KR940027611U - Wafer Chuck of Semiconductor Exposure Equipment - Google Patents
Wafer Chuck of Semiconductor Exposure EquipmentInfo
- Publication number
- KR940027611U KR940027611U KR2019930007704U KR930007704U KR940027611U KR 940027611 U KR940027611 U KR 940027611U KR 2019930007704 U KR2019930007704 U KR 2019930007704U KR 930007704 U KR930007704 U KR 930007704U KR 940027611 U KR940027611 U KR 940027611U
- Authority
- KR
- South Korea
- Prior art keywords
- wafer chuck
- exposure equipment
- semiconductor exposure
- semiconductor
- equipment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930007704U KR970002147Y1 (en) | 1993-05-10 | 1993-05-10 | Wafer chuck of semiconductor exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930007704U KR970002147Y1 (en) | 1993-05-10 | 1993-05-10 | Wafer chuck of semiconductor exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940027611U true KR940027611U (en) | 1994-12-10 |
KR970002147Y1 KR970002147Y1 (en) | 1997-03-19 |
Family
ID=19354976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019930007704U KR970002147Y1 (en) | 1993-05-10 | 1993-05-10 | Wafer chuck of semiconductor exposure device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970002147Y1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110032046A (en) * | 2019-04-28 | 2019-07-19 | 德淮半导体有限公司 | Litho machine and its operating method |
-
1993
- 1993-05-10 KR KR2019930007704U patent/KR970002147Y1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110032046A (en) * | 2019-04-28 | 2019-07-19 | 德淮半导体有限公司 | Litho machine and its operating method |
Also Published As
Publication number | Publication date |
---|---|
KR970002147Y1 (en) | 1997-03-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20070221 Year of fee payment: 11 |
|
LAPS | Lapse due to unpaid annual fee |