KR960014413A - 원수에 전해질을 첨가하는 전해수 제조장치 - Google Patents
원수에 전해질을 첨가하는 전해수 제조장치 Download PDFInfo
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- KR960014413A KR960014413A KR1019950039266A KR19950039266A KR960014413A KR 960014413 A KR960014413 A KR 960014413A KR 1019950039266 A KR1019950039266 A KR 1019950039266A KR 19950039266 A KR19950039266 A KR 19950039266A KR 960014413 A KR960014413 A KR 960014413A
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
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- B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
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- B01D61/44—Ion-selective electrodialysis
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- B01D61/58—Multistep processes
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/02—Column or bed processes
- B01J47/06—Column or bed processes during which the ion-exchange material is subjected to a physical treatment, e.g. heat, electric current, irradiation or vibration
- B01J47/08—Column or bed processes during which the ion-exchange material is subjected to a physical treatment, e.g. heat, electric current, irradiation or vibration subjected to a direct electric current
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- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
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- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
- C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
- C02F1/4695—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis electrodeionisation
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- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
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- C02F2001/46133—Electrodes characterised by the material
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- C02F2201/46—Apparatus for electrochemical processes
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- C02F2201/46—Apparatus for electrochemical processes
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Abstract
본 발명은 살균, 금속 표면의 산화 방지, 고체 표면에 부착한 각종 오염물질의 제거등에 적합한 전해수를 공급하는 전해수 제조 장치에 관한 것으로서, 3수조식 전해조는 양극실(6), 음극실(8), 이들 양극실과 음극실 사이에 한쌍의 격막에 의해 구분하여 설치된 중간실(7)의 3실로 이루어진 이들 3실 각각에 순수등의 원수를 공급하도록 설치된 공급 배관(9, 10, 11)중에 양극실(6)로의 공급 배관(9) 또는 음극실(8)로의 공급 배관(11)의 적어도 어떤 한쪽에 전해질을 주입하는 수단(12, 13)을 설치한 것을 특징으로 한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 관련된 전해수 제조장치의 구조 개요를 나타낸 도면,
제2도는 종래의 2수조식 전해수 제조장치의 구조개요를 나타낸 도면,
제3도는 종래의 3수조직 전해수 제조장치의 구조개요를 나타낸 도면이다.
Claims (12)
- 양극 전극과 음극 전극사이에 직류 전압을 인가하여 전해수를 얻는 전해수 제조 장치에 있어서, (A)양극 전극을 수용한 양극실; (B)음극 전극을 수용한 음극실; (C)이들 양극실과 음극실 사이에 설치되며, 양극실 및 음극실로부터 한쌍의 격막에 의해서 구분된 중간실; (D)상기 양극실, 음극실 및 중간실에 각각 원수를 각각 공급하는 공급배관; (E)상기 양극실 및 음극실 및 중간실로부터 처리수를 각각 배출하는 배출 배관; 및 (F)상기 양극실 및 음극실로 원수를 공급하는 공급 배관의 적어도 한쪽의 공급 배관에 설치된 전해질 첨가장치를 포함하는 것을 특징으로 하는 원수에 전해질을 첨가하는 전해수 제조 장치.
- 제1항에 있어서, 상기 전해질 첨가 장치는 첨가하는 전해질의 복수의 성상에서 적어도 한 개의 성상이 제어 가능한 것을 특징으로 하는 전해수 제조 장치.
- 제1항에 있어서, 상기 전해질 첨가 장치는 상기 공급 배관에 공급하는 전해질의 양을 전해질이 미리 첨가된 원수의 성상에 따라 제어하는 것을 특징으로 하는 전해수 제조 장치.
- 제1항에 있어서, 상기 전해질 첨가 장치가 상기 공급 배관에 공급하는 전해질의 양을 양극실 또는 음극실로부터 배출되는 처리수의 성상에 따라 제어하는 것을 특징으로 하는 전해수 제조 장치.
- 제3항에 있어서, 상기 원수의 성상이 pH인 것을 특징으로 하는 전해수 제조 장치.
- 제4항에 있어서, 상기 원수의 성상이 pH인 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 상기 전해질 첨가 장치가 양극실로의 공급 배관에 설치되어 산을 첨가하는 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 상기 전해질 첨가 장치가 음극실로의 공급 배관에 설치되어 염기를 첨가하는 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 상기 전해질 첨가 장치가 양극실 및 음극실로의 양쪽의 공급배관에 설치되며, 산과 염기를 각각 첨가하는 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 양극실, 음극실 및 중간실에 공급하는 원수가 순수 도는 초순수인 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제10항 중 어느 한 항에 있어서, 상기 한쌍의 격막중에 적어도 한쪽이 이온 교환막인 것을 특징으로 하는 전해수 제조 장치.
- 제1항 내지 제11항중 어느 한 항에 있어서, 상기 중간실에는 고체 전해질이 충전되어 있는 것을 특징으로 하는 전해수 제조 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP94-265809 | 1994-10-28 | ||
JP26580994A JP3181795B2 (ja) | 1994-10-28 | 1994-10-28 | 電解水製造装置 |
Publications (2)
Publication Number | Publication Date |
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KR960014413A true KR960014413A (ko) | 1996-05-22 |
KR100210292B1 KR100210292B1 (ko) | 1999-07-15 |
Family
ID=17422356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950039266A KR100210292B1 (ko) | 1994-10-28 | 1995-10-28 | 원수에 전해질을 첨가하는 전해수 제조장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5593554A (ko) |
JP (1) | JP3181795B2 (ko) |
KR (1) | KR100210292B1 (ko) |
TW (1) | TW386069B (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20030067109A (ko) * | 2002-02-07 | 2003-08-14 | 니폰 인텍 가부시키가이샤 | 다기능 전해수 생성 장치 |
KR20030071018A (ko) * | 2002-02-27 | 2003-09-03 | 니폰 인텍 가부시키가이샤 | 다기능 전해수 생성 장치 및 그 전해수 생성 방법 |
KR100522550B1 (ko) * | 2001-09-14 | 2005-10-20 | 이재용 | 표면세정, 표면처리에 적합한 대전 에노드수의 제조용전해조. |
KR20130037156A (ko) * | 2011-10-05 | 2013-04-15 | 삼성전자주식회사 | 환원수 제조장치 |
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JP3184015B2 (ja) * | 1993-08-10 | 2001-07-09 | 野村マイクロ・サイエンス株式会社 | 超純水製造装置 |
JP3313263B2 (ja) * | 1995-04-15 | 2002-08-12 | 株式会社東芝 | 電解水生成方法及びその生成装置、半導体製造装置 |
JP3169831B2 (ja) * | 1995-11-30 | 2001-05-28 | 株式会社荏原製作所 | 水中の陰イオンの検出装置 |
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JPH10128338A (ja) * | 1996-10-29 | 1998-05-19 | Ebara Corp | 電気再生式連続脱塩装置のスケール析出防止方法及び装置 |
JP3455035B2 (ja) * | 1996-11-14 | 2003-10-06 | 株式会社東芝 | 電解イオン水生成装置及び半導体製造装置 |
EP1036037B1 (en) | 1997-12-04 | 2004-02-25 | Steris Corporation | Chemical modification of electrochemically activated water |
JP2000104189A (ja) * | 1998-09-28 | 2000-04-11 | Permelec Electrode Ltd | 過酸化水素の製造方法及び製造用電解槽 |
JP4583530B2 (ja) | 1999-03-19 | 2010-11-17 | オルガノ株式会社 | 熱交換用水及びその供給装置 |
TW546257B (en) | 1999-09-01 | 2003-08-11 | Nihon Trim Co Ltd | Method and apparatus for producing electrolytic reduced water |
US6357454B1 (en) * | 1999-11-03 | 2002-03-19 | Jyonan Electric Industrial Co., Ltd. | Method for washing and sterilizing beer supply pipe |
KR100389917B1 (ko) | 2000-09-06 | 2003-07-04 | 삼성전자주식회사 | 산화성 물질을 포함하는 아노드 수 및/또는 환원성 물질을포함하는 캐소드 수를 사용하는 반도체 제조를 위한 습식공정 및 이 공정에 사용되는 아노드수 및/또는 캐소드수 |
KR20010070621A (ko) * | 2001-05-28 | 2001-07-27 | 류근걸 | 전리수를 이용한 반도체 실리콘웨이퍼 습식세정 방법 |
KR100848085B1 (ko) * | 2001-07-09 | 2008-07-24 | 삼성전자주식회사 | 세정용 이온수의 제조 방법 |
KR20010099406A (ko) * | 2001-09-25 | 2001-11-09 | 강봉규 | 1셀이 3실로 이루어진 멀티 셀(Multi-Cell) 전해수기 |
ATE535262T1 (de) * | 2001-12-05 | 2011-12-15 | Oculus Innovative Sciences Inc | Verfahren und vorrichtung zur erzeugung von wasser mit negativem und positivem redoxpotential (orp) |
WO2004007376A1 (en) * | 2002-07-17 | 2004-01-22 | Peter Nunn | Water treatment device for electrolyzing, magnetizing, and re-resonating water |
US9168318B2 (en) | 2003-12-30 | 2015-10-27 | Oculus Innovative Sciences, Inc. | Oxidative reductive potential water solution and methods of using the same |
US20050139808A1 (en) * | 2003-12-30 | 2005-06-30 | Oculus Innovative Sciences, Inc. | Oxidative reductive potential water solution and process for producing same |
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-
1995
- 1995-10-27 TW TW084111333A patent/TW386069B/zh not_active IP Right Cessation
- 1995-10-27 US US08/549,647 patent/US5593554A/en not_active Expired - Fee Related
- 1995-10-28 KR KR1019950039266A patent/KR100210292B1/ko not_active IP Right Cessation
Cited By (4)
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KR100522550B1 (ko) * | 2001-09-14 | 2005-10-20 | 이재용 | 표면세정, 표면처리에 적합한 대전 에노드수의 제조용전해조. |
KR20030067109A (ko) * | 2002-02-07 | 2003-08-14 | 니폰 인텍 가부시키가이샤 | 다기능 전해수 생성 장치 |
KR20030071018A (ko) * | 2002-02-27 | 2003-09-03 | 니폰 인텍 가부시키가이샤 | 다기능 전해수 생성 장치 및 그 전해수 생성 방법 |
KR20130037156A (ko) * | 2011-10-05 | 2013-04-15 | 삼성전자주식회사 | 환원수 제조장치 |
Also Published As
Publication number | Publication date |
---|---|
JPH08127886A (ja) | 1996-05-21 |
TW386069B (en) | 2000-04-01 |
US5593554A (en) | 1997-01-14 |
JP3181795B2 (ja) | 2001-07-03 |
KR100210292B1 (ko) | 1999-07-15 |
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