KR940027611U - Wafer Chuck of Semiconductor Exposure Equipment - Google Patents

Wafer Chuck of Semiconductor Exposure Equipment

Info

Publication number
KR940027611U
KR940027611U KR2019930007704U KR930007704U KR940027611U KR 940027611 U KR940027611 U KR 940027611U KR 2019930007704 U KR2019930007704 U KR 2019930007704U KR 930007704 U KR930007704 U KR 930007704U KR 940027611 U KR940027611 U KR 940027611U
Authority
KR
South Korea
Prior art keywords
wafer chuck
exposure equipment
semiconductor exposure
semiconductor
equipment
Prior art date
Application number
KR2019930007704U
Other languages
Korean (ko)
Other versions
KR970002147Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019930007704U priority Critical patent/KR970002147Y1/en
Publication of KR940027611U publication Critical patent/KR940027611U/en
Application granted granted Critical
Publication of KR970002147Y1 publication Critical patent/KR970002147Y1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019930007704U 1993-05-10 1993-05-10 Wafer chuck of semiconductor exposure device KR970002147Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930007704U KR970002147Y1 (en) 1993-05-10 1993-05-10 Wafer chuck of semiconductor exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930007704U KR970002147Y1 (en) 1993-05-10 1993-05-10 Wafer chuck of semiconductor exposure device

Publications (2)

Publication Number Publication Date
KR940027611U true KR940027611U (en) 1994-12-10
KR970002147Y1 KR970002147Y1 (en) 1997-03-19

Family

ID=19354976

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930007704U KR970002147Y1 (en) 1993-05-10 1993-05-10 Wafer chuck of semiconductor exposure device

Country Status (1)

Country Link
KR (1) KR970002147Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110032046A (en) * 2019-04-28 2019-07-19 德淮半导体有限公司 Litho machine and its operating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110032046A (en) * 2019-04-28 2019-07-19 德淮半导体有限公司 Litho machine and its operating method

Also Published As

Publication number Publication date
KR970002147Y1 (en) 1997-03-19

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070221

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee