KR970072168A - Method for inhibiting polymer deposition of semiconductor devices - Google Patents
Method for inhibiting polymer deposition of semiconductor devices Download PDFInfo
- Publication number
- KR970072168A KR970072168A KR1019960012528A KR19960012528A KR970072168A KR 970072168 A KR970072168 A KR 970072168A KR 1019960012528 A KR1019960012528 A KR 1019960012528A KR 19960012528 A KR19960012528 A KR 19960012528A KR 970072168 A KR970072168 A KR 970072168A
- Authority
- KR
- South Korea
- Prior art keywords
- polymer deposition
- gdp
- present
- inhibiting polymer
- semiconductor devices
- Prior art date
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- Drying Of Semiconductors (AREA)
Abstract
본 발명은 반도체장치의 폴리머 증착억제방법에 관해 개시한다. 본 발명에 의한 폴리머 증착억제방법은 RIE장비내의 반응가스 분산 플레이트인 GDP 내의 밀집된 분사홀을 포함하는 중앙부분을 아몰퍼스 카본(Carbon)으로 형성하고 그 둘레는 알루미늄에 양극산화막을 입혀서 형성한다.The present invention discloses a method for inhibiting polymer deposition of a semiconductor device. In the method of inhibiting polymer deposition according to the present invention, the center portion including the dense injection holes in the reaction gas dispersion plate GDP in the RIE equipment is formed of amorphous carbon and the periphery is formed by coating anodized aluminum film with aluminum.
따라서 본 발명에 의한 GDP를 식각장비에 사용하면, 상기 GDP에는 식각공정에서 반응부산물들에 의한 폴리머증착이 발생되지 않는다. 즉, 아크현상이 일어나지 않는다. 그러므로 청결을 유지할 수 있으며, 장비의 쉼 없이 운행시킬 수 있다. 또한, 드라이크리닝에 따른 시간손실들을 제거할 수 있으므로 종합적 생산성이 향상된다.Therefore, when the GDP according to the present invention is used in an etching apparatus, the GDP is not subjected to polymer deposition due to reaction by-products in the etching process. That is, an arc phenomenon does not occur. Therefore, it is possible to maintain cleanliness and to operate the equipment without interruption. In addition, time lost due to dry cleaning can be eliminated, thus improving overall productivity.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제4도는 본 발명에 의한 가스분산 플레이트의 평면도이다, 제5도는 본 발명에 의한 가스분산 플레이트의 단면도이다.FIG. 4 is a plan view of the gas dispersion plate according to the present invention, FIG. 5 is a sectional view of the gas dispersion plate according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960012528A KR970072168A (en) | 1996-04-24 | 1996-04-24 | Method for inhibiting polymer deposition of semiconductor devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960012528A KR970072168A (en) | 1996-04-24 | 1996-04-24 | Method for inhibiting polymer deposition of semiconductor devices |
Publications (1)
Publication Number | Publication Date |
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KR970072168A true KR970072168A (en) | 1997-11-07 |
Family
ID=66217267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019960012528A KR970072168A (en) | 1996-04-24 | 1996-04-24 | Method for inhibiting polymer deposition of semiconductor devices |
Country Status (1)
Country | Link |
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KR (1) | KR970072168A (en) |
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1996
- 1996-04-24 KR KR1019960012528A patent/KR970072168A/en not_active Application Discontinuation
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Legal Events
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WITN | Withdrawal due to no request for examination |