KR950019658A - 플래쉬 램프를 이용한 워크피스에서의 상형성 방법 및 그 장치 - Google Patents

플래쉬 램프를 이용한 워크피스에서의 상형성 방법 및 그 장치 Download PDF

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Publication number
KR950019658A
KR950019658A KR1019940034614A KR19940034614A KR950019658A KR 950019658 A KR950019658 A KR 950019658A KR 1019940034614 A KR1019940034614 A KR 1019940034614A KR 19940034614 A KR19940034614 A KR 19940034614A KR 950019658 A KR950019658 A KR 950019658A
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KR
South Korea
Prior art keywords
workpiece
flash lamp
radiation
template
wavelength
Prior art date
Application number
KR1019940034614A
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English (en)
Inventor
스코트 던 더글라스
부르스 힐 제프리
존 아우더커크 앤드류
Original Assignee
테릴 켄트 퀼레이
미네소타 마이닝 앤드 매뉴팩츄어링 컴패니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 테릴 켄트 퀼레이, 미네소타 마이닝 앤드 매뉴팩츄어링 컴패니 filed Critical 테릴 켄트 퀼레이
Publication of KR950019658A publication Critical patent/KR950019658A/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser

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  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

본 발명은 프랠쉬 램프를 이용하여 워크피스에 상을 형성하는 방법에 관한 것으로, 형판을 워크피스에 가장 근접하게 위치 설정하는 단계와, 형판을 통하여 약 100μsec이하의 단펄스 동안 플래쉬 램프에 의해 방출된 방사선을 워크피스 쪽으로 지향시키는 단계를 포함한다.

Description

플래쉬 램프를 이용한 워크피스에서의 상형성 방법 및 그 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 플래쉬 램프를 이용하여 워크피스에 상을 형성하는 방법에 있어서, 형판을 워크퍼스에 가장 근접하게 위치 설정하는 단계와; 형판을 통하여 약 100μsec 정도의 단펄스 동안 플래쉬 램프에 의해 방출되고 파편을 워크퍼스로부터 멀리 이동시킬 수 있는 방사선을 워크피스쪽으로 지향시키는 단계를 포함하는 것을 특징으로 하는 방법.
  2. 제1항에 있어서, 방사선의 파장은 약800nm 이하인 것을 특징으로 하는 방법.
  3. 제1항에 있어서, 방사선의 파장의 범위는 약 200nm 내지 800nm인 것을 특징으로 하는 방법.
  4. 제1항에 있어서, 방사선이 광학 필터를 통과하게 하여 그 광학 필터를 통과하지 않는 방사선의 파장을 선택하게끔 광학 필터를 플래쉬 램프와 워크퍼스 사이에 위치시키는 단계를 추가로 포함하는 것을 특징으로 하는 방법.
  5. 제1항에 있어서, 플래쉬 램프는 크세논을 포함한 관형 램프 본체를 갖는 선형 플래쉬 램프를 포함하는 것을 특징으로 하는 방법.
  6. 제1항에 있어서, 워크퍼스로부터 파편을 분산시키지 않도록 층을 형판에 가장 근접하게 위치 설정하는 단계를 추가로 포함하는데, 상기 층은 플래쉬 램프로부터 방사선이 워크피스에 패턴을 형성하기 전에 그 층을 통과하도록 배치되고, 플래쉬 램프가 상을 형성할 수 있도록 충분한 방사선 투과를 허용하는 것을 특징으로 하는 방법.
  7. 제1항에 있어서, 워크피스는 자기 또는 전도성 금속의 코팅을 갖는 기판을 포함하는 것을 특징으로 하는 방법.
  8. 제7항에 있어서, 기판은 폴리에스테르, 폴리에틸렌, 테레프탈레이트 및 폴리이미드로 이루어진 그룹으로부터 선택된 동족의 폴리머를 포함하는 것을 특징으로 하는 방법.
  9. 워크피스에 상을 형성하는 장치에 있어서, 워크피스에 가장 근접하게 위치된 형판과, 형판에 가장 근접하게 위치되고, 형판을 통하여 워크피스 쪽으로 지향되고 약 100μsec 정도의 단펄스 동안 약 800nm이하의 파장을 갖는 방사선을 방출하는 선형 플래쉬 램프를 포함하는 것을 특징으로 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940034614A 1993-12-17 1994-12-16 플래쉬 램프를 이용한 워크피스에서의 상형성 방법 및 그 장치 KR950019658A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16916893A 1993-12-17 1993-12-17
US08/169,168 1993-12-17

Publications (1)

Publication Number Publication Date
KR950019658A true KR950019658A (ko) 1995-07-24

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KR1019940034614A KR950019658A (ko) 1993-12-17 1994-12-16 플래쉬 램프를 이용한 워크피스에서의 상형성 방법 및 그 장치

Country Status (7)

