KR960025430U - 스테이지 경사 보상이 가능한 웨이퍼 척 장치 - Google Patents
스테이지 경사 보상이 가능한 웨이퍼 척 장치Info
- Publication number
- KR960025430U KR960025430U KR2019940036818U KR19940036818U KR960025430U KR 960025430 U KR960025430 U KR 960025430U KR 2019940036818 U KR2019940036818 U KR 2019940036818U KR 19940036818 U KR19940036818 U KR 19940036818U KR 960025430 U KR960025430 U KR 960025430U
- Authority
- KR
- South Korea
- Prior art keywords
- wafer chuck
- chuck device
- tilt compensation
- stage tilt
- stage
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940036818U KR200177258Y1 (ko) | 1994-12-28 | 1994-12-28 | 스테이지 경사 보상이 가능한 웨이퍼 척 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940036818U KR200177258Y1 (ko) | 1994-12-28 | 1994-12-28 | 스테이지 경사 보상이 가능한 웨이퍼 척 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960025430U true KR960025430U (ko) | 1996-07-22 |
KR200177258Y1 KR200177258Y1 (ko) | 2000-04-15 |
Family
ID=19403547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940036818U KR200177258Y1 (ko) | 1994-12-28 | 1994-12-28 | 스테이지 경사 보상이 가능한 웨이퍼 척 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200177258Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030092801A (ko) * | 2002-05-31 | 2003-12-06 | (주)넥스트인스트루먼트 | 디스플레이 패널의 척 유니트 |
-
1994
- 1994-12-28 KR KR2019940036818U patent/KR200177258Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030092801A (ko) * | 2002-05-31 | 2003-12-06 | (주)넥스트인스트루먼트 | 디스플레이 패널의 척 유니트 |
Also Published As
Publication number | Publication date |
---|---|
KR200177258Y1 (ko) | 2000-04-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20090102 Year of fee payment: 10 |
|
EXPY | Expiration of term |