KR940022188A - 감광성 수지인쇄판용 점착방지층 및 그 조성물 - Google Patents

감광성 수지인쇄판용 점착방지층 및 그 조성물 Download PDF

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Publication number
KR940022188A
KR940022188A KR1019940002507A KR19940002507A KR940022188A KR 940022188 A KR940022188 A KR 940022188A KR 1019940002507 A KR1019940002507 A KR 1019940002507A KR 19940002507 A KR19940002507 A KR 19940002507A KR 940022188 A KR940022188 A KR 940022188A
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KR
South Korea
Prior art keywords
photosensitive resin
stick layer
composition
printing plate
resin printing
Prior art date
Application number
KR1019940002507A
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English (en)
Other versions
KR100280188B1 (ko
Inventor
시게노리 나가하라
아키라 도미다
노리코 다카하시
마사루 난뻬이
Original Assignee
시바타 미노루
도요보세키 가부시키가이샤
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Application filed by 시바타 미노루, 도요보세키 가부시키가이샤 filed Critical 시바타 미노루
Publication of KR940022188A publication Critical patent/KR940022188A/ko
Application granted granted Critical
Publication of KR100280188B1 publication Critical patent/KR100280188B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31786—Of polyester [e.g., alkyd, etc.]
    • Y10T428/31797—Next to addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31909—Next to second addition polymer from unsaturated monomers
    • Y10T428/31913—Monoolefin polymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31938—Polymer of monoethylenically unsaturated hydrocarbon

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

(목적) 생산성이 높고 안정된 주름방지효과를 가지며, 또한 보존 안정성이 우수한 점착 방지층을 얻는 것.
(구성) 수계 처리액으로 현상가능한 감광성 수지인쇄판용의 점착방지층으로서, 이 층의 두께 1㎛당 1140cm-1에 있어서의 흡수의 흡광도가 0.010 이상 0.060 이하인 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층 및 이 점착방지층을 형성하는 조성물로서, 이 조성물이 폴리비닐알코올 및 물에 가용으로 비점이 120℃∼240℃의 결정화체가 함유되어 있는 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층 조성물.

Description

감광성 수지인쇄판용 점착방지층 및 그 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 실시예 2에서 얻어진 본 발명 점착방지층의 IR 스펙트럼을 예시한다.

Claims (5)

  1. 수계처리액으로 현상가능한 감광성 수지인쇄판용의 점착방지층으로서, 이 층의 두께 1㎛당 1140cm-1에 있어서의 흡수의 흡광도가 0.010 이상 0.060 이하인 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층.
  2. 제1항에 있어서, 두께 1㎛당 1140cm-1에 있어서의 흡수의 흡광도가 0.020 이상 0.060 이하인 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층.
  3. 제1항에 있어서, 점착방지층을 형성하는 조성물로서, 이 조성물이 폴리비틸알코올 및 물에 가용으로 비점이 120℃∼240℃의 결정화체가 함유되어 있는 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층 조성물.
  4. 제3항에 있어서, 결정화제가 탄소원자수 2 이상의 알킬렌 글리콜인 것을 특징으로 하는 감광성 수지 인쇄판용 점착방지층 조성물.
  5. 제3항에 있어서, 결정화제가 프로필렌글리콜인 것을 특징으로 하는 감광성 수지인쇄판용 점착방지층 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940002507A 1993-03-17 1994-02-12 감광성 수지인쇄판용 점착방지층, 및 그 조성물 KR100280188B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP93-57209 1993-03-17
JP5720993 1993-03-17
JP94-3626 1994-01-18
JP362694A JP2910902B2 (ja) 1993-03-17 1994-01-18 感光性樹脂印刷版用粘着防止層およびその組成物

Publications (2)

Publication Number Publication Date
KR940022188A true KR940022188A (ko) 1994-10-20
KR100280188B1 KR100280188B1 (ko) 2001-03-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940002507A KR100280188B1 (ko) 1993-03-17 1994-02-12 감광성 수지인쇄판용 점착방지층, 및 그 조성물

Country Status (3)

Country Link
US (1) US5786126A (ko)
JP (1) JP2910902B2 (ko)
KR (1) KR100280188B1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0971765A (ja) * 1995-06-29 1997-03-18 Nippon Zeon Co Ltd 粘着防止用組成物
JPH1039513A (ja) * 1996-07-19 1998-02-13 Toyobo Co Ltd 粘着防止層、それを用いた感光性樹脂積層体、その製造方法およびその包装体
KR100247706B1 (ko) * 1997-11-07 2000-06-01 구광시 드라이 필름 포토레지스트
DE19809494A1 (de) * 1998-03-05 1999-09-09 Basf Drucksysteme Gmbh Photostrukturierbare Mehrschichtenelemente mit reversibel haftender Schutzfolie

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CA705477A (en) * 1965-03-09 Revertex Limited Plasticisation of polyvinyl alcohol
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DE3367683D1 (en) * 1982-06-21 1987-01-02 Hoechst Ag Photopolymerizable mixture and photopolymerizable copying material produced therewith
JPS6294379A (ja) * 1985-10-21 1987-04-30 Mitsubishi Yuka Fine Chem Co Ltd 水性インク記録用シ−ト
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Also Published As

Publication number Publication date
JP2910902B2 (ja) 1999-06-23
KR100280188B1 (ko) 2001-03-02
JPH06324497A (ja) 1994-11-25
US5786126A (en) 1998-07-28

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