KR960017903A - 주석 진공증착 강판의 연속 제조방법 - Google Patents

주석 진공증착 강판의 연속 제조방법 Download PDF

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Publication number
KR960017903A
KR960017903A KR1019940029272A KR19940029272A KR960017903A KR 960017903 A KR960017903 A KR 960017903A KR 1019940029272 A KR1019940029272 A KR 1019940029272A KR 19940029272 A KR19940029272 A KR 19940029272A KR 960017903 A KR960017903 A KR 960017903A
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KR
South Korea
Prior art keywords
steel sheet
tin
vacuum
evaporation source
deposition
Prior art date
Application number
KR1019940029272A
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English (en)
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KR0138045B1 (ko
Inventor
전중환
최기덕
신정철
이호종
Original Assignee
신창식
한국신철강기술연구조합
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Application filed by 신창식, 한국신철강기술연구조합 filed Critical 신창식
Priority to KR1019940029272A priority Critical patent/KR0138045B1/ko
Publication of KR960017903A publication Critical patent/KR960017903A/ko
Application granted granted Critical
Publication of KR0138045B1 publication Critical patent/KR0138045B1/ko

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 밀착성이 우수하고 외관이 미려한 주석(Sn) 진공중착 강판의 연속 제조방법에 관한 것이다. 구체적으로는 진공중에서 전자빔 증발원을 이용해서 주석을 증발, 강판에 증착하는데 있어서, 주석 증발원과 강판의 간의 거리를 257mm 이상으로 제한하고, 강판의 증착전 예열온도를 120∼200℃로, 그리고 증착 후 강판의 최종 온도를 200℃ 이하로 제한하는 진공증착 방법으로 밀착성이 우수하고 외관이 미려한 주석(Sn) 진공증착 강판을 연속적으로 제조하는 방법에 관한 것이다.
도금액을 사용하게되나 이러한 도금용액은 모두 공해유발 물질로 알려져 있으며 폐수처리가 까다롭다는 문제를 수반하는 반면에 본 발명에서 이용한 진공증착법은 도금용액을 사용하지 않고 진공중에서 금속 주석을 증발시켜서 강판(소지기판)에 증착시키는 방법으로서 전기도금법에 비하여 공해발생 요인이 없다는 장점을 가지고 있다.

Description

주석 진공증착 강판의 연속 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 증발원으로부터의 2차 전자발생과 그 경로에 대한 개략도.

Claims (1)

  1. 주석 증착강판의 제조방법에 있어서, 소지기판과 주석 증발원과의 거리를 250mm 이상으로 하고, 소지기판에 에열온도를 120-2OO℃ 범위로 유지시킨 상태에서 진공중에서 주석 증발원을 가열하여 주석을 소지기판에
    진공증착시킨 후 증착후 강판의 온도를 200℃ 이하로 유지시키는 주석 진공증착 강판의 연속 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940029272A 1994-11-09 1994-11-09 주석 진공증착 강판의 연속 제조방법 KR0138045B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940029272A KR0138045B1 (ko) 1994-11-09 1994-11-09 주석 진공증착 강판의 연속 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940029272A KR0138045B1 (ko) 1994-11-09 1994-11-09 주석 진공증착 강판의 연속 제조방법

Publications (2)

Publication Number Publication Date
KR960017903A true KR960017903A (ko) 1996-06-17
KR0138045B1 KR0138045B1 (ko) 1998-07-15

Family

ID=19397420

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940029272A KR0138045B1 (ko) 1994-11-09 1994-11-09 주석 진공증착 강판의 연속 제조방법

Country Status (1)

Country Link
KR (1) KR0138045B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100867193B1 (ko) * 2007-06-05 2008-11-06 한일월드(주) 정수기용 조명장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100867193B1 (ko) * 2007-06-05 2008-11-06 한일월드(주) 정수기용 조명장치

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Publication number Publication date
KR0138045B1 (ko) 1998-07-15

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