KR960032360U - Wafer exposure equipment - Google Patents

Wafer exposure equipment

Info

Publication number
KR960032360U
KR960032360U KR2019950003967U KR19950003967U KR960032360U KR 960032360 U KR960032360 U KR 960032360U KR 2019950003967 U KR2019950003967 U KR 2019950003967U KR 19950003967 U KR19950003967 U KR 19950003967U KR 960032360 U KR960032360 U KR 960032360U
Authority
KR
South Korea
Prior art keywords
exposure equipment
wafer exposure
wafer
equipment
exposure
Prior art date
Application number
KR2019950003967U
Other languages
Korean (ko)
Other versions
KR0122312Y1 (en
Inventor
전용만
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950003967U priority Critical patent/KR0122312Y1/en
Publication of KR960032360U publication Critical patent/KR960032360U/en
Application granted granted Critical
Publication of KR0122312Y1 publication Critical patent/KR0122312Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019950003967U 1995-03-08 1995-03-08 Exposure device for a wafer KR0122312Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950003967U KR0122312Y1 (en) 1995-03-08 1995-03-08 Exposure device for a wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950003967U KR0122312Y1 (en) 1995-03-08 1995-03-08 Exposure device for a wafer

Publications (2)

Publication Number Publication Date
KR960032360U true KR960032360U (en) 1996-10-24
KR0122312Y1 KR0122312Y1 (en) 1998-07-15

Family

ID=19408923

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950003967U KR0122312Y1 (en) 1995-03-08 1995-03-08 Exposure device for a wafer

Country Status (1)

Country Link
KR (1) KR0122312Y1 (en)

Also Published As

Publication number Publication date
KR0122312Y1 (en) 1998-07-15

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040326

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee