KR950028655U - Polysilicon etching device on the back of the wafer - Google Patents

Polysilicon etching device on the back of the wafer

Info

Publication number
KR950028655U
KR950028655U KR2019940004973U KR19940004973U KR950028655U KR 950028655 U KR950028655 U KR 950028655U KR 2019940004973 U KR2019940004973 U KR 2019940004973U KR 19940004973 U KR19940004973 U KR 19940004973U KR 950028655 U KR950028655 U KR 950028655U
Authority
KR
South Korea
Prior art keywords
wafer
etching device
polysilicon etching
polysilicon
etching
Prior art date
Application number
KR2019940004973U
Other languages
Korean (ko)
Other versions
KR970003598Y1 (en
Inventor
정연국
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019940004973U priority Critical patent/KR970003598Y1/en
Publication of KR950028655U publication Critical patent/KR950028655U/en
Application granted granted Critical
Publication of KR970003598Y1 publication Critical patent/KR970003598Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
KR2019940004973U 1994-03-11 1994-03-11 Polysilicon etcher of wafer rearface KR970003598Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940004973U KR970003598Y1 (en) 1994-03-11 1994-03-11 Polysilicon etcher of wafer rearface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940004973U KR970003598Y1 (en) 1994-03-11 1994-03-11 Polysilicon etcher of wafer rearface

Publications (2)

Publication Number Publication Date
KR950028655U true KR950028655U (en) 1995-10-20
KR970003598Y1 KR970003598Y1 (en) 1997-04-18

Family

ID=19378822

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940004973U KR970003598Y1 (en) 1994-03-11 1994-03-11 Polysilicon etcher of wafer rearface

Country Status (1)

Country Link
KR (1) KR970003598Y1 (en)

Also Published As

Publication number Publication date
KR970003598Y1 (en) 1997-04-18

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