KR950701130A - 원자 및 분자 이온을 갖는 표면 조사에 유용한 작용 공간에 진동 자계를 발생시키는 시스템 및 방법(producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions) - Google Patents

원자 및 분자 이온을 갖는 표면 조사에 유용한 작용 공간에 진동 자계를 발생시키는 시스템 및 방법(producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions)

Info

Publication number
KR950701130A
KR950701130A KR1019940703026A KR19940703026A KR950701130A KR 950701130 A KR950701130 A KR 950701130A KR 1019940703026 A KR1019940703026 A KR 1019940703026A KR 19940703026 A KR19940703026 A KR 19940703026A KR 950701130 A KR950701130 A KR 950701130A
Authority
KR
South Korea
Prior art keywords
atomic
useful
molecular ions
working
irradiating
Prior art date
Application number
KR1019940703026A
Other languages
English (en)
Other versions
KR100333111B1 (ko
Inventor
힐튼 에프. 글래비쉬
Original Assignee
힐튼 에프. 글래비쉬
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 힐튼 에프. 글래비쉬 filed Critical 힐튼 에프. 글래비쉬
Publication of KR950701130A publication Critical patent/KR950701130A/ko
Application granted granted Critical
Publication of KR100333111B1 publication Critical patent/KR100333111B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F3/00Cores, Yokes, or armatures
    • H01F3/02Cores, Yokes, or armatures made from sheets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00Magnets
    • H01F7/06Electromagnets; Actuators including electromagnets
    • H01F7/20Electromagnets; Actuators including electromagnets without armatures
    • H01F7/202Electromagnets for high magnetic field strength
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70Arrangements for deflecting ray or beam
    • H01J29/72Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/76Deflecting by magnetic fields only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/26Arrangements for deflecting ray or beam
    • H01J3/28Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J3/32Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines by magnetic fields only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472Deflecting along given lines
    • H01J37/1474Scanning means
    • H01J37/1475Scanning means magnetic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/31701Ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Particle Accelerators (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1019940703026A 1992-02-28 1994-08-29 원자및분자이온으로표면을조사하는데유용한진동자장을동작간극에서생성하기위한시스템및방법 KR100333111B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/843,391 US5311028A (en) 1990-08-29 1992-02-28 System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions

Publications (2)

Publication Number Publication Date
KR950701130A true KR950701130A (ko) 1995-02-20
KR100333111B1 KR100333111B1 (ko) 2002-11-07

Family

ID=25289833

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940703026A KR100333111B1 (ko) 1992-02-28 1994-08-29 원자및분자이온으로표면을조사하는데유용한진동자장을동작간극에서생성하기위한시스템및방법

Country Status (6)

Country Link
US (3) US5311028A (ko)
EP (2) EP0631358B1 (ko)
JP (3) JP3475253B2 (ko)
KR (1) KR100333111B1 (ko)
DE (1) DE69325650T2 (ko)
WO (1) WO1993017445A1 (ko)

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EP0631358A3 (en) 1995-08-02
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JP3734173B2 (ja) 2006-01-11
EP0632929A1 (en) 1995-01-11
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JP2004103555A (ja) 2004-04-02
US5483077A (en) 1996-01-09
JPH10513301A (ja) 1998-12-15
US5311028A (en) 1994-05-10
DE69325650T2 (de) 1999-12-30
JP2005191011A (ja) 2005-07-14
JP3975363B2 (ja) 2007-09-12
EP0631358A2 (en) 1994-12-28
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US5393984A (en) 1995-02-28
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