KR970072168A - Method for inhibiting polymer deposition of semiconductor devices - Google Patents

Method for inhibiting polymer deposition of semiconductor devices Download PDF

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Publication number
KR970072168A
KR970072168A KR1019960012528A KR19960012528A KR970072168A KR 970072168 A KR970072168 A KR 970072168A KR 1019960012528 A KR1019960012528 A KR 1019960012528A KR 19960012528 A KR19960012528 A KR 19960012528A KR 970072168 A KR970072168 A KR 970072168A
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KR
South Korea
Prior art keywords
polymer deposition
gdp
present
inhibiting polymer
semiconductor devices
Prior art date
Application number
KR1019960012528A
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Korean (ko)
Inventor
임가순
윤태양
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960012528A priority Critical patent/KR970072168A/en
Publication of KR970072168A publication Critical patent/KR970072168A/en

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Abstract

본 발명은 반도체장치의 폴리머 증착억제방법에 관해 개시한다. 본 발명에 의한 폴리머 증착억제방법은 RIE장비내의 반응가스 분산 플레이트인 GDP 내의 밀집된 분사홀을 포함하는 중앙부분을 아몰퍼스 카본(Carbon)으로 형성하고 그 둘레는 알루미늄에 양극산화막을 입혀서 형성한다.The present invention discloses a method for inhibiting polymer deposition of a semiconductor device. In the method of inhibiting polymer deposition according to the present invention, the center portion including the dense injection holes in the reaction gas dispersion plate GDP in the RIE equipment is formed of amorphous carbon and the periphery is formed by coating anodized aluminum film with aluminum.

따라서 본 발명에 의한 GDP를 식각장비에 사용하면, 상기 GDP에는 식각공정에서 반응부산물들에 의한 폴리머증착이 발생되지 않는다. 즉, 아크현상이 일어나지 않는다. 그러므로 청결을 유지할 수 있으며, 장비의 쉼 없이 운행시킬 수 있다. 또한, 드라이크리닝에 따른 시간손실들을 제거할 수 있으므로 종합적 생산성이 향상된다.Therefore, when the GDP according to the present invention is used in an etching apparatus, the GDP is not subjected to polymer deposition due to reaction by-products in the etching process. That is, an arc phenomenon does not occur. Therefore, it is possible to maintain cleanliness and to operate the equipment without interruption. In addition, time lost due to dry cleaning can be eliminated, thus improving overall productivity.

Description

반도체장치의 폴리머 증착 억제방법Method for inhibiting polymer deposition of semiconductor devices

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제4도는 본 발명에 의한 가스분산 플레이트의 평면도이다, 제5도는 본 발명에 의한 가스분산 플레이트의 단면도이다.FIG. 4 is a plan view of the gas dispersion plate according to the present invention, FIG. 5 is a sectional view of the gas dispersion plate according to the present invention.

Claims (1)

RIE 장비내의 반응가스 분산 플레이트인 GDP 내의 밀집된 분사홀을 포함하는 중앙부분을 아몰퍼스 카본(Carbon)으로 형성하고 그 둘레는 알루미늄에 양극산화막을 입혀서 형성하는 것을 특징으로 하는 반도체장치의 폴리머 증착 억제방법.Characterized in that a central portion including dense injection holes in GDP which is a reaction gas dispersion plate in the RIE equipment is formed of amorphous carbon and the periphery is formed by coating anodic oxide film on aluminum. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960012528A 1996-04-24 1996-04-24 Method for inhibiting polymer deposition of semiconductor devices KR970072168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960012528A KR970072168A (en) 1996-04-24 1996-04-24 Method for inhibiting polymer deposition of semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960012528A KR970072168A (en) 1996-04-24 1996-04-24 Method for inhibiting polymer deposition of semiconductor devices

Publications (1)

Publication Number Publication Date
KR970072168A true KR970072168A (en) 1997-11-07

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Application Number Title Priority Date Filing Date
KR1019960012528A KR970072168A (en) 1996-04-24 1996-04-24 Method for inhibiting polymer deposition of semiconductor devices

Country Status (1)

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KR (1) KR970072168A (en)

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