KR970023538A - 화학증착법에 의한 기판코팅장치 - Google Patents

화학증착법에 의한 기판코팅장치 Download PDF

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Publication number
KR970023538A
KR970023538A KR1019960049383A KR19960049383A KR970023538A KR 970023538 A KR970023538 A KR 970023538A KR 1019960049383 A KR1019960049383 A KR 1019960049383A KR 19960049383 A KR19960049383 A KR 19960049383A KR 970023538 A KR970023538 A KR 970023538A
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South Korea
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substrate
compartments
compartment
cathode
source
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KR1019960049383A
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KR100212165B1 (ko
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스츠크치르보프시키 요아힘
테슈너 괴츠
Original Assignee
좀머캄프, 에. 투트
발처스 운트 레이볼트 도이칠란트 홀딩 악티엔게젤샤프트
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Publication of KR970023538A publication Critical patent/KR970023538A/ko
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Publication of KR100212165B1 publication Critical patent/KR100212165B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/0203Protection arrangements
    • H01J2237/0206Extinguishing, preventing or controlling unwanted discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

2개의 마그네트론 음극(4, 5)와 연결된 교류전원(3)으로 구성되고, 교류전원(3)의 한 극(8)은 음극(4)에, 그리고 다른 극(9)은 다른 음극(5)에 각각 공급도선(10, 11)에 의해 연결되는 플라즈마 CVD(제1도)에 의해 기판(2)을 코팅하기 위한 장치에서, 두 음극(4, 5)은 고유의 구획(12, 13)에 배치되고, 양구획은 진공원(21)에 연결된 제3구획(14)을 중간에 둘러싸고 있다. 외측에 있는 양구획(12, 13)은 이것을 분리하는 벽(17, 18)에 있는 개구부(15, 16) 또는 슬릿에 의해 서로 연결되고, 제3구획(14)에 배치된 기판(2)은 기본적으로 반응가스입구부(19)와 시준기(20)로 이루어진 CVD원으로 향하게 되어 있다.

Description

화학증착법에 의한 기판코팅장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도 및 제2도는 본 발명의 여러 실시 형태 중 평면기판을 위한 2개의 코팅설비를 도식적으로 도시한 도면.

Claims (2)

  1. 타겟(6,7)과 전기적으로 함께 작용하는 2개의 자석으로 둘러싸인 음극(4,5)과 연결된 교류전원(3), 예컨대 평균주파수 발생기로 구성되고, 교류전원(3)의 한 극(8)은 음극(4)에, 그리고 다른 극(9)은 다른 음극(5)에 각각 공급도선(10,11)에 의해 연결되는 플라즈마 CVD에 의해 기판(2)을 코팅하기 위한 장치에 있어서, 각각의 두 음극(4,5)이 고유의 챔버 또는 구획(12,13)에 배치되고 그리고 양구획은 진공원(21)에 연결된 제3구획(14)을 둘러싸고 그리고 각각 구획(12,14 및 13,14)을 따로 분리하는 벽(17,18)에 있는 개구부(15,16)또는 슬릿을 통해 서로 연결되고, 제3구획(14)에 포함된 기판(2)은 기본적으로 반응가스 입구부(19)와 시준기(20)로 이루어진 CVD원으로 향하는 것을 특징으로 하는 기판코팅장치.
  2. 제1항에 있어서, CVD원의 반응가스입구부(19)는 기판(2)쪽을 향한 노즐(22, 22', ...)을 갖춘 관으로 이루어진 격자로서 형성되어 있고 그리고 격자는 기판(2)의 평면에 평행한 평면에 유지되어 있고, 격벽(17, 18)에 있는 슬릿(15, 16)은 격자와 기판(2)으로 형성된 중간공간(27)과 통해 있고 그리고 구획(14)의 양측면에 배치된 구획(12, 13)에 있는 음극(4, 5)의 타겟(6, 7)은 격벽(17, 18)에 대향한 측벽(23, 24)또는 베이스부나 커버부(25 또는 26)쪽으로 향하고 있는 것을 특징으로 하는 기판코팅장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960049383A 1995-10-31 1996-10-29 화학증착법에 의한 기판코팅장치 KR100212165B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19540543.9 1995-10-31
DE19540543A DE19540543A1 (de) 1995-10-31 1995-10-31 Vorrichtung zum Beschichten eines Substrats mit Hilfe des Chemical-Vapor-Deposition-Verfahrens

Publications (2)

Publication Number Publication Date
KR970023538A true KR970023538A (ko) 1997-05-30
KR100212165B1 KR100212165B1 (ko) 1999-08-02

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KR1019960049383A KR100212165B1 (ko) 1995-10-31 1996-10-29 화학증착법에 의한 기판코팅장치

Country Status (7)

Country Link
US (1) US5803973A (ko)
EP (1) EP0782173B1 (ko)
JP (1) JPH09186150A (ko)
KR (1) KR100212165B1 (ko)
DE (2) DE19540543A1 (ko)
ES (1) ES2270432T3 (ko)
TW (1) TW364146B (ko)

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Also Published As

Publication number Publication date
EP0782173B1 (de) 2006-08-16
DE19540543A1 (de) 1997-05-07
DE59611377D1 (de) 2006-09-28
JPH09186150A (ja) 1997-07-15
KR100212165B1 (ko) 1999-08-02
ES2270432T3 (es) 2007-04-01
EP0782173A2 (de) 1997-07-02
TW364146B (en) 1999-07-11
US5803973A (en) 1998-09-08
EP0782173A3 (de) 1999-02-17

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