KR940011528A - 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 - Google Patents
폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 Download PDFInfo
- Publication number
- KR940011528A KR940011528A KR1019930024874A KR930024874A KR940011528A KR 940011528 A KR940011528 A KR 940011528A KR 1019930024874 A KR1019930024874 A KR 1019930024874A KR 930024874 A KR930024874 A KR 930024874A KR 940011528 A KR940011528 A KR 940011528A
- Authority
- KR
- South Korea
- Prior art keywords
- active hydrogen
- molecular weight
- polyhydrogen
- polyhydrogen silsesquioxane
- silsesquioxane
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/32—Post-polymerisation treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/32—Post-polymerisation treatment
- C08G77/36—Fractionation
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Abstract
분자량 선택성이 자유로우며 저장 안정성이 우수한 폴리하이드로겐 실세스퀴옥산을 제공하는, 재현성이 우수하게 폴리하이드로겐 실세스퀴옥산을 분자량 분별하는 방법이 기술되어 있다. 본 방법은 폴리하이드로겐 실세스퀴옥산을 활성 수소를 함유하지 않은 비극성 용매에 용해시키고 ; 생성된 용액에 활성 수소를 함유하지 않은 극성 용매를 가아혀 폴리하이드로겐 실세스퀴옥산을 침전시키고 ; 폴리하이드로겐 실세스퀴옥산의 목적하는 분자량 분획을 수거하는 단계를 포함한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (10)
- 폴리하이드로겐 실세스퀴옥산을 활성 수소를 함유하지 않은 비극성 용매에 용해시키고 ; 생성된 용액에 활성 수소를 함유하지 않은 극성 용매를 가하여 폴리하이드로겐 실세스퀴옥산을 침전시키고 ; 폴리하이드로겐 실세스퀴옥산의 목적하는 분자량 분획을 수거함을 특징으로 하는, 폴리하이드로겐 실세스퀴옥산의 분자량 분별 방법.
- 제1항에 있어서, 활성 수소를 함유하지 않은 비극성 용매가 방향족 용매, 지방족 용매 및 에테르 용매로부터 선택되는 방법.
- 제2항에 있어서, 활성 수소를 함유하지 않은 비특성 용매가 톨루엔인 방법.
- 제1항에 있어서, 활성 수소를 함유하지 않은 비극성 용매가 불순물을 포함하지 않으며 이의 유전 상수가 5이하인 방법.
- 제4항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 니트릴, 클로로아세톤, o-클로로니트로벤젠 및 니트로벤젠으로 부터 선택되는 방법.
- 제5항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 아세토니트릴인 방법.
- 제5항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 불수물을 포함하지 않으며 이의 유전 상수가 30이하인 방법.
- 제1항에 있어서, 분별이 수분이 함유되지 않은 불활성 기체 대기하에 수행되는 방법.
- 제1항에 있어서, 분별이 이온성 볼순물이 용리되지 않는 물질로 제조된 용기내에서 수행되는 방법.
