KR940011528A - 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 - Google Patents

폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 Download PDF

Info

Publication number
KR940011528A
KR940011528A KR1019930024874A KR930024874A KR940011528A KR 940011528 A KR940011528 A KR 940011528A KR 1019930024874 A KR1019930024874 A KR 1019930024874A KR 930024874 A KR930024874 A KR 930024874A KR 940011528 A KR940011528 A KR 940011528A
Authority
KR
South Korea
Prior art keywords
active hydrogen
molecular weight
polyhydrogen
polyhydrogen silsesquioxane
silsesquioxane
Prior art date
Application number
KR1019930024874A
Other languages
English (en)
Other versions
KR100257799B1 (ko
Inventor
가츠토시 미네
다카시 나카무라
모토시 사사키
Original Assignee
이즈카 고지
다우 코닝 토레이 실리콘 캄파니, 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18314945&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR940011528(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 이즈카 고지, 다우 코닝 토레이 실리콘 캄파니, 리미티드 filed Critical 이즈카 고지
Publication of KR940011528A publication Critical patent/KR940011528A/ko
Application granted granted Critical
Publication of KR100257799B1 publication Critical patent/KR100257799B1/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/32Post-polymerisation treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/32Post-polymerisation treatment
    • C08G77/36Fractionation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)

Abstract

분자량 선택성이 자유로우며 저장 안정성이 우수한 폴리하이드로겐 실세스퀴옥산을 제공하는, 재현성이 우수하게 폴리하이드로겐 실세스퀴옥산을 분자량 분별하는 방법이 기술되어 있다. 본 방법은 폴리하이드로겐 실세스퀴옥산을 활성 수소를 함유하지 않은 비극성 용매에 용해시키고 ; 생성된 용액에 활성 수소를 함유하지 않은 극성 용매를 가아혀 폴리하이드로겐 실세스퀴옥산을 침전시키고 ; 폴리하이드로겐 실세스퀴옥산의 목적하는 분자량 분획을 수거하는 단계를 포함한다.

Description

폴리하이드로겐 실세스퀴옥산의 분자량 분별방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 폴리하이드로겐 실세스퀴옥산을 활성 수소를 함유하지 않은 비극성 용매에 용해시키고 ; 생성된 용액에 활성 수소를 함유하지 않은 극성 용매를 가하여 폴리하이드로겐 실세스퀴옥산을 침전시키고 ; 폴리하이드로겐 실세스퀴옥산의 목적하는 분자량 분획을 수거함을 특징으로 하는, 폴리하이드로겐 실세스퀴옥산의 분자량 분별 방법.
  2. 제1항에 있어서, 활성 수소를 함유하지 않은 비극성 용매가 방향족 용매, 지방족 용매 및 에테르 용매로부터 선택되는 방법.
  3. 제2항에 있어서, 활성 수소를 함유하지 않은 비특성 용매가 톨루엔인 방법.
  4. 제1항에 있어서, 활성 수소를 함유하지 않은 비극성 용매가 불순물을 포함하지 않으며 이의 유전 상수가 5이하인 방법.
  5. 제4항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 니트릴, 클로로아세톤, o-클로로니트로벤젠 및 니트로벤젠으로 부터 선택되는 방법.
  6. 제5항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 아세토니트릴인 방법.
  7. 제5항에 있어서, 활성 수소를 함유하지 않은 극성 용매가 불수물을 포함하지 않으며 이의 유전 상수가 30이하인 방법.
  8. 제1항에 있어서, 분별이 수분이 함유되지 않은 불활성 기체 대기하에 수행되는 방법.
  9. 제1항에 있어서, 분별이 이온성 볼순물이 용리되지 않는 물질로 제조된 용기내에서 수행되는 방법.
  10. 제1항에 있어서, 분별 공정을 반복하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930024874A 1992-11-24 1993-11-22 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법 KR100257799B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33810392A JP3153367B2 (ja) 1992-11-24 1992-11-24 ポリハイドロジェンシルセスキオキサンの分子量分別方法
JP92-338103 1992-11-24

Publications (2)

Publication Number Publication Date
KR940011528A true KR940011528A (ko) 1994-06-21
KR100257799B1 KR100257799B1 (ko) 2000-06-01

Family

ID=18314945

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930024874A KR100257799B1 (ko) 1992-11-24 1993-11-22 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법

Country Status (5)

