KR950011645A - 알루미늄 증착도금강판의 후처리방법 - Google Patents

알루미늄 증착도금강판의 후처리방법 Download PDF

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Publication number
KR950011645A
KR950011645A KR1019930022381A KR930022381A KR950011645A KR 950011645 A KR950011645 A KR 950011645A KR 1019930022381 A KR1019930022381 A KR 1019930022381A KR 930022381 A KR930022381 A KR 930022381A KR 950011645 A KR950011645 A KR 950011645A
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KR
South Korea
Prior art keywords
steel sheet
plated steel
post
treatment method
aluminum
Prior art date
Application number
KR1019930022381A
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English (en)
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KR960000879B1 (ko
Inventor
전재호
최장현
정진호
신정철
Original Assignee
백덕현
한국신철강기술연구조합
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 백덕현, 한국신철강기술연구조합 filed Critical 백덕현
Priority to KR1019930022381A priority Critical patent/KR960000879B1/ko
Publication of KR950011645A publication Critical patent/KR950011645A/ko
Application granted granted Critical
Publication of KR960000879B1 publication Critical patent/KR960000879B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Abstract

본 발명은 내식성을 증가시키기 위해 알루미늄 증착도금강판의 후처리를 실시함에 있어서, 우선 강판위에 알루미늄을 진공증착 방법으로 증착시킨후 알루미늄이 도금된 강판을 적절히 열처리하여 알루미늄도금층 표면위에 산화막 및 수화막을 형성하여 내식성을 증가시키는 방법에 관한 것이다.

Description

알루미늄 증착도금강판의 후처리방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 알루미늄증착 도금강판의 후처리 방법에 있어서, 450℃~550℃의 온도에서 2분 미만 열처리를 실시한 후, 80℃ 이상의 증류수에서 10분 이상 탕욕시키는 것을 특징으로 하는 알루미늄 증착도금강판의 후처리 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930022381A 1993-10-26 1993-10-26 알루미늄 증착도금강판의 후처리방법 KR960000879B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019930022381A KR960000879B1 (ko) 1993-10-26 1993-10-26 알루미늄 증착도금강판의 후처리방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930022381A KR960000879B1 (ko) 1993-10-26 1993-10-26 알루미늄 증착도금강판의 후처리방법

Publications (2)

Publication Number Publication Date
KR950011645A true KR950011645A (ko) 1995-05-15
KR960000879B1 KR960000879B1 (ko) 1996-01-13

Family

ID=19366627

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930022381A KR960000879B1 (ko) 1993-10-26 1993-10-26 알루미늄 증착도금강판의 후처리방법

Country Status (1)

Country Link
KR (1) KR960000879B1 (ko)

Also Published As

Publication number Publication date
KR960000879B1 (ko) 1996-01-13

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