KR960015593U - Wafer developer - Google Patents

Wafer developer

Info

Publication number
KR960015593U
KR960015593U KR2019940028476U KR19940028476U KR960015593U KR 960015593 U KR960015593 U KR 960015593U KR 2019940028476 U KR2019940028476 U KR 2019940028476U KR 19940028476 U KR19940028476 U KR 19940028476U KR 960015593 U KR960015593 U KR 960015593U
Authority
KR
South Korea
Prior art keywords
developer
wafer
wafer developer
Prior art date
Application number
KR2019940028476U
Other languages
Korean (ko)
Other versions
KR200198412Y1 (en
Inventor
장종환
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940028476U priority Critical patent/KR200198412Y1/en
Publication of KR960015593U publication Critical patent/KR960015593U/en
Application granted granted Critical
Publication of KR200198412Y1 publication Critical patent/KR200198412Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR2019940028476U 1994-10-29 1994-10-29 Wafer developing apparatus KR200198412Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940028476U KR200198412Y1 (en) 1994-10-29 1994-10-29 Wafer developing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940028476U KR200198412Y1 (en) 1994-10-29 1994-10-29 Wafer developing apparatus

Publications (2)

Publication Number Publication Date
KR960015593U true KR960015593U (en) 1996-05-17
KR200198412Y1 KR200198412Y1 (en) 2000-12-01

Family

ID=19396795

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940028476U KR200198412Y1 (en) 1994-10-29 1994-10-29 Wafer developing apparatus

Country Status (1)

Country Link
KR (1) KR200198412Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116618352A (en) * 2022-11-18 2023-08-22 南通创峰光电设备有限公司 Development equipment with controllable spraying effect based on vertical conveying mode

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116618352A (en) * 2022-11-18 2023-08-22 南通创峰光电设备有限公司 Development equipment with controllable spraying effect based on vertical conveying mode

Also Published As

Publication number Publication date
KR200198412Y1 (en) 2000-12-01

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090624

Year of fee payment: 10

EXPY Expiration of term