- 제1항에 있어서, 분별 공정을 반복하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33810392A JP3153367B2 (ja) | 1992-11-24 | 1992-11-24 | ポリハイドロジェンシルセスキオキサンの分子量分別方法 |
JP92-338103 | 1992-11-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940011528A true KR940011528A (ko) | 1994-06-21 |
KR100257799B1 KR100257799B1 (ko) | 2000-06-01 |
Family
ID=18314945
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930024874A KR100257799B1 (ko) | 1992-11-24 | 1993-11-22 | 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5416190A (ko) |
EP (1) | EP0599209A3 (ko) |
JP (1) | JP3153367B2 (ko) |
KR (1) | KR100257799B1 (ko) |
TW (1) | TW268020B (ko) |
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JP3465314B2 (ja) * | 1993-02-23 | 2003-11-10 | 富士通株式会社 | 弗素含有水素シルセスキオキサンポリマーおよびその製造方法 |
JPH08245792A (ja) * | 1995-03-10 | 1996-09-24 | Mitsubishi Electric Corp | シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法 |
US5807611A (en) * | 1996-10-04 | 1998-09-15 | Dow Corning Corporation | Electronic coatings |
US5711987A (en) * | 1996-10-04 | 1998-01-27 | Dow Corning Corporation | Electronic coatings |
US5776235A (en) * | 1996-10-04 | 1998-07-07 | Dow Corning Corporation | Thick opaque ceramic coatings |
US5707681A (en) * | 1997-02-07 | 1998-01-13 | Dow Corning Corporation | Method of producing coatings on electronic substrates |
JP3415741B2 (ja) * | 1997-03-31 | 2003-06-09 | 東レ・ダウコーニング・シリコーン株式会社 | 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法 |
US6043330A (en) * | 1997-04-21 | 2000-03-28 | Alliedsignal Inc. | Synthesis of siloxane resins |
US6015457A (en) * | 1997-04-21 | 2000-01-18 | Alliedsignal Inc. | Stable inorganic polymers |
US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
US6218497B1 (en) | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
US6743856B1 (en) | 1997-04-21 | 2004-06-01 | Honeywell International Inc. | Synthesis of siloxane resins |
TW392288B (en) | 1997-06-06 | 2000-06-01 | Dow Corning | Thermally stable dielectric coatings |
US5866197A (en) * | 1997-06-06 | 1999-02-02 | Dow Corning Corporation | Method for producing thick crack-free coating from hydrogen silsequioxane resin |
SG71147A1 (en) | 1997-08-29 | 2000-03-21 | Dow Corning Toray Silicone | Method for forming insulating thin films |
JP3729226B2 (ja) * | 1997-09-17 | 2005-12-21 | 富士通株式会社 | 半導体集積回路装置及びその製造方法 |
US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
US5906859A (en) * | 1998-07-10 | 1999-05-25 | Dow Corning Corporation | Method for producing low dielectric coatings from hydrogen silsequioxane resin |
JP3543669B2 (ja) | 1999-03-31 | 2004-07-14 | 信越化学工業株式会社 | 絶縁膜形成用塗布液及び絶縁膜の形成方法 |
US6472076B1 (en) | 1999-10-18 | 2002-10-29 | Honeywell International Inc. | Deposition of organosilsesquioxane films |
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US6572974B1 (en) | 1999-12-06 | 2003-06-03 | The Regents Of The University Of Michigan | Modification of infrared reflectivity using silicon dioxide thin films derived from silsesquioxane resins |
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US6759098B2 (en) | 2000-03-20 | 2004-07-06 | Axcelis Technologies, Inc. | Plasma curing of MSQ-based porous low-k film materials |
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US6518357B1 (en) | 2000-10-04 | 2003-02-11 | General Electric Company | Flame retardant polycarbonate-silsesquioxane compositions, method for making and articles made thereby |
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US20030194445A1 (en) * | 2001-11-12 | 2003-10-16 | Kuhner Carla H. | Compositions and methods of use of peptides in combination with biocides and/or germicides |
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-
1992
- 1992-11-24 JP JP33810392A patent/JP3153367B2/ja not_active Expired - Lifetime
-
1993
- 1993-10-29 US US08/145,923 patent/US5416190A/en not_active Expired - Lifetime
- 1993-11-10 TW TW082109439A patent/TW268020B/zh active
- 1993-11-19 EP EP93118623A patent/EP0599209A3/en not_active Withdrawn
- 1993-11-22 KR KR1019930024874A patent/KR100257799B1/ko not_active IP Right Cessation
-
1995
- 1995-02-13 US US08/387,697 patent/US5486564A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH06157760A (ja) | 1994-06-07 |
TW268020B (ko) | 1996-01-11 |
EP0599209A3 (en) | 1995-03-15 |
US5486564A (en) | 1996-01-23 |
KR100257799B1 (ko) | 2000-06-01 |
JP3153367B2 (ja) | 2001-04-09 |
US5416190A (en) | 1995-05-16 |
EP0599209A2 (en) | 1994-06-01 |
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