KR980005304A - Method for Forming Photosensitive Film of Semiconductor Device - Google Patents
Method for Forming Photosensitive Film of Semiconductor Device Download PDFInfo
- Publication number
- KR980005304A KR980005304A KR1019960022827A KR19960022827A KR980005304A KR 980005304 A KR980005304 A KR 980005304A KR 1019960022827 A KR1019960022827 A KR 1019960022827A KR 19960022827 A KR19960022827 A KR 19960022827A KR 980005304 A KR980005304 A KR 980005304A
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- KR
- South Korea
- Prior art keywords
- photosensitive film
- film
- semiconductor device
- forming
- forming photosensitive
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
본 발명은 반도체 소자의 감광막 형성방법을 제공하는 것으로, 극성이 다른 감광막을 다중으로 도포하므로써 핀홀을 방지할 수 있음은 물론 상층 감광막에 형성되는 홀지름을 하층 감광막에 형성되는 홀지름보다 크게 하므로써 얇은 두께의 감광막을 실현할 수 있는 효과가 있다.The present invention provides a method for forming a photosensitive film of a semiconductor device, by pinching the photoresist film having a different polarity can be prevented, as well as thinner by making the hole diameter formed in the upper photosensitive film larger than the hole diameter formed in the lower photosensitive film. There is an effect of realizing a photosensitive film having a thickness.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2a내지 2c도는 본 발명에 따른 반도체 소자의 감광막 형성방법을 설명하기 위한 소자의 단면도.2A to 2C are cross-sectional views of a device for explaining a method of forming a photosensitive film of a semiconductor device according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960022827A KR980005304A (en) | 1996-06-21 | 1996-06-21 | Method for Forming Photosensitive Film of Semiconductor Device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960022827A KR980005304A (en) | 1996-06-21 | 1996-06-21 | Method for Forming Photosensitive Film of Semiconductor Device |
Publications (1)
Publication Number | Publication Date |
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KR980005304A true KR980005304A (en) | 1998-03-30 |
Family
ID=66287500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960022827A KR980005304A (en) | 1996-06-21 | 1996-06-21 | Method for Forming Photosensitive Film of Semiconductor Device |
Country Status (1)
Country | Link |
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KR (1) | KR980005304A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100384877B1 (en) * | 1999-06-28 | 2003-05-22 | 주식회사 하이닉스반도체 | A method for coating photoresist |
KR100493132B1 (en) * | 1997-12-04 | 2005-09-07 | 동경 엘렉트론 주식회사 | Method for forming resist film and apparatus for forming resist film |
-
1996
- 1996-06-21 KR KR1019960022827A patent/KR980005304A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100493132B1 (en) * | 1997-12-04 | 2005-09-07 | 동경 엘렉트론 주식회사 | Method for forming resist film and apparatus for forming resist film |
KR100384877B1 (en) * | 1999-06-28 | 2003-05-22 | 주식회사 하이닉스반도체 | A method for coating photoresist |
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