KR970030425A - Cleaning Method of Semiconductor Devices - Google Patents
Cleaning Method of Semiconductor Devices Download PDFInfo
- Publication number
- KR970030425A KR970030425A KR1019950043036A KR19950043036A KR970030425A KR 970030425 A KR970030425 A KR 970030425A KR 1019950043036 A KR1019950043036 A KR 1019950043036A KR 19950043036 A KR19950043036 A KR 19950043036A KR 970030425 A KR970030425 A KR 970030425A
- Authority
- KR
- South Korea
- Prior art keywords
- cleaning
- oxide film
- hydrogen peroxide
- semiconductor device
- semiconductor devices
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
l. 청구범위에 기재된 발명이 속한 기술분야l. The technical field to which the invention described in the claims belongs
반도체 소자 제조 방법Semiconductor device manufacturing method
2. 발명이 해결하려고 하는 기술적 과제2. The technical problem to be solved by the invention
반도체 소자의 자연산화막을 제거하고 클리닝하는 공정에서 세정 및 드라이가 제대로 수행되지 않아 웨이퍼의 표면에 결합이 생긴다는 문제점을 해결하고자 함.In the process of removing and cleaning the natural oxide film of the semiconductor device, the problem is that the cleaning and drying are not performed properly and thus bonding occurs on the surface of the wafer.
3. 발명의 해결방법의 요지3. Summary of Solution to Invention
산화막을 습식식각하는데 사용되는 식각액에 과산화수소를 다량 첨가하여 습식식각을 실시하고 IPA 베이퍼드라이 공정의 드라이 조건을 변경하여 보다 신뢰성 있는 반도체 소자를 형성하고자 함.It is intended to form more reliable semiconductor devices by performing wet etching by adding a large amount of hydrogen peroxide to the etching liquid used for wet etching the oxide film and changing the dry conditions of the IPA vapor dry process.
4. 발명의 중요한 용도4. Important uses of the invention
반도체 소자을 클리닝하는데 이용됨.Used to clean semiconductor devices.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950043036A KR970030425A (en) | 1995-11-23 | 1995-11-23 | Cleaning Method of Semiconductor Devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950043036A KR970030425A (en) | 1995-11-23 | 1995-11-23 | Cleaning Method of Semiconductor Devices |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970030425A true KR970030425A (en) | 1997-06-26 |
Family
ID=66588674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950043036A KR970030425A (en) | 1995-11-23 | 1995-11-23 | Cleaning Method of Semiconductor Devices |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970030425A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100825965B1 (en) * | 2006-09-22 | 2008-04-29 | 세메스 주식회사 | Substrate cleaning method |
KR100865442B1 (en) * | 2006-12-21 | 2008-10-28 | 동부일렉트로닉스 주식회사 | Wafer cleaning method for removing stripe defect |
-
1995
- 1995-11-23 KR KR1019950043036A patent/KR970030425A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100825965B1 (en) * | 2006-09-22 | 2008-04-29 | 세메스 주식회사 | Substrate cleaning method |
KR100865442B1 (en) * | 2006-12-21 | 2008-10-28 | 동부일렉트로닉스 주식회사 | Wafer cleaning method for removing stripe defect |
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Legal Events
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WITN | Withdrawal due to no request for examination |