KR970052481A - Bottom electrode of semiconductor manufacturing apparatus - Google Patents

Bottom electrode of semiconductor manufacturing apparatus Download PDF

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Publication number
KR970052481A
KR970052481A KR1019950066942A KR19950066942A KR970052481A KR 970052481 A KR970052481 A KR 970052481A KR 1019950066942 A KR1019950066942 A KR 1019950066942A KR 19950066942 A KR19950066942 A KR 19950066942A KR 970052481 A KR970052481 A KR 970052481A
Authority
KR
South Korea
Prior art keywords
lower electrode
manufacturing apparatus
semiconductor manufacturing
electrode
insulating film
Prior art date
Application number
KR1019950066942A
Other languages
Korean (ko)
Inventor
신경섭
윤천진
이세형
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950066942A priority Critical patent/KR970052481A/en
Publication of KR970052481A publication Critical patent/KR970052481A/en

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  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

본 발명은 반도체 제조장치의 하부전극에 관해 개시한다. 본 발명의 하부전극은 전극의 상부 전면에 절연막을 구비하는 반도체 제조장치의 하부전극에 있어서, 상기 전극의 상부 전면에 국부적으로만 절연막을 구비한다.The present invention relates to a lower electrode of a semiconductor manufacturing apparatus. The lower electrode of the present invention is a lower electrode of a semiconductor manufacturing apparatus having an insulating film on an upper front surface of an electrode, wherein the lower electrode includes an insulating film only locally on an upper front surface of the electrode.

따라서, 본 발명에 의한 하부전극을 사용하면, 웨이퍼가 띄는 많은 하전량은 상기 하분전극의 절연막이 형성되지 않은 부분을 통하여 방전할 수 있으므로, 웨이퍼와 하부전극간의 정전기력에 의한 인력을 제거할 수 있고 웨이퍼의 조작을 쉽게할 수 있다.Therefore, when the lower electrode according to the present invention is used, a large amount of charge on the wafer can be discharged through the portion where the insulating film of the lower electrode is not formed, thereby eliminating the attractive force due to the electrostatic force between the wafer and the lower electrode. The wafer can be easily manipulated.

Description

반도체 제조장치의 하부전극Bottom electrode of semiconductor manufacturing device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 의한 반도체 제조장치의 하부전극의 단면도이다.2 is a cross-sectional view of the lower electrode of the semiconductor manufacturing apparatus according to the present invention.

Claims (3)

전극의 상부 전면에 절연막을 구비하는 반도체 제조장치의 하부전극에 있어서, 상기 전극의 상부 전면에 국부적으로만 절연막을 구비하는 것을 특징으로 하는 반도체 제조장치의 하부전극.A lower electrode of a semiconductor manufacturing apparatus having an insulating film on an upper front surface of an electrode, wherein the lower electrode of the semiconductor manufacturing apparatus, wherein an insulating film is provided only locally on the upper front surface of the electrode. 제1항에 있어서, 상기 "국부적이라"함은 상기 전극의 가장자리인 것을 특징으로 하는 반도체 제조장치의 하부전극.The lower electrode of claim 1, wherein “local” is an edge of the electrode. 제1항에 있어서, 상기 전극은 알루미늄으로 구성하는 것을 특징으로 하는 반도체 제조장치의 하부전극.The lower electrode of claim 1, wherein the electrode is made of aluminum. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950066942A 1995-12-29 1995-12-29 Bottom electrode of semiconductor manufacturing apparatus KR970052481A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950066942A KR970052481A (en) 1995-12-29 1995-12-29 Bottom electrode of semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950066942A KR970052481A (en) 1995-12-29 1995-12-29 Bottom electrode of semiconductor manufacturing apparatus

Publications (1)

Publication Number Publication Date
KR970052481A true KR970052481A (en) 1997-07-29

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Application Number Title Priority Date Filing Date
KR1019950066942A KR970052481A (en) 1995-12-29 1995-12-29 Bottom electrode of semiconductor manufacturing apparatus

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KR (1) KR970052481A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100599335B1 (en) * 2004-02-06 2006-07-14 (주)쿨빙고우성 A cold table having with kitchen tool receipt means

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100599335B1 (en) * 2004-02-06 2006-07-14 (주)쿨빙고우성 A cold table having with kitchen tool receipt means

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