Country Link
US (2) US5416190A (ko)
EP (1) EP0599209A3 (ko)
JP (1) JP3153367B2 (ko)
KR (1) KR100257799B1 (ko)
TW (1) TW268020B (ko)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3465314B2 (ja) * 1993-02-23 2003-11-10 富士通株式会社 弗素含有水素シルセスキオキサンポリマーおよびその製造方法
JPH08245792A (ja) * 1995-03-10 1996-09-24 Mitsubishi Electric Corp シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法
US5807611A (en) * 1996-10-04 1998-09-15 Dow Corning Corporation Electronic coatings
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US5776235A (en) * 1996-10-04 1998-07-07 Dow Corning Corporation Thick opaque ceramic coatings
US5707681A (en) * 1997-02-07 1998-01-13 Dow Corning Corporation Method of producing coatings on electronic substrates
JP3415741B2 (ja) * 1997-03-31 2003-06-09 東レ・ダウコーニング・シリコーン株式会社 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法
US6043330A (en) * 1997-04-21 2000-03-28 Alliedsignal Inc. Synthesis of siloxane resins
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
TW392288B (en) 1997-06-06 2000-06-01 Dow Corning Thermally stable dielectric coatings
US5866197A (en) * 1997-06-06 1999-02-02 Dow Corning Corporation Method for producing thick crack-free coating from hydrogen silsequioxane resin
SG71147A1 (en) 1997-08-29 2000-03-21 Dow Corning Toray Silicone Method for forming insulating thin films
JP3729226B2 (ja) * 1997-09-17 2005-12-21 富士通株式会社 半導体集積回路装置及びその製造方法
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US5906859A (en) * 1998-07-10 1999-05-25 Dow Corning Corporation Method for producing low dielectric coatings from hydrogen silsequioxane resin
JP3543669B2 (ja) 1999-03-31 2004-07-14 信越化学工業株式会社 絶縁膜形成用塗布液及び絶縁膜の形成方法
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
US6440550B1 (en) 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
US6572974B1 (en) 1999-12-06 2003-06-03 The Regents Of The University Of Michigan Modification of infrared reflectivity using silicon dioxide thin films derived from silsesquioxane resins
US7011868B2 (en) * 2000-03-20 2006-03-14 Axcelis Technologies, Inc. Fluorine-free plasma curing process for porous low-k materials
US6759098B2 (en) 2000-03-20 2004-07-06 Axcelis Technologies, Inc. Plasma curing of MSQ-based porous low-k film materials
US6576300B1 (en) 2000-03-20 2003-06-10 Dow Corning Corporation High modulus, low dielectric constant coatings
US6558755B2 (en) 2000-03-20 2003-05-06 Dow Corning Corporation Plasma curing process for porous silica thin film
US6913796B2 (en) * 2000-03-20 2005-07-05 Axcelis Technologies, Inc. Plasma curing process for porous low-k materials
US6518357B1 (en) 2000-10-04 2003-02-11 General Electric Company Flame retardant polycarbonate-silsesquioxane compositions, method for making and articles made thereby
US6399210B1 (en) 2000-11-27 2002-06-04 Dow Corning Corporation Alkoxyhydridosiloxane resins
CA2441901A1 (en) * 2001-04-06 2002-10-17 Paul Apen Low dielectric constant materials and methods of preparation thereof
US6756085B2 (en) * 2001-09-14 2004-06-29 Axcelis Technologies, Inc. Ultraviolet curing processes for advanced low-k materials
US20030194445A1 (en) * 2001-11-12 2003-10-16 Kuhner Carla H. Compositions and methods of use of peptides in combination with biocides and/or germicides
US20040247896A1 (en) * 2001-12-31 2004-12-09 Paul Apen Organic compositions
US6596821B1 (en) * 2002-03-05 2003-07-22 Dow Corning Corporation Hydrosilyation cured silicone resins obtained by fractionation
CN1285970C (zh) * 2003-06-03 2006-11-22 三井化学株式会社 布线保护膜形成用组合物及其用途
JP2005187381A (ja) * 2003-12-25 2005-07-14 Asahi Kasei Corp ケイ素化合物の精製法
US20050215713A1 (en) * 2004-03-26 2005-09-29 Hessell Edward T Method of producing a crosslinked coating in the manufacture of integrated circuits
US8088547B2 (en) * 2004-11-02 2012-01-03 Dow Corning Corporation Resist composition
US7803668B2 (en) * 2006-02-24 2010-09-28 Stmicroelectronics (Crolles 2) Sas Transistor and fabrication process
JP5085649B2 (ja) 2006-06-28 2012-11-28 ダウ コーニング コーポレーション 電子吸引基を有する塩基性添加剤を含有するシルセスキオキサン樹脂システム
US8148043B2 (en) * 2006-06-28 2012-04-03 Dow Corning Corporation Silsesquioxane resin systems with base additives bearing electron-attracting functionalities
TWI432895B (zh) * 2010-12-01 2014-04-01 Chi Mei Corp 感光性聚矽氧烷組成物及其所形成之基材保護膜
DE112015001719T5 (de) 2014-04-09 2016-12-29 Dow Corning Corporation Hydrophober Artikel
DE112015001752T5 (de) 2014-04-09 2017-02-16 Dow Corning Corporation Optisches Element
WO2016204014A1 (ja) * 2015-06-17 2016-12-22 株式会社ダイセル 硬化性組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615272A (en) * 1968-11-04 1971-10-26 Dow Corning Condensed soluble hydrogensilsesquioxane resin
JPS59189126A (ja) * 1983-04-13 1984-10-26 Fujitsu Ltd ポリジハイドロジエンシロキサンの製造方法
JPS6042426A (ja) * 1983-08-19 1985-03-06 Fujitsu Ltd ポリジハイドロジェンシロキサンの製法
JPS6086017A (ja) * 1983-10-17 1985-05-15 Fujitsu Ltd ポリハイドロジエンシルセスキオキサンの製法
JP2513595B2 (ja) * 1984-11-28 1996-07-03 富士通株式会社 ラダ−型シリコン樹脂の分子量分別法
US4808653A (en) * 1986-12-04 1989-02-28 Dow Corning Corporation Coating composition containing hydrogen silsesquioxane resin and other metal oxide precursors
IT1241077B (it) * 1990-03-22 1993-12-29 Donegani Guido Ist Procedimento per il frazionamento in continuo di polimeri ed apparecchiatura adatta allo scopo
US5091162A (en) * 1990-10-01 1992-02-25 Dow Corning Corporation Perhydrosiloxane copolymers and their use as coating materials
US5063267A (en) * 1990-11-28 1991-11-05 Dow Corning Corporation Hydrogen silsesquioxane resin fractions and their use as coating materials
US5165955A (en) * 1991-05-28 1992-11-24 Dow Corning Corporation Method of depositing a coating containing silicon and oxygen
US5310583A (en) * 1992-11-02 1994-05-10 Dow Corning Corporation Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide

