KR950015159U - Focusing device of semiconductor exposure equipment - Google Patents

Focusing device of semiconductor exposure equipment

Info

Publication number
KR950015159U
KR950015159U KR2019930025486U KR930025486U KR950015159U KR 950015159 U KR950015159 U KR 950015159U KR 2019930025486 U KR2019930025486 U KR 2019930025486U KR 930025486 U KR930025486 U KR 930025486U KR 950015159 U KR950015159 U KR 950015159U
Authority
KR
South Korea
Prior art keywords
focusing device
exposure equipment
semiconductor exposure
semiconductor
equipment
Prior art date
Application number
KR2019930025486U
Other languages
Korean (ko)
Other versions
KR970003953Y1 (en
Inventor
권정현
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930025486U priority Critical patent/KR970003953Y1/en
Publication of KR950015159U publication Critical patent/KR950015159U/en
Application granted granted Critical
Publication of KR970003953Y1 publication Critical patent/KR970003953Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019930025486U 1993-11-29 1993-11-29 Focusing device of semiconductor exposure equipment KR970003953Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930025486U KR970003953Y1 (en) 1993-11-29 1993-11-29 Focusing device of semiconductor exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930025486U KR970003953Y1 (en) 1993-11-29 1993-11-29 Focusing device of semiconductor exposure equipment

Publications (2)

Publication Number Publication Date
KR950015159U true KR950015159U (en) 1995-06-17
KR970003953Y1 KR970003953Y1 (en) 1997-04-24

Family

ID=19369085

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930025486U KR970003953Y1 (en) 1993-11-29 1993-11-29 Focusing device of semiconductor exposure equipment

Country Status (1)

Country Link
KR (1) KR970003953Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303057B1 (en) * 1999-01-22 2001-09-26 윤종용 Focussing method and system of exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303057B1 (en) * 1999-01-22 2001-09-26 윤종용 Focussing method and system of exposure apparatus

Also Published As

Publication number Publication date
KR970003953Y1 (en) 1997-04-24

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040719

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee