KR950034652A - 정전척 - Google Patents
정전척 Download PDFInfo
- Publication number
- KR950034652A KR950034652A KR1019950001027A KR19950001027A KR950034652A KR 950034652 A KR950034652 A KR 950034652A KR 1019950001027 A KR1019950001027 A KR 1019950001027A KR 19950001027 A KR19950001027 A KR 19950001027A KR 950034652 A KR950034652 A KR 950034652A
- Authority
- KR
- South Korea
- Prior art keywords
- electrostatic chuck
- titanium
- less
- insulating dielectric
- nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract 4
- 239000000919 ceramic Substances 0.000 claims abstract 2
- 239000007921 spray Substances 0.000 claims abstract 2
- 230000003746 surface roughness Effects 0.000 claims abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims 2
- 229910052582 BN Inorganic materials 0.000 claims 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- -1 sialon Chemical compound 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8839094A JPH07297265A (ja) | 1994-04-26 | 1994-04-26 | 静電チャック |
| JP94-88390 | 1994-04-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR950034652A true KR950034652A (ko) | 1995-12-28 |
Family
ID=13941474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950001027A Ceased KR950034652A (ko) | 1994-04-26 | 1995-01-21 | 정전척 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH07297265A (enrdf_load_stackoverflow) |
| KR (1) | KR950034652A (enrdf_load_stackoverflow) |
| TW (1) | TW287314B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100522976B1 (ko) * | 2000-06-07 | 2005-10-19 | 스미토모 오사카 세멘토 가부시키가이샤 | 정전 척 |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09260474A (ja) * | 1996-03-22 | 1997-10-03 | Sony Corp | 静電チャックおよびウエハステージ |
| CN1127750C (zh) | 1996-12-27 | 2003-11-12 | 佳能株式会社 | 减少电荷的薄膜,图象形成装置及其制造方法 |
| JP4236292B2 (ja) * | 1997-03-06 | 2009-03-11 | 日本碍子株式会社 | ウエハー吸着装置およびその製造方法 |
| JPH11214491A (ja) * | 1998-01-22 | 1999-08-06 | Toshiba Ceramics Co Ltd | ウエハ保持装置及びその製造方法 |
| JPH11209182A (ja) * | 1998-01-22 | 1999-08-03 | Sumitomo Metal Ind Ltd | プラズマ耐食部材 |
| WO1999059201A1 (en) * | 1998-05-11 | 1999-11-18 | Applied Materials Inc | Polished ceramic chuck for low backside particles in semiconductor plasma processing |
| US6717116B1 (en) | 1999-08-10 | 2004-04-06 | Ibiden Co., Ltd. | Semiconductor production device ceramic plate |
| JP2002057207A (ja) * | 2000-01-20 | 2002-02-22 | Sumitomo Electric Ind Ltd | 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置 |
| JP4529690B2 (ja) * | 2000-01-20 | 2010-08-25 | 住友電気工業株式会社 | 半導体製造装置用ウェハ保持体およびその製造方法ならびに半導体製造装置 |
| JP4272786B2 (ja) * | 2000-01-21 | 2009-06-03 | トーカロ株式会社 | 静電チャック部材およびその製造方法 |
| TWI254403B (en) | 2000-05-19 | 2006-05-01 | Ngk Insulators Ltd | Electrostatic clamper, and electrostatic attracting structures |
| JP3693895B2 (ja) | 2000-07-24 | 2005-09-14 | 住友大阪セメント株式会社 | 可撓性フィルムの静電吸着装置、可撓性フィルムの静電吸着方法、可撓性フィルムの表面処理方法 |
| KR20020064508A (ko) * | 2001-02-02 | 2002-08-09 | 삼성전자 주식회사 | 정전 척 |
| JP4493251B2 (ja) | 2001-12-04 | 2010-06-30 | Ｔｏｔｏ株式会社 | 静電チャックモジュールおよび基板処理装置 |
| DE10232080B4 (de) * | 2002-07-15 | 2015-10-01 | Integrated Dynamics Engineering Gmbh | Elektrostatischer Greifer und Verfahren zu dessen Herstellung |
| EP1676309A1 (en) * | 2003-10-09 | 2006-07-05 | SNT Co., Ltd. | Electro-static chuck with non-sintered aln and a method of preparing the same |
| JP2007150351A (ja) * | 2007-02-15 | 2007-06-14 | Toto Ltd | 静電チャック |
| JP5270310B2 (ja) * | 2008-11-13 | 2013-08-21 | 東京エレクトロン株式会社 | 静電チャック及び基板処理装置 |
| JP2010166086A (ja) * | 2010-04-12 | 2010-07-29 | Fujitsu Semiconductor Ltd | 静電チャックを用いた半導体製造装置 |
| JP2010177698A (ja) * | 2010-04-12 | 2010-08-12 | Fujitsu Semiconductor Ltd | 静電チャックの製造方法 |
| JP6038698B2 (ja) | 2013-03-22 | 2016-12-07 | 日本碍子株式会社 | セラミックス部材及び半導体製造装置用部材 |
| JP6526569B2 (ja) * | 2013-11-29 | 2019-06-05 | 株式会社東芝 | プラズマ装置用部品及びその製造方法 |
| CN106796910B (zh) | 2014-09-16 | 2019-11-12 | 日本碍子株式会社 | 陶瓷结构体、基板保持装置用部件及陶瓷结构体的制法 |
| CN111684574B (zh) * | 2018-02-20 | 2023-09-05 | 住友大阪水泥股份有限公司 | 静电卡盘装置及静电卡盘装置的制造方法 |
| JP7214868B2 (ja) | 2019-06-28 | 2023-01-30 | 日本碍子株式会社 | ウエハ載置台 |
| CN117735995A (zh) * | 2020-07-13 | 2024-03-22 | 京瓷株式会社 | 试样保持工具 |
| CN119208237B (zh) * | 2024-09-27 | 2025-07-18 | 广东精瓷新材料有限公司 | 一种高介电高击穿强度的静电卡盘及其制备方法 |
-
1994
- 1994-04-26 JP JP8839094A patent/JPH07297265A/ja active Pending
- 1994-11-04 TW TW083110217A patent/TW287314B/zh active
-
1995
- 1995-01-21 KR KR1019950001027A patent/KR950034652A/ko not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100522976B1 (ko) * | 2000-06-07 | 2005-10-19 | 스미토모 오사카 세멘토 가부시키가이샤 | 정전 척 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07297265A (ja) | 1995-11-10 |
| TW287314B (enrdf_load_stackoverflow) | 1996-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19950121 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20000121 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19950121 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20011207 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20020403 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20011207 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |