KR960015601U - Wafer developer - Google Patents

Wafer developer

Info

Publication number
KR960015601U
KR960015601U KR2019940028004U KR19940028004U KR960015601U KR 960015601 U KR960015601 U KR 960015601U KR 2019940028004 U KR2019940028004 U KR 2019940028004U KR 19940028004 U KR19940028004 U KR 19940028004U KR 960015601 U KR960015601 U KR 960015601U
Authority
KR
South Korea
Prior art keywords
developer
wafer
wafer developer
Prior art date
Application number
KR2019940028004U
Other languages
Korean (ko)
Other versions
KR0125858Y1 (en
Inventor
이홍구
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940028004U priority Critical patent/KR0125858Y1/en
Publication of KR960015601U publication Critical patent/KR960015601U/en
Application granted granted Critical
Publication of KR0125858Y1 publication Critical patent/KR0125858Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940028004U 1994-10-26 1994-10-26 Wafer developing device KR0125858Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940028004U KR0125858Y1 (en) 1994-10-26 1994-10-26 Wafer developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940028004U KR0125858Y1 (en) 1994-10-26 1994-10-26 Wafer developing device

Publications (2)

Publication Number Publication Date
KR960015601U true KR960015601U (en) 1996-05-17
KR0125858Y1 KR0125858Y1 (en) 1998-11-02

Family

ID=19396410

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940028004U KR0125858Y1 (en) 1994-10-26 1994-10-26 Wafer developing device

Country Status (1)

Country Link
KR (1) KR0125858Y1 (en)

Also Published As

Publication number Publication date
KR0125858Y1 (en) 1998-11-02

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
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FPAY Annual fee payment

Payment date: 20090526

Year of fee payment: 12

EXPY Expiration of term