줌으로써 식각챔버내의 오염정도를 감소시킬 수 있다. 따라서 가스 공급 플레이트의 클리닝에 소요되는 노력과 시간을 절감할 수 있다.The present invention provides a dry etching apparatus for manufacturing a semiconductor device including an etching chamber having a gas supply plate and a semiconductor substrate mounting member therein, wherein a network structure is disposed between the gas supply plate and the semiconductor substrate mounting member in the etching chamber. Provided is a dry etching apparatus for manufacturing a semiconductor device. According to the present invention it is possible to reduce the degree of contamination in the etching chamber by depositing the by-products generated during the etching to the network structure and frequently replacing the network. Therefore, the effort and time required for cleaning the gas supply plate can be saved.

Description

반도체 소자 제조용 건식식각장치Dry etching device for semiconductor device manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명에 따른 반도체 소자 제조용 건식긱각챔버의 개략도이다.1 is a schematic diagram of a dry gig chamber for manufacturing a semiconductor device according to the present invention.

Claims (1)

내부에 가스 공급 플레이트 및 반도체 기판 장착부재를 구비하고 있는 식각챔버를 포하마는 반도체 소자 제조용 건식식각장치에 있어서, 상기 식각챔버에서 가스 공급 플레이트와 반도체 기판 장착부재 사이에 망구조물이 배치되어 있는 것을 특징으로 하는 반도체 소자 제조용 건식식각장치.In the dry etching apparatus for manufacturing a semiconductor device having a gas supply plate and a semiconductor substrate mounting member therein, wherein the network structure is disposed between the gas supply plate and the semiconductor substrate mounting member in the etching chamber. Dry etching apparatus for manufacturing a semiconductor device characterized in that. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950066964A 1995-12-29 1995-12-29 Dry etching device for semiconductor device manufacturing KR970052093A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950066964A KR970052093A (en) 1995-12-29 1995-12-29 Dry etching device for semiconductor device manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950066964A KR970052093A (en) 1995-12-29 1995-12-29 Dry etching device for semiconductor device manufacturing

Publications (1)

Publication Number Publication Date
KR970052093A true KR970052093A (en) 1997-07-29

Family

ID=66638042

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950066964A KR970052093A (en) 1995-12-29 1995-12-29 Dry etching device for semiconductor device manufacturing

Country Status (1)

Country Link
KR (1) KR970052093A (en)

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