KR950021382U - Exposure device of semiconductor manufacturing equipment - Google Patents

Exposure device of semiconductor manufacturing equipment

Info

Publication number
KR950021382U
KR950021382U KR2019930028629U KR930028629U KR950021382U KR 950021382 U KR950021382 U KR 950021382U KR 2019930028629 U KR2019930028629 U KR 2019930028629U KR 930028629 U KR930028629 U KR 930028629U KR 950021382 U KR950021382 U KR 950021382U
Authority
KR
South Korea
Prior art keywords
semiconductor manufacturing
exposure device
manufacturing equipment
equipment
exposure
Prior art date
Application number
KR2019930028629U
Other languages
Korean (ko)
Other versions
KR200152655Y1 (en
Inventor
이인석
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019930028629U priority Critical patent/KR200152655Y1/en
Publication of KR950021382U publication Critical patent/KR950021382U/en
Application granted granted Critical
Publication of KR200152655Y1 publication Critical patent/KR200152655Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019930028629U 1993-12-20 1993-12-20 Exposure apparatus of semiconductor KR200152655Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930028629U KR200152655Y1 (en) 1993-12-20 1993-12-20 Exposure apparatus of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930028629U KR200152655Y1 (en) 1993-12-20 1993-12-20 Exposure apparatus of semiconductor

Publications (2)

Publication Number Publication Date
KR950021382U true KR950021382U (en) 1995-07-28
KR200152655Y1 KR200152655Y1 (en) 1999-07-15

Family

ID=19371764

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930028629U KR200152655Y1 (en) 1993-12-20 1993-12-20 Exposure apparatus of semiconductor

Country Status (1)

Country Link
KR (1) KR200152655Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100564094B1 (en) * 1997-06-19 2006-07-06 에스브이지 리도그래피 시스템즈, 아이엔씨. Vacuum Debris Removal System

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100564094B1 (en) * 1997-06-19 2006-07-06 에스브이지 리도그래피 시스템즈, 아이엔씨. Vacuum Debris Removal System

Also Published As

Publication number Publication date
KR200152655Y1 (en) 1999-07-15

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Payment date: 20080320

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EXPY Expiration of term