KR980005786A - Polysilicon etching device - Google Patents

Polysilicon etching device Download PDF

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Publication number
KR980005786A
KR980005786A KR1019960023908A KR19960023908A KR980005786A KR 980005786 A KR980005786 A KR 980005786A KR 1019960023908 A KR1019960023908 A KR 1019960023908A KR 19960023908 A KR19960023908 A KR 19960023908A KR 980005786 A KR980005786 A KR 980005786A
Authority
KR
South Korea
Prior art keywords
polysilicon etching
etching device
polysilicon
edge
etching
Prior art date
Application number
KR1019960023908A
Other languages
Korean (ko)
Inventor
신상욱
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960023908A priority Critical patent/KR980005786A/en
Publication of KR980005786A publication Critical patent/KR980005786A/en

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  • Drying Of Semiconductors (AREA)
  • Weting (AREA)

Abstract

폴리실리콘 식각 공정시 에이퍼를 고정하는 클램프(Clamp:의 가장자리에서 식각율이 감소하는 것을 막기 위한 폴리실리콘 식각 장치에 관한 것으로, 에이퍼의 가장자리중 적어도 세 포인트와 접촉하는 클램프를 구비하는 것을 특징으로 한다.A polysilicon etching apparatus for preventing a decrease in etching rate at an edge of a clamp during a polysilicon etching process. It is done.

Description

폴리실리콘 식각 장치Polysilicon etching device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2a도 및 제2b도는 본 발명에 의한 폴리싶리콘 식각 장치의클램프를 위와 정면에서 본 모양을 나타낸 단면도이다.2a and 2b is a cross-sectional view showing a top view and a front view of the clamp of the poly whercon etching apparatus according to the present invention.

제2c도는 본 발명에 의한 폴리실리콘 식각 공정시 에이퍼의 위치에 따른 식각율을 나타낸 그래프이다.Figure 2c is a graph showing the etching rate according to the position of the aper during the polysilicon etching process according to the present invention.

Claims (1)

웨이퍼의 가장자리중 적어도 세 포인트와 접촉하는 클램프를 구비하는 것을 특징으로 하는 폴리실리콘 식각 장치.And a clamp in contact with at least three points of the edge of the wafer. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019960023908A 1996-06-26 1996-06-26 Polysilicon etching device KR980005786A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960023908A KR980005786A (en) 1996-06-26 1996-06-26 Polysilicon etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960023908A KR980005786A (en) 1996-06-26 1996-06-26 Polysilicon etching device

Publications (1)

Publication Number Publication Date
KR980005786A true KR980005786A (en) 1998-03-30

Family

ID=66288419

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960023908A KR980005786A (en) 1996-06-26 1996-06-26 Polysilicon etching device

Country Status (1)

Country Link
KR (1) KR980005786A (en)

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