Also Published As

Publication number Publication date
JPH06157760A (ja) 1994-06-07
TW268020B (ko) 1996-01-11
EP0599209A3 (en) 1995-03-15
US5486564A (en) 1996-01-23
KR100257799B1 (ko) 2000-06-01
JP3153367B2 (ja) 2001-04-09
US5416190A (en) 1995-05-16
EP0599209A2 (en) 1994-06-01

Similar Documents

Publication Publication Date Title
KR940011528A (ko) 폴리하이드로겐 실세스퀴옥산의 분자량 분별방법
MY101123A (en) Emulsion explosive compositions
MY105351A (en) Hair styling compositions
JPS5653704A (en) Ultrafiltration
DE69012036D1 (de) Gastrennungsmembranen auf der Basis von Phenylindan enthaltenden Polyimiden.
CA2058730A1 (en) Platinum complexes and use thereof
KR840002650A (ko) 유비데카레논을 함유하는 약학적 조성물
MX9306955A (es) Formulaciones de rociado de aerosol para el cabello.
DK162197C (da) Molekylsigte og fremgangsmaade til fremstilling af denne samt fremgangsmaade til anvendelse deraf
DE60041704D1 (de) Ungen
KR890013729A (ko) 반응성 이온 에칭장치
GB1535481A (en) Removal of organic compounds from aqueous liquids by solvent extraction
SE7703077L (sv) Vetskestabiliserad koenzymkomposition och sett for dess framstellning
AU583388B2 (en) High performance liquid chromatography mobile phase
JPS5575429A (en) Surface treatment of vinyl chloride type resin molded article
EP0214792A3 (en) Polymer alloys of aminopolysiloxanes with brominated derivatives of polyphenylene oxide
KR830003876A (ko) 브롬옥시닐 및 아이옥시닐 에스레르 용액
KR830005103A (ko) 방향족 탄화수소의 니트로화 반응시의 수분 제거방법
KR910004762A (ko) 용매-기재 코팅 조성물
GB1457890A (en) Chromatography
KR910009778A (ko) 폴리이미드
SU1634660A1 (ru) Способ очистки органических растворителей на основе ароматических или насыщенных алифатических углеводородов от растворенного в них кислорода
SE7609311L (sv) Molekyltranstport i halvledare
KR850008271A (ko) α-L-아스파틸-L-페닐알라닌 에스텔(α-L-Aspartyl-L-Phenylalanine ester)의 제조방법
ES8300666A1 (es) "un procedimiento de obtencion de benzofenonas 2,2'dioxigenadas y en particular 2,2'dihidroxibenzofenonas".

Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120220

Year of fee payment: 13

LAPS Lapse due to unpaid annual fee