KR970011616B1 - Fabrication of mosfet - Google Patents
Fabrication of mosfet Download PDFInfo
- Publication number
- KR970011616B1 KR970011616B1 KR93021802A KR930021802A KR970011616B1 KR 970011616 B1 KR970011616 B1 KR 970011616B1 KR 93021802 A KR93021802 A KR 93021802A KR 930021802 A KR930021802 A KR 930021802A KR 970011616 B1 KR970011616 B1 KR 970011616B1
- Authority
- KR
- South Korea
- Prior art keywords
- forming
- insulating layer
- gate
- layer
- material layer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000000873 masking effect Effects 0.000 abstract 5
- 239000000463 material Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 239000012535 impurity Substances 0.000 abstract 2
- 125000006850 spacer group Chemical group 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000002513 implantation Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR93021802A KR970011616B1 (en) | 1993-10-20 | 1993-10-20 | Fabrication of mosfet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR93021802A KR970011616B1 (en) | 1993-10-20 | 1993-10-20 | Fabrication of mosfet |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950012646A KR950012646A (ko) | 1995-05-16 |
KR970011616B1 true KR970011616B1 (en) | 1997-07-12 |
Family
ID=19366197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR93021802A KR970011616B1 (en) | 1993-10-20 | 1993-10-20 | Fabrication of mosfet |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970011616B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100906051B1 (ko) * | 2007-11-16 | 2009-07-03 | 주식회사 동부하이텍 | 반도체 소자의 제조 방법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970054382A (ko) * | 1995-12-22 | 1997-07-31 | 김주용 | 저도핑 드레인 구조의 모스 트랜지스터 제조 방법 |
KR980006252A (ko) * | 1996-06-28 | 1998-03-30 | 김주용 | 반도체 장치 제조방법 |
-
1993
- 1993-10-20 KR KR93021802A patent/KR970011616B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100906051B1 (ko) * | 2007-11-16 | 2009-07-03 | 주식회사 동부하이텍 | 반도체 소자의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR950012646A (ko) | 1995-05-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121121 Year of fee payment: 16 |
|
EXPY | Expiration of term |