KR940004333U - Lens support axis connection device of semiconductor exposure equipment - Google Patents

Lens support axis connection device of semiconductor exposure equipment

Info

Publication number
KR940004333U
KR940004333U KR2019920013973U KR920013973U KR940004333U KR 940004333 U KR940004333 U KR 940004333U KR 2019920013973 U KR2019920013973 U KR 2019920013973U KR 920013973 U KR920013973 U KR 920013973U KR 940004333 U KR940004333 U KR 940004333U
Authority
KR
South Korea
Prior art keywords
connection device
axis connection
lens support
support axis
exposure equipment
Prior art date
Application number
KR2019920013973U
Other languages
Korean (ko)
Other versions
KR950006646Y1 (en
Inventor
김철호
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92013973U priority Critical patent/KR950006646Y1/en
Publication of KR940004333U publication Critical patent/KR940004333U/en
Application granted granted Critical
Publication of KR950006646Y1 publication Critical patent/KR950006646Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR92013973U 1992-07-28 1992-07-28 Lenz supporting axis linking apparatus of exposing machine KR950006646Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92013973U KR950006646Y1 (en) 1992-07-28 1992-07-28 Lenz supporting axis linking apparatus of exposing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92013973U KR950006646Y1 (en) 1992-07-28 1992-07-28 Lenz supporting axis linking apparatus of exposing machine

Publications (2)

Publication Number Publication Date
KR940004333U true KR940004333U (en) 1994-02-24
KR950006646Y1 KR950006646Y1 (en) 1995-08-16

Family

ID=19337476

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92013973U KR950006646Y1 (en) 1992-07-28 1992-07-28 Lenz supporting axis linking apparatus of exposing machine

Country Status (1)

Country Link
KR (1) KR950006646Y1 (en)

Also Published As

Publication number Publication date
KR950006646Y1 (en) 1995-08-16

Similar Documents

Publication Publication Date Title
KR950702806A (en) Stand device of optical equipment
DE69317520T2 (en) Optical projection device
DE69408707D1 (en) Photosensitive semiconductor device
KR940004333U (en) Lens support axis connection device of semiconductor exposure equipment
KR950015159U (en) Focusing device of semiconductor exposure equipment
KR950021360U (en) Wafer leveling device of semiconductor exposure equipment
KR950015644U (en) Optical device for alignment of semiconductor exposure equipment
KR950021382U (en) Exposure device of semiconductor manufacturing equipment
KR950021380U (en) Optical axis adjusting device of exposure equipment
KR940013241U (en) Optical axis correction device of optical equipment
KR950012590U (en) Reticle tilt detection device of semiconductor exposure equipment
KR940021332U (en) Reference Mirror for Wafer Alignment of Semiconductor Exposure Equipment
KR940011423U (en) Lens mount device for surveillance camera
KR970045362U (en) Semiconductor exposure equipment
KR960038709U (en) Stage of wafer exposure apparatus
KR920013735U (en) Structure of semiconductor device
KR970045364U (en) Device for preventing rainbow phenomenon of exposure equipment around the wafer
KR950031468U (en) Lighting system of semiconductor exposure equipment
KR950021383U (en) Foreign matter removal device of photo mask for semiconductor exposure equipment
KR950015158U (en) Semiconductor wafer exposure apparatus
KR960024379U (en) Wafer peripheral exposure device
KR940011102U (en) Photosensitive film removal device on the flat part of the wafer
KR970046880U (en) Wafer alignment device of taping equipment
KR950021390U (en) Photosensitive agent coating device of semiconductor manufacturing equipment
KR950020661U (en) Fixing device of housing for surveillance camera

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20060720

Year of fee payment: 12

EXPY Expiration of term