Country Link
US (1) US5757016A (ko)
EP (1) EP0658437B1 (ko)
JP (1) JPH07204873A (ko)
KR (1) KR950019658A (ko)
CN (1) CN1082903C (ko)
CA (1) CA2137632A1 (ko)
DE (1) DE69416284T2 (ko)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19718177A1 (de) * 1997-04-29 1998-11-05 Fraunhofer Ges Forschung Verfahren zur Aufrauhung von Kunststoffen
AUPQ125999A0 (en) * 1999-06-28 1999-07-22 Securency Pty Ltd Method of producing a diffractive structure in security documents
EP1409192A4 (en) * 2001-07-02 2008-08-06 Virtek Laser Systems Inc METHOD FOR ABLATION OF AN OPENING IN A NON-METALLIC HARD SUBSTRATE
US7364085B2 (en) * 2003-09-30 2008-04-29 Digimarc Corporation Identification document with printing that creates moving and three dimensional image effects with pulsed illumination
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
EP2011629A1 (de) * 2007-07-03 2009-01-07 F. Hoffman-la Roche AG Verfahren zur Herstellung eines mikrofluiden Systems auf einer Polymeroberfläche
CN102317820B (zh) 2008-12-22 2013-11-20 3M创新有限公司 使用空间选择性双折射减少的内部图案化多层光学膜
WO2011153357A1 (en) * 2010-06-02 2011-12-08 Ncc Nano, Llc Method for providing lateral thermal processing of thin films on low-temperature substrates
WO2012003215A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Retarder film combinations with spatially selective birefringence reduction
US9101956B2 (en) 2010-06-30 2015-08-11 3M Innovative Properties Company Mask processing using films with spatially selective birefringence reduction
BR112012033226A2 (pt) 2010-06-30 2016-11-16 3M Innovative Properties Co filmes ópticos diufsos reflexivos com redução de birrefringência espacialmente seletiva
WO2012041510A2 (de) * 2010-09-30 2012-04-05 Thomas Offermann Blitzlichtvorrichtung zum aushärten von lichtaushärtbaren materialien, verfahren und set
US20170231734A1 (en) 2010-09-30 2017-08-17 Dinko Jurcevic Flashlight Device for Curing Light-Curable Materials, Method and Set
US20140054065A1 (en) * 2012-08-21 2014-02-27 Abner D. Joseph Electrical circuit trace manufacturing for electro-chemical sensors
WO2015061332A1 (en) 2013-10-23 2015-04-30 Heilux, Llc High powered led light module with a balanced matrix circuit
EP3648145B1 (en) * 2018-11-05 2022-01-05 Xylem Europe GmbH Vacuum ultraviolet excimer lamp with an inner axially symmetric wire electrode
JP7310466B2 (ja) * 2019-09-10 2023-07-19 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム評価方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3547629A (en) * 1962-09-27 1970-12-15 American Screen Process Equip Photoflash method of transferring information and fabricating printed circuits
US3480965A (en) * 1968-04-15 1969-11-25 Xerox Corp Apparatus for pyrogenically recording on transparencies
US4032743A (en) * 1975-06-27 1977-06-28 Marvel Engineering Company Laser microperforator
DE2616362A1 (de) * 1976-04-14 1977-11-03 Philips Patentverwaltung Vorrichtung zum herstellen optisch lesbarer servospuren in der magnetspeicherschicht von datentraegern
US4074276A (en) * 1976-05-26 1978-02-14 Xerox Corporation Magnetic imaging system using heat
US4211838A (en) * 1977-08-25 1980-07-08 Energy Conversion Devices, Inc. Method of high sensitivity imaging and imaging film therefor
DE3071196D1 (en) * 1979-08-03 1985-11-28 Toshiba Kk Device for performing a heat-sensitive recording, heat-sensitive recording sheet, and a method for performing a heat-sensitive recording
US4323755A (en) * 1979-09-24 1982-04-06 Rca Corporation Method of making a machine-readable marking in a workpiece
US4529991A (en) * 1981-05-20 1985-07-16 Fuji Photo Film Co., Ltd. Method for copying optical information
US4436985A (en) * 1982-05-03 1984-03-13 Gca Corporation Apparatus for heat treating semiconductor wafers
US4515867A (en) * 1982-09-20 1985-05-07 Rca Corporation Method for ablating a coded marking into a glass workpiece and product thereof
US4516195A (en) * 1983-12-28 1985-05-07 Dentsply Research & Development Corp. Multi-function dental operating light source
US4877480A (en) * 1986-08-08 1989-10-31 Digital Equipment Corporation Lithographic technique using laser for fabrication of electronic components and the like
US4868006A (en) * 1987-03-16 1989-09-19 Minnesota Mining And Manufacturing Company Polymeric film with reduced surface friction
US5028292A (en) * 1987-03-16 1991-07-02 Minnesota Mining And Manufacturing Company Adhesive bonding to quasi-amorphous polymer surfaces
US4879176A (en) * 1987-03-16 1989-11-07 Minnesota Mining And Manufacturing Company Surface modification of semicrystalline polymers
US4764707A (en) * 1987-07-06 1988-08-16 Hsu Cheng Wei Light bulb
US4822451A (en) * 1988-04-27 1989-04-18 Minnesota Mining And Manufacturing Company Process for the surface modification of semicrystalline polymers
JPH03220218A (ja) * 1988-07-29 1991-09-27 Nippondenso Co Ltd 樹脂組成物および印刷インキ用組成物
US5061604A (en) * 1990-05-04 1991-10-29 Minnesota Mining And Manufacturing Company Negative crystalline photoresists for UV photoimaging
US5178726A (en) * 1991-03-07 1993-01-12 Minnesota Mining And Manufacturing Company Process for producing a patterned metal surface
US5204517A (en) * 1991-12-24 1993-04-20 Maxwell Laboratories, Inc. Method and system for control of a material removal process using spectral emission discrimination

Also Published As

Publication number Publication date
CN1082903C (zh) 2002-04-17
CA2137632A1 (en) 1995-06-18
DE69416284D1 (de) 1999-03-11
CN1115875A (zh) 1996-01-31
JPH07204873A (ja) 1995-08-08
EP0658437B1 (en) 1999-01-27
EP0658437A1 (en) 1995-06-21
US5757016A (en) 1998-05-26
DE69416284T2 (de) 1999-09-23

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